Method and system for driving interferometric modulators
    61.
    发明申请
    Method and system for driving interferometric modulators 失效
    用于驱动干涉式调制器的方法和系统

    公开(公告)号:US20060067653A1

    公开(公告)日:2006-03-30

    申请号:US11218887

    申请日:2005-09-02

    IPC分类号: G02B6/00

    摘要: Systems and methods for driving a display of MEMS devices are disclosed. In one embodiment, a display includes an array comprising a plurality of interferometric modulators, and a driving circuit coupled to said array, said driving circuit configured to provide actuation signals to drive said array based on a temperature of the display. In another embodiment, a method of driving an array having a plurality of interferometric modulators configured into a display is disclosed, where the method includes sensing the temperature at a predetermined location in display, communicating a signal based on the sensed temperature to a display driver, generating an actuation signal to drive said display based on the received signal, and providing the actuation signal to the array.

    摘要翻译: 公开了用于驱动MEMS器件的显示器的系统和方法。 在一个实施例中,显示器包括包括多个干涉式调制器的阵列和耦合到所述阵列的驱动电路,所述驱动电路被配置为基于显示器的温度提供驱动信号以驱动所述阵列。 在另一个实施例中,公开了一种驱动具有配置到显示器中的多个干涉式调制器的阵列的方法,其中该方法包括感测显示器中的预定位置处的温度,基于感测到的温度将信号传送到显示驱动器, 产生致动信号以基于接收到的信号驱动所述显示器,并向阵列提供致动信号。

    Process control monitors for interferometric modulators
    63.
    发明授权
    Process control monitors for interferometric modulators 有权
    过程控制监视器用于干涉式调制器

    公开(公告)号:US07259865B2

    公开(公告)日:2007-08-21

    申请号:US11281136

    申请日:2005-11-17

    IPC分类号: G01B9/02

    摘要: Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.

    摘要翻译: 公开了使用用于制造MEMS器件的至少一些相同工艺步骤制造的过程控制监视器。 过程控制监视器的分析可以提供关于MEMS器件和器件中的部件或子部件的属性的信息。 该信息可用于识别处理中的错误或优化MEMS器件。 在一些实施例中,过程控制监视器的分析可以利用光学测量。

    Method and device for manipulating color in a display
    66.
    发明申请
    Method and device for manipulating color in a display 失效
    用于操纵显示器中的颜色的方法和装置

    公开(公告)号:US20060077124A1

    公开(公告)日:2006-04-13

    申请号:US11178211

    申请日:2005-07-08

    IPC分类号: G09G3/00

    摘要: A method and device for manipulating color in a display includes a display in which one or more of the pixels includes one or more display elements, such as interferometric modulators, configured to output colored light and one or more display elements configured to output white light. Other embodiments include methods of making such displays. In addition, embodiments include color displays configured to provide a greater proportion of the intensity of output light in green portions of the visible spectrum in order to increase perceived brightness of the display.

    摘要翻译: 用于操纵显示器中的颜色的方法和装置包括其中一个或多个像素包括一个或多个显示元件(诸如干涉式调制器)的显示器,其被配置为输出彩色光和被配置为输出白光的一个或多个显示元件。 其他实施例包括制造这种显示器的方法。 此外,实施例包括被配置为在可见光谱的绿色部分中提供更大比例的输出光强度以便增加显示器的感知亮度的彩色显示器。

    Device and method for wavelength filtering
    67.
    发明申请
    Device and method for wavelength filtering 有权
    用于波长滤波的设备和方法

    公开(公告)号:US20060067633A1

    公开(公告)日:2006-03-30

    申请号:US11213659

    申请日:2005-08-26

    IPC分类号: G02B6/10

    摘要: Embodiments include devices and methods for wavelength filtering. For example, one embodiment includes a display comprising a plurality of the display elements each comprising a movable reflector, a first partial reflector, and a second partial reflector. The first partial reflector is positioned at a first distance from the movable reflector and forms a first optical resonant cavity therebetween. The second partial reflector is positioned at a second distance from said first partial reflector and forming a second optical resonant cavity therebetween. In various embodiments, the movable reflector is movable with respect to the first partial reflector to alter the first optical cavity. Other embodiments include a method of making devices.

    摘要翻译: 实施例包括用于波长过滤的装置和方法。 例如,一个实施例包括包括多个显示元件的显示器,每个显示元件包括可移动反射器,第一部分反射器和第二部分反射器。 第一部分反射器位于与可移动反射器第一距离处,并在其间形成第一光学谐振腔。 第二部分反射器位于离所述第一部分反射体的第二距离处,并在其间形成第二光学谐振腔。 在各种实施例中,可移动反射器可相对于第一部分反射器移动以改变第一光学腔。 其他实施例包括制造设备的方法。

    Display element having filter material diffused in a substrate of the display element

    公开(公告)号:US20060067600A1

    公开(公告)日:2006-03-30

    申请号:US11213644

    申请日:2005-08-19

    IPC分类号: H01L21/00 G02F1/035

    CPC分类号: G02B26/001

    摘要: Optical filter functionality is incorporated into a substrate of a display element thereby decreasing the need for a separate thin film filter and, accordingly, reducing a total thickness of a filtered display element. Filter functionality may be provided by any filter material, such as pigment materials, photoluminescent materials, and opaque material, for example. The filter material may be incorporated in the substrate at the time of creating the substrate or may be selectively diffused in the substrate through a process of masking the substrate, exposing the substrate to the filter material, and heating the substrate in order to diffuse the filter material in the substrate.

    Process for modifying offset voltage characteristics of an interferometric modulator

    公开(公告)号:US20060066935A1

    公开(公告)日:2006-03-30

    申请号:US11208052

    申请日:2005-08-19

    IPC分类号: G02B26/00

    摘要: An interferometric modulator manufactured according to a particular set of processing parameters may have a non-zero offset voltage. A process has been developed for modifying the processing parameters to shift the non-zero offset voltage closer to zero. For example, the process may involve identifying a set of processing parameters for manufacturing an interferometric modulator that results in a non-zero offset voltage for the interferometric modulator. The set of processing parameters may then be modified to shift the non-zero offset voltage closer to zero. For example, modifying the set of processing parameters may involve modifying one or more deposition parameters used to make the interferometric modulator, applying a current (e.g., a counteracting current) to the interferometric modulator, and/or annealing the interferometric modulator. Interferometric modulators made according to the set of modified processing parameters may have improved performance and/or simpler drive schemes.