中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

98 records (took 0.015 seconds)

    Method for producing a grating and phase contrast X-ray system
    71.
    发明授权
    Method for producing a grating and phase contrast X-ray system 有权
    光栅和相差X射线系统的制造方法

    公开(公告)号：US08649483B2

    公开(公告)日：2014-02-11

    申请号：US13184853

    申请日：2011-07-18

    Applicant: Martin Hoheisel

    Inventor： Martin Hoheisel

    IPC: G21K1/06 ,  H01L21/02

    CPC classification number: G21K1/06 ,  G03F7/0047 ,  G03F7/164 ,  G21K1/02 ,  G21K2207/005

    Abstract: A method is described for producing a grating, in particular an absorption grating, having a grating constant of less than 100 μm, by using a solution of superparamagnetic colloidal nanocrystal clusters (CNCs), a solvent liquid and a photocurable resin, with the following steps: —alignment of the CNCs in the solution by an external magnetic field, —exposure of the solution, so that the resin is cured and grating structures of an intended grating constant are formed, and —removal of the magnetic field.

    Abstract translation: 描述了通过使用超顺磁性胶体纳米晶簇（CNCs），溶剂液体和光固化树脂的溶液来制备具有小于100μm的光栅常数的光栅，特别是吸收光栅的方法，具有以下步骤 ：通过外部磁场将溶液中的CNC对准，溶液的曝光，使得树脂被固化并形成预期的光栅常数的光栅结构，并且去除磁场。

    Method for protecting a display facility
    72.
    发明授权
    Method for protecting a display facility 有权
    保护展示设施的方法

    公开(公告)号：US08361263B2

    公开(公告)日：2013-01-29

    申请号：US12622929

    申请日：2009-11-20

    Applicant: Martin Hoheisel

    Inventor： Martin Hoheisel

    IPC: B32B37/00

    CPC classification number: A61B46/10 ,  A61B90/40 ,  B29C63/0056 ,  Y10T428/14

    Abstract: The invention relates to a device for protecting a display facility, comprising a protective element for covering an image surface of the display facility. As the protective element is designed to be transparent and the retaining means are provided for the exchangeable arrangement of the protective element in front of the image surface, a protective device is provided, which allows the image surface to be examined and is easy to operate.

    Abstract translation: 本发明涉及一种用于保护显示设备的设备，包括用于覆盖显示设备的图像表面的保护元件。 由于保护元件被设计为透明的并且为图像表面之前的保护元件的可更换布置提供了保持装置，因此提供了保护装置，这允许检查图像表面并且易于操作。

    Method for Producing a Grating and Phase Contrast X-Ray System
    73.
    发明申请
    Method for Producing a Grating and Phase Contrast X-Ray System 有权
    生产光栅和相位对比X射线系统的方法

    公开(公告)号：US20120014511A1

    公开(公告)日：2012-01-19

    申请号：US13184853

    申请日：2011-07-18

    Applicant: Martin Hoheisel

    Inventor： Martin Hoheisel

    IPC: G21K3/00 ,  G02B1/12 ,  B82Y25/00 ,  B82Y20/00

    CPC classification number: G21K1/06 ,  G03F7/0047 ,  G03F7/164 ,  G21K1/02 ,  G21K2207/005

    Abstract: A method is described for producing a grating, in particular an absorption grating, having a grating constant of less than 100 μm, by using a solution of superparamagnetic colloidal nanocrystal clusters (CNCs), a solvent liquid and a photocurable resin, with the following steps:—alignment of the CNCs in the solution by an external magnetic field,—exposure of the solution, so that the resin is cured and grating structures of an intended grating constant are formed, and—removal of the magnetic field.

    Abstract translation: 描述了通过使用超顺磁性胶体纳米晶簇（CNCs），溶剂液体和光固化树脂的溶液来制造具有小于100μm的光栅常数的光栅，特别是吸收光栅的方法，具有以下步骤 ：通过外部磁场将溶液中的CNC对准，溶液的曝光，使树脂固化并形成预期光栅常数的光栅结构，并除去磁场。

    X-ray absorption grid
    76.
    发明授权
    X-ray absorption grid 有权
    X射线吸收网格

    公开(公告)号：US07787596B2

    公开(公告)日：2010-08-31

    申请号：US12126112

    申请日：2008-05-23

    Applicant: Eckhard Hempel ,  Martin Hoheisel ,  Stefan Popescu

    Inventor： Eckhard Hempel ,  Martin Hoheisel ,  Stefan Popescu

    IPC: G21K1/00

    CPC classification number: G01N23/046 ,  G01N2223/419 ,  G21K1/025 ,  G21K1/10 ,  G21K2207/005

    Abstract: An x-ray absorption grid produced by a lithography method for use in a phase-contrast CT system has at least two individual grids arranged atop one another in the radiation direction. Each individual grid has a grid area with a grid structure including grid webs and grid gaps in alternation. Each individual grid has a region outside of the grid area (outer region). The outer region of the at least two individual grids has toothed structures corresponding to one another at least two points. The toothed structures are generated as well in the production of the grid structure. The toothed structures have a position that is defined relative to the grid structure, such that a defined alignment of the individual grids occurs given a combination of the individual grids by engagement of the toothed structures of individual grids lying atop one another.

    Abstract translation: 通过用于相位对比CT系统的光刻方法产生的x射线吸收格栅具有沿辐射方向彼此上下排列的至少两个单独的栅格。 每个单独的网格具有网格结构的网格区域，包括网格网格和网格间隙。 每个单独的网格具有在网格区域之外的区域（外部区域）。 至少两个单独网格的外部区域具有至少两个点彼此对应的齿形结构。 在电网结构的生产中也产生齿形结构。 齿形结构具有相对于网格结构限定的位置，使得通过各个格栅的齿形结构彼此顶部的啮合，各个格栅的组合发生了单独格栅的限定对齐。

    ARRANGEMENT AND METHOD FOR PROJECTIVE AND/OR TOMOGRAPHIC PHASE-CONTRAST IMAGING USING X-RAY RADIATION
    77.
    发明申请
    ARRANGEMENT AND METHOD FOR PROJECTIVE AND/OR TOMOGRAPHIC PHASE-CONTRAST IMAGING USING X-RAY RADIATION 有权
    使用X射线辐射进行投影和/或TOMOGRAPHIC相位对比成像的布置方法

    公开(公告)号：US20100177864A1

    公开(公告)日：2010-07-15

    申请号：US12686404

    申请日：2010-01-13

    Applicant: Tilman Donath ,  Martin Hoheisel ,  Christian David ,  Eckhard Hempel ,  Franz Pfeiffer ,  Stefan Popescu

    Inventor： Tilman Donath ,  Martin Hoheisel ,  Christian David ,  Eckhard Hempel ,  Franz Pfeiffer ,  Stefan Popescu

    IPC: H05G1/60 ,  G06K9/00

    CPC classification number: G03B42/02 ,  A61B6/032 ,  A61B6/4291 ,  A61B6/484

    Abstract: An arrangement and a method are disclosed for projective and/or tomographic phase-contrast imaging using X-ray radiation. In at least one embodiment, one or more phase grids is/are arranged in the beam path such that during a rotation of the at least one X-ray source, the examination object is scanned with different spatial orientations of the grid lines relative to the examination object such that the complete refraction angle, and hence the complete phase shift gradient, can be determined for each X-ray beam from the two scans with differently oriented phase grids in order to be able to show the phase shift of an examination object in terms of projections or in a tomographic image.

    Abstract translation: 公开了用于使用X射线辐射的投影和/或断层扫描相位对比成像的布置和方法。 在至少一个实施例中，在所述光束路径中布置一个或多个相位栅格，使得在所述至少一个X射线源的旋转期间，所述检查对象以相对于所述栅格线的不同的空间取向被扫描 可以从具有不同定向相位网格的两次扫描中确定每个X射线束的完整折射角，从而完整的相移梯度，以便能够显示检查对象的相移 投影术语或断层图像。

    X-RAY CT SYSTEM FOR X-RAY PHASE CONTRAST AND/OR X-RAY DARK FIELD IMAGING
    78.
    发明申请
    X-RAY CT SYSTEM FOR X-RAY PHASE CONTRAST AND/OR X-RAY DARK FIELD IMAGING 有权
    用于X射线相位对比和/或X射线暗场成像的X射线CT系统

    公开(公告)号：US20100091936A1

    公开(公告)日：2010-04-15

    申请号：US12570178

    申请日：2009-09-30

    Applicant: Christian David ,  Tilman Donath ,  Eckhard Hempel ,  Martin Hoheisel ,  Franz Pfeiffer ,  Stefan Popescu

    Inventor： Christian David ,  Tilman Donath ,  Eckhard Hempel ,  Martin Hoheisel ,  Franz Pfeiffer ,  Stefan Popescu

    IPC: H05G1/60

    CPC classification number: G01N23/046 ,  A61B6/032 ,  A61B6/06 ,  A61B6/4291 ,  A61B6/483 ,  A61B6/484 ,  G01N2223/419 ,  G01N2223/612 ,  G21K2207/005

    Abstract: An x-ray CT system for x-ray phase contrast and/or x-ray dark field imaging has a grating interferometer that has a first grating structure that has a number of band-shaped x-ray emission maxima and minima arranged in parallel, the maxima and minima exhibiting a first grating period, a second band-shaped grating structure that produces, as a phase grating, a partial phase offset of x-ray radiation passing therethrough and that exhibits a second grating period, a third band-shaped grating structure with a third grating period with which relative phase shifts of adjacent x-rays and/or their scatter components are detected, and a device for value-based determination of the phase between adjacent x-rays and/or for value-based determination of the spatial intensity curve per detector element perpendicular to the bands of the grating structures. The third grating structure has a grating period that is larger by a factor of 2 to 5 than the grating period of the first grating structure.

    Abstract translation: 用于x射线相位对比和/或x射线暗场成像的X射线CT系统具有光栅干涉仪，该光栅干涉仪具有第一光栅结构，该第一光栅结构具有平行布置的多个带状x射线发射最大值和最小值， 显示第一光栅周期的最大值和最小值;第二带状光栅结构，其产生通过其中的X射线辐射的部分相位偏移作为相位光栅，并且具有第二光栅周期;第三带状光栅 具有第三光栅周期的结构，利用该第三光栅周期检测相邻x射线和/或其散射分量的相对相移，以及用于基于值的确定相邻x射线之间的相位和/或基于值的确定的装置 每个检测器元件垂直于光栅结构的带的空间强度曲线。 第三光栅结构具有比第一光栅结构的光栅周期大2至5倍的光栅周期。

    X-RAY CT SYSTEM TO GENERATE TOMOGRAPHIC PHASE CONTRAST OR DARK FIELD EXPOSURES
    79.
    发明申请
    X-RAY CT SYSTEM TO GENERATE TOMOGRAPHIC PHASE CONTRAST OR DARK FIELD EXPOSURES 有权
    X射线CT系统用于生成TOMOGRAPHIC相位对比或暗场暴露

    公开(公告)号：US20100080341A1

    公开(公告)日：2010-04-01

    申请号：US12566053

    申请日：2009-09-24

    Applicant: Stefan Popescu ,  Christian David ,  Tilman Donath ,  Eckhard Hempel ,  Martin Hoheisel ,  Franz Pfeiffer

    Inventor： Stefan Popescu ,  Christian David ,  Tilman Donath ,  Eckhard Hempel ,  Martin Hoheisel ,  Franz Pfeiffer

    IPC: H05G1/60

    CPC classification number: A61B6/484 ,  A61B6/032 ,  A61B6/08 ,  A61B6/4233 ,  A61B6/4291 ,  A61B6/4435 ,  G21K2207/005

    Abstract: An x-ray CT system that generates tomographic phase contrast or dark field exposures, has at least one grating interferometer with three grating structures arranged in series in the radiation direction, with a modular design of the second and third grating structures. The distance between the first grating structure of the x-ray source and the second grating structure (fashioned as a phase grating) of the respective grating/detector modules is adapted, depending on the fan angle, corresponding to a period of the grating structure of the x-ray source projected onto the grating detector module at a respective fan angle (φi).

    Abstract translation: 产生断层相位对比或暗场曝光的X射线CT系统具有至少一个光栅干涉仪，其具有沿辐射方向串联设置的三个光栅结构，具有第二和第三光栅结构的模块化设计。 相应的光栅/检测器模块的X射线源的第一光栅结构和第二光栅结构（被形成为相位光栅）之间的距离根据扇形角度而适应，对应于光栅结构的周期 X射线源以相应的风扇角度投影到光栅检测器模块上（＆amp; i）。

Patent Agency Ranking