公开(公告)号：US20100044943A1

公开(公告)日：2010-02-25

申请号：US12593182

申请日：2008-03-17

申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius T.A. Peijnenburg

发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius T.A. Peijnenburg

IPC分类号： B23Q1/25 ,  G03F7/20

CPC分类号： G03F7/70716 ,  H01L21/682 ,  H01L21/68764

摘要： A stage assembly (8) includes a first stage (10) having at least one degree of freedom, i.e. at least one long stroke motion capability, and being movably mounted in a first stage base frame (12), the first stage base frame permitting motion in a first direction. A second stage (20) has at least one degree of freedom, i.e. at least one long stroke motion capability, and being movably mounted in a second stage base frame (22). The second stage base frame permitting motion in a second direction which is different from the first direction. The first stage and the second stage are located one over the other in a third direction which is orthogonal the first and second directions and a motion. An isolated reference metrology frame (18) is configured to provide a point of reference for the first and second stages in one or more degrees of freedom. Other degrees of freedom may be measured more directly from one stage relative to the other.

摘要翻译： 舞台组件（8）包括具有至少一个自由度（即至少一个长行程运动能力）的第一舞台（10），并且可移动地安装在第一舞台底架（12）中，第一舞台底座允许 运动在第一个方向。 第二级（20）具有至少一个自由度，即至少一个长行程运动能力，并且可移动地安装在第二级基架（22）中。 第二级基架允许沿与第一方向不同的第二方向运动。 第一级和第二级在与第一和第二方向正交的第三方向上一个接一个地定位和一个运动。 隔离的参考计量框架（18）被配置为以一个或多个自由度为第一和第二阶段提供参考点。 其他自由度可以相对于另一个阶段更直接地被测量。

公开(公告)号：US20090225289A1

公开(公告)日：2009-09-10

申请号：US12388230

申请日：2009-02-18

申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Jozef Petrus Henricus Benschop ,  Nicolaas Ten Kate ,  Johannes Catharinus Hubertus Mulkens ,  Lucas Henricus Johannes Stevens

发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Jozef Petrus Henricus Benschop ,  Nicolaas Ten Kate ,  Johannes Catharinus Hubertus Mulkens ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： An immersion lithographic apparatus is described in which a member is provided above the surface of the substrate and the substrate table. Immersion liquid is provided between the substrate table and the substrate and the member. In an embodiment, a beam of radiation passes through the plate. In an embodiment, the member has a through hole in it through which the beam passes.

摘要翻译： 描述了一种浸没式光刻设备，其中元件设置在基板表面和基板台的上方。 浸没液体设置在基板台与基板和构件之间。 在一个实施例中，辐射束穿过板。 在一个实施例中，构件在其中具有通孔，梁通过该通孔。

公开(公告)号：US07105955B2

公开(公告)日：2006-09-12

申请号：US10825224

申请日：2004-04-16

申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Henricus Wilhelmus Aloysius Janssen ,  Erik Roelof Loopstra

发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Henricus Wilhelmus Aloysius Janssen ,  Erik Roelof Loopstra

IPC分类号： H02K41/02 ,  H02K3/04 ,  G03B27/52

CPC分类号： H02K41/03 ,  G03F7/70758 ,  H02K3/04

摘要： A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.

摘要翻译： 线圈组件具有布置在公共平面中的至少两个线圈，并且在线圈的交叉部分中部分重叠。 交叉部分具有降低的高度，这导致线圈组件的总高度减小。 这导致更紧凑的线圈组件，并且因此导致施加线圈组件的定位装置的更好的动态特性。