PHOTO DETECTOR AND METHOD FOR FABRICATING THE SAME
    52.
    发明申请
    PHOTO DETECTOR AND METHOD FOR FABRICATING THE SAME 有权
    照片检测器及其制造方法

    公开(公告)号:US20090027371A1

    公开(公告)日:2009-01-29

    申请号:US11943602

    申请日:2007-11-21

    IPC分类号: G09G3/00 H01L31/18 H01L31/062

    摘要: A photo detector is disclosed. The photo detector includes a substrate, a first patterned semiconductor layer with a first state, a dielectric layer, a patterned conductive layer, an inter-layer dielectric, a second patterned semiconductor layer with a second state, two first electrodes disposed on the inter-layer dielectric and two second electrodes disposed on portions of the second semiconductor layer. The first patterned semiconductor layer having a first doping region and a second doping region is disposed on a transistor region of the substrate. The dielectric layer is disposed to cover the substrate and the first semiconductor layer, the patterned conductive layer is disposed on the dielectric layer, and the inter-layer dielectric having at least two openings adapted to expose the first doping region and the second doping region is disposed to cover the dielectric layer. The second patterned semiconductor layer is disposed on a photosensitive region and the first electrodes are electrically connected to the first patterned semiconductor layer.

    摘要翻译: 公开了一种光电检测器。 光检测器包括基板,具有第一状态的第一图案化半导体层,电介质层,图案化导电层,层间电介质,具有第二状态的第二图案化半导体层,设置在第二状态的第二图案化半导体层, 层电介质和设置在第二半导体层的部分上的两个第二电极。 具有第一掺杂区域和第二掺杂区域的第一图案化半导体层设置在衬底的晶体管区域上。 介电层设置成覆盖基板和第一半导体层,图案化的导电层设置在电介质层上,并且具有适于暴露第一掺杂区和第二掺杂区的至少两个开口的层间电介质是 被设置成覆盖电介质层。 第二图案化半导体层设置在光敏区域上,并且第一电极电连接到第一图案化半导体层。

    Electrode Structure of a Transistor, and Pixel Structure and Display Apparatus Comprising the Same
    53.
    发明申请
    Electrode Structure of a Transistor, and Pixel Structure and Display Apparatus Comprising the Same 有权
    晶体管的电极结构,以及包括其的像素结构和显示装置

    公开(公告)号:US20080067538A1

    公开(公告)日:2008-03-20

    申请号:US11683131

    申请日:2007-03-07

    IPC分类号: H01L33/00 H01L29/417

    摘要: An electrode structure of a transistor, and a pixel structure and a display apparatus comprising the electrode structure of the transistor are disclosed. The electrode structure of the transistor comprises a first electrode and a second electrode. The first electrode has at least two first portions and at least one second portion. The first portions are substantially parallel with each other and each has a first width. The second portion has a second width, and connects the substantially parallel first portions to define a space with an opening. The first width is substantially greater than the second width.

    摘要翻译: 公开了晶体管的电极结构以及包括晶体管的电极结构的像素结构和显示装置。 晶体管的电极结构包括第一电极和第二电极。 第一电极具有至少两个第一部分和至少一个第二部分。 第一部分基本上彼此平行并且每个具有第一宽度。 第二部分具有第二宽度,并且连接大致平行的第一部分以限定具有开口的空间。 第一宽度基本上大于第二宽度。

    THIN FILM TRANSISTOR AND METHOD FOR FABRICATING SAME
    55.
    发明申请
    THIN FILM TRANSISTOR AND METHOD FOR FABRICATING SAME 有权
    薄膜晶体管及其制造方法

    公开(公告)号:US20060024866A1

    公开(公告)日:2006-02-02

    申请号:US10904377

    申请日:2004-11-07

    摘要: A method for forming a thin film transistor on a substrate is disclosed. A gate electrode and a gate insulation layer are disposed on a surface of the substrate. A deposition process is performed by utilizing hydrogen diluted silane to form a silicon-contained thin film on the gate insulation layer first. A hydrogen plasma etching process is thereafter performed. The deposition process and the etching process are repeated for at least one time to form an interface layer. Finally, an amorphous silicon layer, n+ doped Si layers, a source electrode, and a drain electrode are formed on the interface layer.

    摘要翻译: 公开了一种在衬底上形成薄膜晶体管的方法。 栅电极和栅极绝缘层设置在基板的表面上。 首先通过利用氢稀释的硅烷在栅极绝缘层上形成含硅薄膜来进行沉积工艺。 此后执行氢等离子体蚀刻工艺。 重复沉积工艺和蚀刻工艺至少一次以形成界面层。 最后,在界面层上形成非晶硅层,n + +掺杂的Si层,源电极和漏电极。