公开(公告)号：US06447975B1

公开(公告)日：2002-09-10

申请号：US09650898

申请日：2000-08-30

Applicant: Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

Inventor： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

IPC: G03F7023

CPC classification number: G03F7/0048 ,  G03F7/0226

Abstract: A photoresist composition including a polymer resin for forming a photoresist layer, a photosensitive chemical that changes the solubility of the photoresist layer when exposed to some form of radiation and 3-methoxybutyl acetate and 4-butyrolactone as a solvent, is provided. The composition has a good photosensitivity and remainder ratio and no unpleasant odor.

Abstract translation: 提供了包含用于形成光致抗蚀剂层的聚合物树脂的光致抗蚀剂组合物，当暴露于某种形式的辐射时改变光致抗蚀剂层的溶解度的光敏化合物和作为溶剂的4-丁内酯的4-乙内酯。 该组合物具有良好的光敏性和余量比，无异味。

公开(公告)号：US06338930B1

公开(公告)日：2002-01-15

申请号：US09654927

申请日：2000-09-05

Applicant: Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

Inventor： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

IPC: G03C174

CPC classification number: G03F7/0048 ,  G03F7/0226 ,  G03F7/162

Abstract: A method for preparing a positive photoresist layer is provided. In this method, a photoresist composition is drop-wise applied on an insulator layer or a conductive metal layer formed on a substrate. The photoresist composition includes a polymer resin, a sensitizer for changing solubility of the photoresist layer when exposed and a solvent. The coated substrate is rotated at the speed of 1,250 to 1,350 rpm for 4.2 to 4.8 seconds. The coated substrate is then dried and the dried substrate is exposed to some form of radiation. Next, the exposed portion is removed by using an alkaline developing solution. The solvent preferably includes 3-methoxybutyl acetate and 4-butyrolactone, or includes 3-methoxybutyl acetate, 2-heptanone, and 4-butyrolactone.

Abstract translation: 提供了制备正性光致抗蚀剂层的方法。 在该方法中，将光致抗蚀剂组合物逐滴施加在形成在基板上的绝缘体层或导电金属层上。 光致抗蚀剂组合物包括聚合物树脂，当曝光时改变光致抗蚀剂层的溶解度的敏化剂和溶剂。 涂布的基材以1,250至1350rpm的速度旋转4.2至4.8秒。 然后将涂覆的基材干燥并将干燥的基材暴露于某种形式的辐射。 接下来，通过使用碱性显影液去除曝光部分。 溶剂优选包括3-甲氧基丁酸乙酯和4-丁内酯，或包括3-甲氧基丁酸乙酯，2-庚酮和4-丁内酯。

公开(公告)号：US5498358A

公开(公告)日：1996-03-12

申请号：US235779

申请日：1994-04-29

Applicant: Ki-Soo Kim ,  Sophia Dashevsky ,  Johst H. Burk

Inventor： Ki-Soo Kim ,  Sophia Dashevsky ,  Johst H. Burk

IPC: C10M145/36 ,  C10M149/12 ,  C10M171/00 ,  C10M129/16

CPC classification number: C10M149/12 ,  C10M145/36 ,  C10M171/00 ,  C10M2209/105 ,  C10M2209/108 ,  C10M2215/042 ,  C10N2240/10 ,  C10N2240/101 ,  C10N2240/104 ,  C10N2240/106

Abstract: A lubricant composition for an internal combustion engine contains a lubricant basestock and an effective amount for antiwear properties of an oligomer containing at least one mesogenic segment and at least one flexible segment. The oligomer can have a centrally disposed flexible segment, e.g., derived from a polyalkylene glycol such as polypropylene glycol, with mesogenic segments as end caps or it can contain alternating flexible and mesogenic segments, e.g., comprising a repeat unit comprising aromatic ester groups and at least one linear polyalkylene spacer. The oligomer preferably has a molecular weight of from about 1,000 to about 4,000 and is present at from about 0.1% to about 3%, by weight of the basestock.

Abstract translation: 用于内燃机的润滑剂组合物含有润滑剂基础油和有效量的含有至少一个介晶段和至少一个柔性段的低聚物的抗磨性能。 低聚物可以具有中心设置的柔性链段，例如衍生自聚亚烷基二醇例如聚丙二醇，其具有中间链段作为端帽，或者其可以含有交替的柔性和中间链段，例如，包含包含芳族酯基的重复单元， 至少一个线性聚亚烷基间隔物。 低聚物优选具有约1,000至约4,000的分子量，并且以基料重量的约0.1％至约3％存在。

公开(公告)号：US5346970A

公开(公告)日：1994-09-13

申请号：US96756

申请日：1993-07-22

Applicant: Sophia Dashevsky ,  Ki-Soo Kim ,  Stanley W. Palmaka ,  Roy L. Johnston ,  Leonardus A. G. Busscher ,  Johannes A. Juijn

Inventor： Sophia Dashevsky ,  Ki-Soo Kim ,  Stanley W. Palmaka ,  Roy L. Johnston ,  Leonardus A. G. Busscher ,  Johannes A. Juijn

IPC: D01F6/84 ,  C08L67/00 ,  C08L67/02 ,  D01F6/62 ,  D01F6/92

CPC classification number: C08L67/00 ,  C08L67/02

Abstract: Blends of a poly(ethylene terephthalate) matrix and a thermotropic liquid crystalline segmented block copolymer comprising rod (e.g., aromatic ester mesogen units containing flexible alkylene spacers) and flexible coil polymer blocks of poly(butylene terephthalate) can be used as molding compositions or in the formation of fibers and films.

Abstract translation: 聚（对苯二甲酸乙二醇酯）基质和包含棒（例如含有柔性亚烷基间隔基的芳族酯介晶单元）和聚（对苯二甲酸丁二醇酯）的柔性线圈聚合物嵌段的热致液晶分段嵌段共聚物的共混物可以用作模塑组合物或 形成纤维和薄膜。

公开(公告)号：US5258486A

公开(公告)日：1993-11-02

申请号：US923691

申请日：1992-07-31

Applicant: Ki-Soo Kim ,  Sophia Dashevsky ,  Jian-Lin Liu ,  Stanley W. Palmaka

Inventor： Ki-Soo Kim ,  Sophia Dashevsky ,  Jian-Lin Liu ,  Stanley W. Palmaka

IPC: C08G63/06 ,  C08G63/60 ,  C08G63/78 ,  C08G20/00 ,  C08G63/02 ,  C08G63/18

CPC classification number: C08G63/60

Abstract: A single reactor process for formation of block copolymers comprising aromatic ester mesogenic units containing flexible alkane spacers and polyester flexible coil units in the main chain thereof which comprises reacting an .alpha.,.omega.-bis(hydroxybenzoyloxy) alkane monomer with an aromatic acid chloride in the presence of a functionalized flexible coil oligomer under temperature conditions in which an acid chloride-terminated bis(hydroxyalkyl terephthalate) oligomer was first formed at a first, lower temperature and the block copolymer was then formed at a second, higher temperature by reacting this oligomer with the functionalized flexible coil oligomer.

Abstract translation: 用于形成嵌段共聚物的单反应器方法，其包含在其主链中含有柔性烷烃间隔物和聚酯柔性线圈单元的芳族酯介晶单元，其包括在存在下使α，ω-双（羟基苯甲酰氧基）烷烃单体与芳族酰氯反应 的功能化柔性线圈低聚物，其中首先在第一个较低温度下首先形成酰氯封端的双（羟烷基对苯二酸酯）低聚物，然后在第二个较高温度下通过使该低聚物与 功能化柔性线圈低聚物。