公开(公告)号：US07869122B2

公开(公告)日：2011-01-11

申请号：US12100233

申请日：2008-04-09

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B17/00 ,  G02B21/00

CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

公开(公告)号：US07760425B2

公开(公告)日：2010-07-20

申请号：US11896689

申请日：2007-09-05

申请人： Alexander Epple

发明人： Alexander Epple

IPC分类号： G02B17/08 ,  G02B21/04

CPC分类号： G03F7/70225 ,  G02B17/0892 ,  G02B27/0025

摘要： A catadioptric objective includes a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA with electromagnetic radiation from a wavelength band around a central wavelength λ. The optical elements include a concave mirror and a plurality of lenses. The projection objective forms an image of the pattern in a respective Petzval surface for each wavelength λ of a wavelength band, the Petzval surfaces deviating from each other for different wavelengths. In embodiments, a longitudinal departure p of the Petzval surface at a given wavelength from a planar reference surface at an edge field point of the image field (at maximum image height y′), measured parallel to the optical axis in the image surface region, varies with the wavelength λ according to dp/dλ

摘要翻译： 反射折射物镜包括沿着光轴布置的多个光学元件，用于将物镜的物体表面中的物场的图案成像到在像侧数值孔径NA处的物镜的图像表面区域中的图像场， 围绕中心波长λ的波长带的电磁辐射。 光学元件包括凹面镜和多个透镜。 对于波长带的每个波长λ，投影物镜在相应的Petzval表面中形成图案的图像，Petzval表面对于不同的波长彼此偏离。 在实施例中，平行于图像表面区域中的光轴的图像场（最大图像高度y'）处的平面参考表面处的给定波长处的Petzval表面的纵向偏离p， 根据dp /dλ<（0.2λ/ NA2）/ nm，随波长λ变化。

公开(公告)号：US07712905B2

公开(公告)日：2010-05-11

申请号：US11578098

申请日：2005-03-22

申请人： David Shafer ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Mann

发明人： David Shafer ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Mann

IPC分类号： G02B5/08

CPC分类号： G02B17/0804 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0816 ,  G02B17/0836 ,  G02B17/0844 ,  G02B17/0848 ,  G02B17/086 ,  G02B17/0892 ,  G03F7/70058 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

摘要： An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.

摘要翻译： 用于将布置在成像系统的物体表面中的离轴对象场成像到设置在成像系统的图像表面中的离轴图像场同时创建至少一个中间图像的成像系统具有：光轴; 具有对象侧反射镜组入口的直列式反射镜组，横向于所述光轴排列的像侧反射镜组出射和反射镜组平面，并且几何地布置在所述反射镜组入口和所述镜子组出口之间，所述镜组包括： 第一反射镜，具有第一反射镜表面，用于在与光轴不对称的第一反射区域中接收来自物体表面的辐射; 至少一个第二反射镜，具有面向第一镜面的第二镜面，用于在不对称于光轴的第二反射区域中接收来自第一反射镜的辐射; 所述第一和第二反射镜中的至少一个是凹面镜，所述凹面镜具有在光轴上限定反射镜轴的凹面镜面; 其中反射镜组的反射镜被布置成使得来自反射镜组入口的辐射通过镜组平面至少四次，并且在离开镜组之前在镜组的凹面镜表面上反射至少两次 镜组退出。 可以在轴向紧凑的设计中实现图像场曲率的强过度校正。

公开(公告)号：US07672047B2

公开(公告)日：2010-03-02

申请号：US12099882

申请日：2008-04-09

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B17/00 ,  G02B21/00

CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane;wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image;pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; andall concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

公开(公告)号：US20100014153A1

公开(公告)日：2010-01-21

申请号：US12561019

申请日：2009-09-16

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G02B17/08

CPC分类号： G02B17/0816 ,  G02B13/16 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G02B21/02 ,  G02B21/33 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'.NA2），并且其中条件COMP1 <10成立。

公开(公告)号：US20090207487A1

公开(公告)日：2009-08-20

申请号：US12413981

申请日：2009-03-30

申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

IPC分类号： G02B17/08 ,  G06F17/00

CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

公开(公告)号：US20090185153A1

公开(公告)日：2009-07-23

申请号：US12369460

申请日：2009-02-11

申请人： Alexander Epple

发明人： Alexander Epple

IPC分类号： G03B27/54 ,  G02B17/08 ,  G03F7/20

CPC分类号： G03F7/70225 ,  G03F7/70266 ,  G03F7/70275

摘要： In certain aspects, catadioptric projection objectives for imaging a pattern from an object field arranged in an object surface of the projection objective onto an image field arranged in an image surface of the projection objective include a first objective part configured to image the pattern from the object surface into a first intermediate image, and having a first pupil surface, a second objective part configured to image the first intermediate image into a second intermediate image, and having a second pupil surface optically conjugate to the first pupil surface, and a third objective part configured to image the second intermediate image into the image surface, and having a third pupil surface optically conjugate to the first and second pupil surface. A pupil mirror having a reflective pupil mirror surface is positioned at or close to one of the first, second and third pupil surface. A pupil mirror manipulator operatively connected to the pupil mirror and configured to vary the shape of the reflective surface of the pupil mirror allows for dynamically correcting imaging aberrations originating from lens heating, compaction and other radiation induced imaging aberrations occurring during operation of the projection objective.

摘要翻译： 在某些方面，用于将布置在投影物镜的物体表面中的物体场的图案成像到布置在投影物镜的图像表面中的图像场的反射折射投射物镜包括：第一物镜部件，被配置为从物体成像图案 表面成为第一中间图像，并具有第一光瞳表面，第二物镜部分被配置为将第一中间图像成像为第二中间图像，并且具有与第一瞳孔表面光学共轭的第二光瞳表面，以及第三目标部分 被配置为将所述第二中间图像成像到所述图像表面中，并且具有与所述第一和第二光瞳表面光学共轭的第三光瞳表面。 具有反射光瞳镜表面的光瞳反射镜位于或靠近第一，第二和第三光瞳表面中的一个。 可操作地连接到光瞳反射镜并被配置为改变瞳孔镜的反射表面的形状的瞳孔镜操纵器允许动态地校正源自投影物镜的操作期间发生的镜片加热，压实和其它辐射诱导的成像像差的成像像差。

公开(公告)号：US20090059358A1

公开(公告)日：2009-03-05

申请号：US11896689

申请日：2007-09-05

申请人： Alexander Epple

发明人： Alexander Epple

IPC分类号： G02B17/00 ,  G02B1/06 ,  G02B23/00

CPC分类号： G03F7/70225 ,  G02B17/0892 ,  G02B27/0025

摘要： A catadioptric objective includes a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA with electromagnetic radiation from a wavelength band around a central wavelength λ. The optical elements include a concave mirror and a plurality of lenses. The projection objective forms an image of the pattern in a respective Petzval surface for each wavelength λ of a wavelength band, the Petzval surfaces deviating from each other for different wavelengths. In embodiments, a longitudinal departure p of the Petzval surface at a given wavelength from a planar reference surface at an edge field point of the image field (at maximum image height y′), measured parallel to the optical axis in the image surface region, varies with the wavelength λ according to dp/dλ

摘要翻译： 反射折射物镜包括沿着光轴布置的多个光学元件，用于将物镜的物体表面中的物场的图案成像到在像侧数值孔径NA处的物镜的图像表面区域中的图像场， 围绕中心波长λ的波长带的电磁辐射。 光学元件包括凹面镜和多个透镜。 对于波长带的每个波长λ，投影物镜在相应的Petzval表面中形成图案的图像，Petzval表面对于不同波长彼此偏离。 在实施例中，平行于图像表面区域中的光轴的图像场（最大图像高度y'）处的平面参考表面处的给定波长处的Petzval表面的纵向偏离p， 根据dp /dlλ（（0.2λ/ NA2）/ nm）随波长λ变化。

公开(公告)号：US20080304033A1

公开(公告)日：2008-12-11

申请号：US12194229

申请日：2008-08-19

申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

公开(公告)号：US07463422B2

公开(公告)日：2008-12-09

申请号：US11657925

申请日：2007-01-25

申请人： Vladimir Kamenow ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc ,  David Shafer ,  Wilhelm Ulrich ,  Rudolf von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： Vladimir Kamenow ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc ,  David Shafer ,  Wilhelm Ulrich ,  Rudolf von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B17/00

CPC分类号： G02B27/0012 ,  G02B1/02 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70966 ,  G03F7/70975

摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子KLT / LH。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子KLT / LH高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。