公开(公告)号：US06566265B2

公开(公告)日：2003-05-20

申请号：US09859844

申请日：2001-05-17

申请人： Masayoshi Esashi ,  Takashi Abe ,  Katsuhiro Wakabayashi

发明人： Masayoshi Esashi ,  Takashi Abe ,  Katsuhiro Wakabayashi

IPC分类号： H01L21302

CPC分类号： H01L41/37 ,  H01L41/332 ,  Y10T29/42 ,  Y10T29/49155 ,  Y10T29/49156 ,  Y10T29/49165

摘要： A method of working a piezoelectric substance, which comprises the steps of, forming, on one surface of a piezoelectric block, an etching mask having an aperture which defines a boundary region between a first piezoelectric segment to be removed, and a second piezoelectric segment to be left remained, forming, on the opposite surface of the piezoelectric block, a sacrificial layer which corresponds to the first piezoelectric segment to be removed and the boundary region, etching the piezoelectric block in the boundary region to reach the sacrificial layer, and eliminating the sacrificial layer to remove the first piezoelectric segment.

摘要翻译： 一种压电物质的加工方法，其特征在于，在压电体块的一个面上形成具有限定了要去除的第一压电片段与第二压电片段之间的边界区域的孔的蚀刻掩模， 留下，在压电块的相对表面上形成对应于要去除的第一压电段和边界区域的牺牲层，蚀刻边界区域中的压电块以到达牺牲层，并且消除 牺牲层去除第一压电段。