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公开(公告)号：US20090225289A1
公开(公告)日：2009-09-10
申请号：US12388230
申请日：2009-02-18
申请人： Johannes Petrus Martinus Bernardus Vermeulen , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Lucas Henricus Johannes Stevens
发明人： Johannes Petrus Martinus Bernardus Vermeulen , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Lucas Henricus Johannes Stevens
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： An immersion lithographic apparatus is described in which a member is provided above the surface of the substrate and the substrate table. Immersion liquid is provided between the substrate table and the substrate and the member. In an embodiment, a beam of radiation passes through the plate. In an embodiment, the member has a through hole in it through which the beam passes.
摘要翻译： 描述了一种浸没式光刻设备，其中元件设置在基板表面和基板台的上方。 浸没液体设置在基板台与基板和构件之间。 在一个实施例中，辐射束穿过板。 在一个实施例中，构件在其中具有通孔，梁通过该通孔。
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2.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD 审中-公开流体处理结构，平面设备和设备制造方法公开(公告)号：US20100060868A1
公开(公告)日：2010-03-11
申请号：US12550481
申请日：2009-08-31
申请人： Gheorghe Tanasa , Nicolaas Ten Kate , Johannes Petrus Martinus Bernardus Vermeulen , Danny Maria Hubertus Philips , Maikel Adrianus Cornelis Schepers , Laurentius Johannes Adrianus Van Bokhoven
发明人： Gheorghe Tanasa , Nicolaas Ten Kate , Johannes Petrus Martinus Bernardus Vermeulen , Danny Maria Hubertus Philips , Maikel Adrianus Cornelis Schepers , Laurentius Johannes Adrianus Van Bokhoven
CPC分类号： G03F7/70341 , Y10T137/87169
摘要： A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.
摘要翻译： 公开了一种流体处理结构，其被设计用于所有湿式浸渍光刻。 流体处理结构具有第一开口以将流体提供到投影系统的最终元件与基板和/或基板台之间的空间，阻挡液体流出流体处理结构和流体处理结构之间的空间的屏障 基板和第二开口，该第二开口通向该空间的径向外侧的区域，以将流体从流体处理结构提供到该空间的径向向外的基板和/或基板台的顶表面上。 可以设置控制器，使得朝向衬底台的中心的流体流大于离开衬底台的中心的方向的流体流动。
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公开(公告)号：US10197927B2
公开(公告)日：2019-02-05
申请号：US12628531
申请日：2009-12-01
摘要： A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
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公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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5.发明授权Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method 有权用于光刻设备的基板，光刻设备，使用基板台的方法和器件制造方法公开(公告)号：US08941815B2
公开(公告)日：2015-01-27
申请号：US12821015
申请日：2010-06-22
申请人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
发明人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
摘要翻译： 为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。
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公开(公告)号：US20100134769A1
公开(公告)日：2010-06-03
申请号：US12628531
申请日：2009-12-01
CPC分类号： G03F7/70908 , G03B27/32 , G03F7/70341 , G03F7/70775
摘要： A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
摘要翻译： 解决了污染干扰格栅板位置测量系统的困难。 在一个实施例中，防止污染物与光栅或传感器接触。 在一个实施例中，表面声波用于从光栅或传感器的表面分离污染物。
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公开(公告)号：US07656502B2
公开(公告)日：2010-02-02
申请号：US11472566
申请日：2006-06-22
申请人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
发明人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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8.发明申请公开(公告)号：US20110013169A1
公开(公告)日：2011-01-20
申请号：US12821015
申请日：2010-06-22
申请人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
发明人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
IPC分类号： G03B27/58
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
摘要翻译： 为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。
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公开(公告)号：US20090161083A1
公开(公告)日：2009-06-25
申请号：US12292961
申请日：2008-12-01
申请人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
发明人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.
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公开(公告)号：US08149379B2
公开(公告)日：2012-04-03
申请号：US12292961
申请日：2008-12-01
申请人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
发明人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
CPC分类号： G03B27/52 , G03F7/70341
摘要： The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.
摘要翻译： 公开了使用电润湿来控制浸没式光刻设备中浸没液体的行为。
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