公开(公告)号：US07855827B2

公开(公告)日：2010-12-21

申请号：US11544978

申请日：2006-10-06

Applicant: Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

Inventor： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

IPC: G02B26/00 ,  G02F1/29

CPC classification number: G02B6/0011 ,  G02B6/0038 ,  G02B6/0055 ,  G02B26/001 ,  G09G3/3466

Abstract: An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.

Abstract translation: 在显示元件和用于显示元件的透明基板之间的显示器中并入光学隔离结构。 光学隔离结构反射基板内的光线相对于结构垂直地以高角度冲击结构，从而允许基板用作集成光导，用于将光从光源的边缘分布在显示器上 底物。 光隔离结构可以包括具有小于衬底或多个薄膜干涉层的折射率的单层。

公开(公告)号：US07855824B2

公开(公告)日：2010-12-21

申请号：US11036966

申请日：2005-01-14

Applicant: Brian Gally

Inventor： Brian Gally

IPC: G02B26/00 ,  G09G5/10

CPC classification number: G02B26/001 ,  Y10T29/49117

Abstract: Disclosed herein are iMoD displays optimized by utilizing different materials for one or more different color subpixels. Such optimized displays have improved color gamut over displays where all subpixels are constructed with the same material. Also disclosed are methods for manufacturing such displays and methods for optimizing iMoD displays.

Abstract translation: 本文公开了通过利用用于一个或多个不同颜色子像素的不同材料来优化的iMoD显示器。 这种优化的显示器在显示器上具有改善的色域，其中所有子像素由相同的材料构成。 还公开了用于制造这种显示器的方法和用于优化iMoD显示器的方法。

公开(公告)号：US07532385B2

公开(公告)日：2009-05-12

申请号：US10807128

申请日：2004-03-24

Applicant: Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

Inventor： Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

IPC: G02B26/00 ,  H01L21/00

CPC classification number: G02B26/001 ,  B81B7/0012 ,  B81B2201/045

Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.

Abstract translation: 第一电极和牺牲层依次形成在基板上，然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中，然后在牺牲层和支撑件上形成第二电极，从而形成微机电系统结构。 之后，使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构，并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层，以便在光学干涉反射结构中形成空腔。 最后，关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。

公开(公告)号：US07417735B2

公开(公告)日：2008-08-26

申请号：US11198603

申请日：2005-08-05

Applicant: William Cummings ,  Brian Gally

Inventor： William Cummings ,  Brian Gally

IPC: G01N21/27 ,  G01J3/50 ,  G01J1/16 ,  G02B26/02 ,  G02F1/21

CPC classification number: H04N9/3194 ,  G02B26/001 ,  H04N17/02

Abstract: Disclosed herein are systems and methods for measuring color and contrast in specular reflective devices such as interferometric modulators. To make color and contrast determinations, light reflected from a specular reflective device may be measured in-line with illumination of the device. The measurements may include measuring the spectra of light reflected from the device being tested as well as from specular bright and dark standards. The spectra may be used to determine a reflectance spectrum and color parameters for the specular reflective device.

Abstract translation: 本文公开了用于测量镜面反射装置（例如干涉式调制器）中的颜色和对比度的系统和方法。 为了进行颜色和对比度测定，可以与装置的照明一起测量从镜面反射装置反射的光。 测量可以包括测量从被测设备反射的光的光谱以及镜面明暗标准。 光谱可用于确定镜面反射装置的反射光谱和颜色参数。

公开(公告)号：US20080115596A1

公开(公告)日：2008-05-22

申请号：US12021218

申请日：2008-01-28

Applicant: Brian Gally ,  Lauren Palmateer ,  Manish Kothari ,  Williams Cummings

Inventor： Brian Gally ,  Lauren Palmateer ,  Manish Kothari ,  Williams Cummings

IPC: G01G9/00

CPC classification number: B81C99/0045 ,  G01M3/002 ,  G01M3/02 ,  G01M3/186 ,  G01M3/229 ,  G02B26/001 ,  Y10T29/49002

Abstract: One embodiment provides a method of testing humidity. The method includes measuring i) a first weight of a first device which encloses a plurality of interferometric modulators and ii) a second weight of a second device which encloses a plurality of interferometric modulators, wherein the first and second devices contain a different amount of water vapor. The method further includes comparing the weights of the first and second devices and determining a relative humidity value or a degree of the relative humidity inside one of the two devices based at least in part upon the weight comparison. In one embodiment, the relative humidity value or degree is determined considering at least one of the following parameters: i) temperature-humidity combination inside at least one of the devices, ii) the thickness and width of a seal of the at least one device, iii) adhesive permeability of a component of the at least one device, iv) a desiccant capacity inside the at least one device and v) a device size.

Abstract translation: 一个实施例提供了测试湿度的方法。 该方法包括测量i）包围多个干涉式调制器的第一装置的第一权重和ii）封闭多个干涉式调制器的第二装置的第二权重，其中第一和第二装置含有不同量的水 汽。 该方法还包括比较第一和第二装置的重量，并且至少部分地基于重量比较来确定两个装置之一内的相对湿度值或相对湿度的程度。 在一个实施例中，考虑以下参数中的至少一个来确定相对湿度值或度数：i）至少一个装置内的温度 - 湿度组合，ii）至少一个装置的密封件的厚度和宽度 ，iii）所述至少一个装置的部件的粘合剂渗透性，iv）所述至少一个装置内的干燥剂容量，以及v）装置尺寸。

公开(公告)号：US07369252B2

公开(公告)日：2008-05-06

申请号：US11281758

申请日：2005-11-17

Applicant: William Cummings ,  Brian Gally

Inventor： William Cummings ,  Brian Gally

IPC: G01B9/02 ,  G01B11/02 ,  G02B26/00

CPC classification number: B81C99/004 ,  B81B2201/042 ,  G01N21/55 ,  G01N21/9501 ,  G02B26/001

Abstract: Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.

Abstract translation: 公开了使用用于制造MEMS器件的至少一些相同工艺步骤制造的过程控制监视器。 过程控制监视器的分析可以提供关于MEMS器件和器件中的部件或子部件的属性的信息。 该信息可用于识别处理中的错误或优化MEMS器件。 在一些实施例中，过程控制监视器的分析可以利用光学测量。

公开(公告)号：US20080093688A1

公开(公告)日：2008-04-24

申请号：US11961744

申请日：2007-12-20

Applicant: William Cummings ,  Brian Gally

Inventor： William Cummings ,  Brian Gally

IPC: H01L29/84 ,  H01L21/00

CPC classification number: G09G3/3466 ,  G02B26/001 ,  G09G2320/0204

Abstract: An interferometric modulator manufactured according to a particular set of processing parameters may have a non-zero offset voltage. A process has been developed for modifying the processing parameters to shift the non-zero offset voltage closer to zero. For example, the process may involve identifying a set of processing parameters for manufacturing an interferometric modulator that results in a non-zero offset voltage for the interferometric modulator. The set of processing parameters may then be modified to shift the non-zero offset voltage closer to zero. For example, modifying the set of processing parameters may involve modifying one or more deposition parameters used to make the interferometric modulator, applying a current (e.g., a counteracting current) to the interferometric modulator, and/or annealing the interferometric modulator. Interferometric modulators made according to the set of modified processing parameters may have improved performance and/or simpler drive schemes.

Abstract translation: 根据特定一组处理参数制造的干涉式调制器可以具有非零偏移电压。 已经开发了一种用于修改处理参数以将非零偏移电压更接近零的过程。 例如，该过程可以涉及识别用于制造干涉式调制器的一组处理参数，其导致用于干涉式调制器的非零偏移电压。 然后可以修改该组处理参数以使非零偏移电压更接近零。 例如，修改处理参数集合可以包括修改用于制造干涉式调制器的一个或多个沉积参数，向干涉式调制器施加电流（例如，抵消电流）和/或退火干涉式调制器。 根据经修改的处理参数的集合制造的干涉式调制器可以具有改进的性能和/或更简单的驱动方案。

公开(公告)号：US20060077381A1

公开(公告)日：2006-04-13

申请号：US11281763

申请日：2005-11-17

Applicant: William Cummings ,  Brian Gally

Inventor： William Cummings ,  Brian Gally

IPC: G01N21/88

CPC classification number: B81C99/004 ,  B81B2201/042 ,  G01N21/55 ,  G01N21/9501 ,  G02B26/001

Abstract: Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.

公开(公告)号：US20060077123A1

公开(公告)日：2006-04-13

申请号：US11156335

申请日：2005-06-17

Applicant: Brian Gally ,  William Cummings

Inventor： Brian Gally ,  William Cummings

IPC: G09G3/00

CPC classification number: G02B26/001 ,  G02B6/0053 ,  Y02D70/10 ,  Y02D70/20

Abstract: In various embodiments of the invention, an interferometric display device is provided having an external film with a plurality of structures that reduce the field-of-view of the display. These structures may comprise, for example, baffles or non-imaging optical elements such as compound parabolic collectors. The baffles may comprise a plurality of vertically aligned surfaces arranged, e.g., in a grid. In certain preferred embodiments these baffles are opaque or reflective. These vertical surfaces, therefore, can substantially block light from exiting the interferometric display device in a substantially non-perpendicular direction. These vertical surfaces may, however, permit light directed in a substantially vertical direction to exit the display. The non-imaging optical elements, e.g., compound parabolic collectors, redirect light from large incident angles into more normal angles towards the display. As a result, the light reflected by the display to the user is also at a more normal angle.

公开(公告)号：US20060067645A1

公开(公告)日：2006-03-30

申请号：US11173822

申请日：2005-07-01

Applicant: Brian Gally ,  Lauren Palmateer ,  Manish Kothari ,  William Cummings

Inventor： Brian Gally ,  Lauren Palmateer ,  Manish Kothari ,  William Cummings

IPC: G02B6/00

CPC classification number: B81C99/0045 ,  G01M3/002 ,  G01M3/02 ,  G01M3/186 ,  G01M3/229 ,  G02B26/001 ,  Y10T29/49002

Abstract: One embodiment provides a method of testing humidity, comprising: determining a property of a device which encloses a plurality of interferometric modulators; and determining a relative humidity value or a degree of the relative humidity inside the device based at least in part upon the determined property. In one embodiment, the property of the device includes one of the following: i) a weight of the device, ii) a color change of a desiccant enclosed in the device, iii) a resistance inside the device, iv) whether frost formed in an inside area of the device which is contacted by a cold finger device, v) whether a desiccant enclosed in the device, when water vapor is provided into the device, is working properly, and vi) combination of at lest two of i)-v).

Abstract translation: 一个实施例提供一种测试湿度的方法，包括：确定包围多个干涉式调制器的装置的属性; 以及至少部分地基于所确定的属性来确定所述装置内的相对湿度值或相对湿度的程度。 在一个实施例中，设备的特性包括以下之一：i）设备的重量，ii）封装在设备中的干燥剂的颜色变化，iii）设备内部的电阻，iv）是否形成 设备的内部区域，其由冷指装置接触，v）当在设备中提供水蒸气时，包封在设备中的干燥剂是否正常工作，以及vi）至少两个组合，i） - v）。