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    MICROCHIP ELECTROPHORESIS METHOD AND DEVICE
    51.
    发明申请
    MICROCHIP ELECTROPHORESIS METHOD AND DEVICE 审中-公开
    MICROCHIP电泳方法和装置

    公开(公告)号：US20090294287A1

    公开(公告)日：2009-12-03

    申请号：US11915491

    申请日：2006-05-10

    申请人： Tomoyuki Morita ,  Takashi Matsumura ,  Akiko Miya ,  Hiroyuki Yamada

    发明人： Tomoyuki Morita ,  Takashi Matsumura ,  Akiko Miya ,  Hiroyuki Yamada

    IPC分类号： C07K1/26

    CPC分类号： G01N27/44704 ,  G01N27/44747 ,  G01N27/44791

    摘要： An separation method comprising a temperature control process useful for microchip electrophoresis such as microchip DGGE is provided along with a device therefor.The present invention relates to a microchip electrophoresis method for separating double-stranded nucleic acids by means of differences in nucleotide sequence while maintaining a preset temperature, wherein the temperature during separation of double-stranded nucleic acids in an separation region comprising an separation microchannel is controlled to within ±2.5° C. of the preset temperature.

    摘要翻译： 提供了包括用于微芯片电泳的微控制器电路的温度控制过程的分离方法，如微芯片DGGE及其装置。 本发明涉及一种用于通过核苷酸序列差异分离双链核酸同时保持预设温度的微芯片电泳方法，其中在包含分离微通道的分离区域中双链核酸分离过程中的温度受到控制 到预设温度的±2.5°C以内。

    Wireless Communication Terminal and Control Method Threrof
    53.
    发明申请
    Wireless Communication Terminal and Control Method Threrof 有权
    无线通信终端和控制方法Threrof

    公开(公告)号：US20080058025A1

    公开(公告)日：2008-03-06

    申请号：US11572631

    申请日：2005-07-28

    申请人： Mitsuhiro Kitaji ,  Takashi Matsumura

    发明人： Mitsuhiro Kitaji ,  Takashi Matsumura

    IPC分类号： H04B1/38

    CPC分类号： H04W52/36 ,  H04B1/3816

    摘要： In a PC card communication terminal that operates supplied with power from a host device, problems such as malfunctions due to a supply voltage drop at the time of high transmission output are prevented from occurring. A baseband processor (1106) selects a transmission-power upper-limit measurement mode when a PC card terminal (1103) is to be controlled for the first time. A supply voltage drop is measured by a voltage measurement circuit (1114) while a load value of a load circuit (1112) is being changed. The load value of the load circuit (1112) when the supply voltage decreases to a permissible lowest supply voltage is obtained. Using a conversion table stored in a memory (1107), the load value is converted into a transmission output and is set as a transmission-output upper limit. In a normal communication mode, a maximum transmission output is restricted based on this transmission-output upper limit.

    摘要翻译： 在从主机装置供电的PC卡通信终端中，防止由于高传输输出时的电源电压下降而导致的故障等问题。 当首次要控制PC卡终端（1103）时，基带处理器（1106）选择发送功率上限测量模式。 当负载电路（1112）的负载值正在改变时，由电压测量电路（1114）测量电源电压降。 获得当电源电压降低到允许的最低电源电压时负载电路（1112）的负载值。 使用存储在存储器（1107）中的转换表，将负载值转换为发送输出，并将其设置为发送 - 输出上限。 在正常通信模式中，基于该传输输出上限来限制最大传输输出。

    Moving reflector driving part of a Michelson inteferometer
    54.
    发明授权
    Moving reflector driving part of a Michelson inteferometer 失效
    移动反射器驱动迈克尔逊干涉仪部分

    公开(公告)号：US5270790A

    公开(公告)日：1993-12-14

    申请号：US778947

    申请日：1991-12-17

    申请人： Takashi Matsumura

    发明人： Takashi Matsumura

    IPC分类号： G01J3/453 ,  G01B9/02

    CPC分类号： G01J3/4535

    摘要： Reference light is incident to a Michelson interferometer, in which is obtained a reference interference electric signal which undergoes a sinusoidal variation in accordance with interference of reference light as a movable reflector (14) moves. A direction control signal indicating the direction in which to move the movable reflector (14) is applied from a control circuit (21) to a two-phase signal generator (32B), which derives, from the reference interference electric signal, two-phase signals either one of which leads the other by a phase angle of 90.degree. in accordance with the specified direction. The two-phase signals are fed back to a servo drive circuit (19) and a movement control signal is also applied from the control circuit (21) to the servo drive circuit (19) to control the movement of the movable reflector (14). Thus, the movement of the movable reflector can be controlled with a high degree of accuracy corresponding to the accuracy of the wavelength resolution of the reference light.

    摘要翻译： PCT No.PCT / JP91 / 00506 Sec。 371 1991年12月17日第 102（e）1991年12月17日PCT PCT 1991年4月7日提交PCT公布。 出版物WO91 / 16606 日期为1991年10月31日。参考光入射到迈克尔逊干涉仪，其中获得参考干涉电信号，其随着可移动反射器（14）移动而根据参考光的干涉而经历正弦变化。 指示移动可移动反射器（14）的方向的方向控制信号从控制电路（21）施加到二相信号发生器（32B），二相信号发生器（32B）从参考干扰电信号导出两相 信号中的任何一个根据指定的方向引导另一个90°的相位角。 将两相信号反馈到伺服驱动电路（19），并且还从控制电路（21）向伺服驱动电路（19）施加移动控制信号，以控制可移动反射器（14）的运动， 。 因此，可以以与参考光的波长分辨率的精度对应的高精度来控制可移动反射器的移动。

    Alignment system allowing alignment when alignment marks are absent
    55.
    发明授权
    Alignment system allowing alignment when alignment marks are absent 失效
    对齐系统允许对齐标记不对齐

    公开(公告)号：US4712016A

    公开(公告)日：1987-12-08

    申请号：US823736

    申请日：1986-01-29

    申请人： Takashi Matsumura

    发明人： Takashi Matsumura

    IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

    CPC分类号： G03F9/70

    摘要： An alignment system usable in a semiconductor device manufacturing apparatus of step-and-repeat type for superposingly printing a pattern of a reticle onto each of patterns on a semiconductor wafer in a step-and-repeat manner. The alignment system is adapted to align each of the patterns of the wafer with respect to the pattern of the reticle, prior to exposure for printing the pattern, by use of alignment marks provided for each pattern of the wafer. In this alignment system, if the alignment marks for a particular pattern on the wafer are damaged or wiped off by the chemical or thermal treatment of the wafer, the alignment of the particular pattern of the wafer with respect to the pattern of the reticle is achieved on the basis of positional information detected from another alignment mark provided for another pattern of the wafer adjacent to or in the neighborhood of the particular pattern of the wafer, whereby the pattern of the reticle can be accurately overlaid on the particular pattern of the wafer.

    摘要翻译： 一种可用于步进重复类型的半导体器件制造装置中的对准系统，用于以半步重复的方式将半导体晶片上的每个图案上重叠印刷掩模版图案。 对准系统适于通过使用为晶片的每个图案提供的对准标记，在用于印刷图案的曝光之前，相对于掩模版的图案来对准晶片的每个图案。 在该对准系统中，如果晶片上的特定图案的对准标记被晶片的化学或热处理损坏或擦除，则可以实现晶片相对于标线图案的特定图案的对准 基于从与晶片的特定图案相邻或相邻的晶片的另一图案提供的另一个对准标记检测到的位置信息，由此可以将标线图案精确地覆盖在晶片的特定图案上。