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公开(公告)号：US20050000956A1
公开(公告)日：2005-01-06
申请号：US10711064
申请日：2004-08-20
CPC分类号： H01L21/67103 , H05B3/143 , H05B3/265
摘要： Ceramic susceptor whose wafer-retaining face has superior isothermal properties, and that is suited to utilization in apparatuses for manufacturing semiconductors and in liquid-crystal manufacturing apparatuses. In plate-shaped sintered ceramic body 1, resistive heating element 2 is formed. Fluctuation in pullback length L between sintered ceramic body outer-peripheral edge 1a and resistive heating element substantive-domain outer-peripheral edge 2a is within ±0.8%, while isothermal rating of the entire surface of the wafer-retaining face is ±1.0% or less. Preferable is a superior isothermal rating of ±0.5% or less that can be achieved by bringing the fluctuation in pullback length L to within ±0.5%.
摘要翻译： 其晶片保持面具有优异的等温性能，适用于半导体制造装置和液晶制造装置的陶瓷基座。 在板状烧结陶瓷体1中，形成电阻加热元件2。 烧结陶瓷体外周边缘1a和电阻加热元件本体外周边缘2a之间的回拉长度L的波动在±0.8％以内，而晶片保持面的整个表面的等温额定值为±1.0％ 减。 优选的等温额定值为±0.5％以下，通过使拉回长度L的波动在±0.5％以内可以实现。
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公开(公告)号：US06671489B2
公开(公告)日：2003-12-30
申请号：US10169129
申请日：2002-06-27
IPC分类号： G03G1520
CPC分类号： G03G15/2064 , G03G2215/2016 , G03G2215/2035
摘要： In a heating-type toner-fixing unit using a ceramic heater and a cylindrical fixing film, the shape of the fixing face-side surface of a ceramic heater 10 which comes into contact with a fixing film 3 and the shape of the portions of a heater support 12 at least adjacent to the fixing face-side surface are formed into a shape that is almost identical to a naturally deformed shape of the fixing film 3 in a static state or a traveling state where the fixing film is pressed by a pressure roller 4 at a designated nip width. It is also possible that the nip portion and portions adjacent thereto at the entrance side and exit side are formed into a flat shape and portions other than the flat portions are formed into a curved surface shape along the cylindrical shape of the fixing film 3.
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63.发明授权Wafer holder for semiconductor manufacturing apparatus, method of manufacturing wafer holder, and semiconductor manufacturing apparatus 有权用于半导体制造装置的晶片保持器，晶片保持器的制造方法以及半导体制造装置公开(公告)号：US06508884B2
公开(公告)日：2003-01-21
申请号：US09741477
申请日：2000-12-19
申请人： Akira Kuibira , Hirohiko Nakata , Kenjiro Higaki , Masuhiro Natsuhara , Takashi Ishii , Yasuyuki Matsui
发明人： Akira Kuibira , Hirohiko Nakata , Kenjiro Higaki , Masuhiro Natsuhara , Takashi Ishii , Yasuyuki Matsui
IPC分类号： C23C1600
CPC分类号： H01L21/6835 , C04B37/005 , C04B41/009 , C04B41/52 , C04B41/89 , C04B2237/06 , C04B2237/062 , C04B2237/064 , C04B2237/066 , C04B2237/08 , C04B2237/10 , C04B2237/122 , C04B2237/123 , C04B2237/125 , C04B2237/343 , C04B2237/366 , C04B2237/368 , C04B2237/52 , C04B2237/567 , C04B2237/62 , C04B2237/66 , C04B2237/704 , C04B2237/708 , C04B2237/72 , C04B2237/80 , H01L21/4857 , H01L21/67103 , C04B41/0072 , C04B41/4539 , C04B41/4572 , C04B41/5133 , C04B41/5022 , C04B35/581
摘要： A wafer holder for a semiconductor manufacturing apparatus that has a high heat conductivity and includes a conductive layer such as heater circuit pattern which can be formed with a high precision pattern, a method of manufacturing the wafer holder, and a semiconductor manufacturing apparatus having therein the wafer holder are provided. On a surface of a sintered aluminum nitride piece, paste containing metal particles is applied and fired to form a heater circuit pattern as a conductive layer. Between the surface of the sintered aluminum nitride piece having the heater circuit pattern formed thereon and another sintered aluminum nitride piece, a glass layer is provided as a joint layer to be heated for joining the sintered aluminum nitride pieces together.
摘要翻译： 一种用于半导体制造装置的晶片保持器，其具有高导热性并且包括可以以高精度图案形成的加热器电路图案的导电层，制造晶片保持器的方法，以及其中具有 提供晶片保持器。 在烧结的氮化铝片的表面上，涂覆含有金属颗粒的糊状物并烧制以形成作为导电层的加热器电路图案。 在其上形成有加热器电路图案的烧结氮化铝片的表面和另一个烧结的氮化铝片之间，设置玻璃层作为待烧结的接合层，以将烧结的氮化铝片接合在一起。
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64.发明授权Ceramic heater for toner-fixing units and method for manufacturing the heater 失效用于调色剂定影单元的陶瓷加热器和用于制造加热器的方法公开(公告)号：US06384378B2
公开(公告)日：2002-05-07
申请号：US09834642
申请日：2001-04-16
IPC分类号： H05B300
CPC分类号： G03G15/2053 , G03G15/2064 , H05B3/0095
摘要： A ceramic heater that is used in a toner-fixing system comprising a ceramic heater and a heat-resistant film, that reduces the degree of deformation of the heat-resistant film, that lightens the load applied to the film at the time of revolution, that prevents the fracture of the film, and that enables fixing at a high rate exceeding 24 ppm. A ceramic base material 11 of the ceramic heater attached to a heating cylinder comprises aluminum nitride or silicon nitride. A heating element 12 and current-feeding electrodes are made of heat-resistant metal such as tungsten and molybdenum or heat resistant alloy and are formed on the ceramic base material. In the ceramic heater, at least one part of the face (the fixing face) that contacts the heat-resistant film is curved when viewed from a direction perpendicular to the feeding direction of a copying sheet.
摘要翻译： 一种用于包括陶瓷加热器和耐热膜的调色剂定影系统中的陶瓷加热器，其减小了耐热膜的变形程度，从而减轻了在旋转时施加到膜上的载荷， 可以防止膜的断裂，能够以超过24ppm的高速率进行固定。 附着在加热缸上的陶瓷加热器的陶瓷基材11包括氮化铝或氮化硅。 加热元件12和馈电电极由诸如钨和钼的耐热金属或耐热合金制成并形成在陶瓷基材上。 在陶瓷加热器中，从与复印纸的进给方向垂直的方向观察时，与耐热膜接触的面（固定面）的至少一部分是弯曲的。
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65.发明授权公开(公告)号：US07554059B2
公开(公告)日：2009-06-30
申请号：US11518878
申请日：2006-09-12
CPC分类号： H05B3/143 , H01L21/67109
摘要： A ceramic heater attaining more uniform temperature distribution from the start to the end of cooling is provided. Further, in a cooling module used for cooling the heater, liquid leakage during use is prevented, degradation in cooling capability is prevented and the performance is maintained for a long period of use, and the manufacturing cost of the module is decreased. The ceramic heater includes a ceramic heater body and a cooling module cooling the heater body, and the cooling module has a structure formed by arranging a pipe in a trench formed in a plate-shaped structure.
摘要翻译： 提供了一种从开始到结束温度分布均匀的陶瓷加热器。 此外，在用于冷却加热器的冷却模块中，防止了使用期间的液体泄漏，防止了冷却能力的劣化，并且长时间使用时保持了性能，并且模块的制造成本降低。 陶瓷加热器包括陶瓷加热器主体和冷却加热器主体的冷却模块，并且冷却模块具有通过将管道设置在形成为板状结构的沟槽中而形成的结构。
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66.发明申请Wafer holder, heater unit used for wafer prober having the wafer holder, and wafer prober having the heater unit 审中-公开用于具有晶片保持器的晶片探测器的晶片保持器，加热器单元和具有加热器单元的晶片探测器公开(公告)号：US20090050621A1
公开(公告)日：2009-02-26
申请号：US11493919
申请日：2006-07-27
IPC分类号： H05B3/68
CPC分类号： H01L21/67103 , H05B3/148
摘要： A wafer holder that prevents positional deviation of the wafer mounted on the wafer-mounting surface of a chuck top and enables better thermal uniformity of the wafer, as well as a heater unit including the wafer holder and a wafer prober mounting these are provided. The wafer holder has a chuck top mounting and fixing the wafer and a supporter supporting the chuck top, and the chuck top has water absorption of at least 0.01% and preferably at least 0.1%. Preferable material of the chuck top is a composite of metal and ceramics, and particularly, a composite of aluminum and silicon carbide, or a composite of silicon and silicon carbide.
摘要翻译： 提供一种晶片保持器，其防止安装在卡盘顶部的晶片安装表面上的晶片的位置偏移，并且实现了晶片的更好的热均匀性，以及包括晶片保持器和安装它们的晶片探测器的加热器单元。 晶片保持器具有卡盘顶部，其安装并固定晶片和支撑卡盘顶部的支撑件，卡盘顶部具有至少0.01％，优选至少0.1％的吸水率。 卡盘顶部的优选材料是金属和陶瓷的复合材料，特别是铝和碳化硅的复合材料，或硅和碳化硅的复合物。
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公开(公告)号：US20080083732A1
公开(公告)日：2008-04-10
申请号：US11544636
申请日：2006-10-10
CPC分类号： H01L21/67103 , H01L21/67109
摘要： The present invention is a wafer holder including a heating plate 2 equipped with heating means such as a film-form/foil-form heat generating body 9 or the like, a cooling plate 3 equipped with cooling means such as a coolant passage 7 or the like, and temperature measurement means 4, wherein the heating plate 2 and cooling plate 3 are layered in a direction perpendicular to the wafer placement surface. The heating plate 2 is preferably disposed closer to the wafer placement surface than the cooling plate 3, and a heat conducting member 8 is disposed between the heating plate 2 and cooling plate 3.
摘要翻译： 本发明是一种晶片保持器，其包括装有诸如薄膜/箔形发热体9等加热装置的加热板2，具有冷却装置如冷却剂通道7的冷却板3或 和温度测量装置4，其中加热板2和冷却板3在垂直于晶片放置表面的方向上层叠。 加热板2优选地设置成比冷却板3更靠近晶片放置表面，并且在加热板2和冷却板3之间设置导热部件8。
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公开(公告)号：US07279048B2
公开(公告)日：2007-10-09
申请号：US10987304
申请日：2004-11-15
IPC分类号： G01R31/02 , H01L21/68 , C23C16/00 , C23C16/458
CPC分类号： C23C16/4586 , H01L21/67109
摘要： To provide a semiconductor manufacturing device, which is provided with a wafer holder capable of improving the cooling rate of a heater and retaining the homogeneity of the temperature distribution of the heater at cooling time and which can markedly shorten the time period for treating a semiconductor wafer.The wafer holder includes the heater 1 for carrying the semiconductor wafer thereon to heat the same, and the cooling block 2 for cooling the heater 1. The cooling block 2 is arranged so as to come into and out of abutment against the back 1b of the heater on the side opposed to the wafer carrying face 1a, and its abutment face 2a to abut against the heater 1 has a warpage of 1 mm or less. The cooling block 2 can be provided therein with a passage for a cooling liquid. It is preferred that the passage has a sectional area of 1 mm2 or larger over 80% of its entire length, and that the area of the portion having the passage formed is 3% or larger of the entire area of the abutment face 2a.
摘要翻译： 为了提供一种半导体制造装置，其具有能够提高加热器的冷却速度的晶片保持器，并且保持加热器在冷却时的温度分布的均匀性，并且可以显着缩短处理半导体晶片的时间段 。 晶片保持器包括用于在其上承载半导体晶片以加热其的加热器1和用于冷却加热器1的冷却块2。 冷却块2被布置成在与晶片承载面1a相对的一侧进入和离开加热器的背面1b，并且其抵靠加热器1的邻接面2a具有翘曲 为1mm以下。 冷却块2可以在其中设置有用于冷却液体的通道。 优选的是，通道的截面面积为其整个长度的80％以上的1mm 2以上，并且具有通路形状的部分的面积为整体的3％以上 邻接面2a的区域。
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公开(公告)号：US20070205788A1
公开(公告)日：2007-09-06
申请号：US11701417
申请日：2007-02-02
IPC分类号： G01R31/02
CPC分类号： G01R31/2865 , H01L21/68757
摘要： A wafer holder is provided having high rigidity and an enhanced heat-insulating effect that allow positional accuracy and heating uniformity to be improved, a chip to be rapidly heated and cooled, and the manufacturing cost to be reduced, and a wafer prober apparatus on which the wafer holder is mounted. The wafer holder of the present invention includes a chuck top for mounting a wafer, a support member for supporting the chuck top, and a stand for supporting the support member. The chuck top has a thermal conductivity K1 and a Young's modulus Y1; the support member has a thermal conductivity K2 and a Young's modulus Y2; and the stand has a thermal conductivity K3 and a Young's modulus Y3. K1>K2 and K1>K3; and Y3>Y1 and Y3>Y2.
摘要翻译： 提供了具有高刚性和增强的隔热效果的晶片保持器，其允许提高位置精度和加热均匀性，快速加热和冷却的芯片，以及降低的制造成本，以及晶片探测器装置，其上 安装晶片保持架。 本发明的晶片保持器包括用于安装晶片的卡盘顶部，用于支撑卡盘顶部的支撑构件和用于支撑支撑构件的支架。 卡盘顶部具有热导率K 1和杨氏模量Y 1; 支撑构件具有热导率K 2和杨氏模量Y 2; 并且支架具有导热系数K 3和杨氏模量Y 3。 K 1> K 2和K 1> K 3; Y 3> Y 1，Y 3> Y 2。
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70.发明申请公开(公告)号：US20070095291A9
公开(公告)日：2007-05-03
申请号：US10709889
申请日：2004-06-03
IPC分类号： C23C16/00
CPC分类号： H01L21/68757 , C23C16/4581 , C23C16/4586 , H01L21/68785 , H05B3/12 , H05B3/143
摘要： Affords a holder for use in semiconductor or liquid-crystal manufacturing devices—as well as semiconductor or liquid-crystal manufacturing devices in which the holder is installed—in which temperature uniformity in the processed-object retaining face is heightened. Configuring the holder with, furnished atop a ceramic susceptor, a composite of a ceramic and a metal improves the temperature uniformity in the holder's processed-object retaining face and makes for curtailing the generation of particulates and other contaminants. In addition, putting a coating on at least the retaining face improves the durability of the holder. Installing a holder of this sort in a semiconductor manufacturing device or a liquid-crystal manufacturing device contributes to making available semiconductor or liquid-crystal manufacturing devices whose productivity and throughput are excellent.
摘要翻译： 提供用于半导体或液晶制造装置的保持器以及其中安装保持器的半导体或液晶制造装置，其中加工对象保持面的温度均匀性提高。 配置陶瓷基座上的支架，陶瓷和金属的复合材料，可提高保持器的加工对象保持面的温度均匀性，并减少微粒和其他污染物的产生。 另外，至少在保持面上涂上涂层，提高了保持体的耐久性。 在半导体制造装置或液晶制造装置中安装这样的支架有助于制造生产率和生产率优异的半导体或液晶制造装置。
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