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公开(公告)号：US11346790B1
公开(公告)日：2022-05-31
申请号：US17110210
申请日：2020-12-02
Applicant: Onto Innovation Inc.
Inventor： Amit Shachaf , Daniel Thompson , John F. Lesoine
Abstract: The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system. The focusing system uses an image of the light reflected from the measurement spot to determine a best focal position at a desired position of the sample. The focusing system selects a characteristic of reflected light, such as polarization state or wavelengths, to use for focusing. The characteristic of the reflected light that is selected for use in determining focal position is affected different by different portions of the sample. For example, light reflected from a top surface of a sample may have a different characteristic than light reflected by an underlying layer. The selected characteristic of the reflected light is used by the focusing system to focus the measurement spot at the top surface or an underlying layer of the sample.
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公开(公告)号：US11126096B2
公开(公告)日：2021-09-21
申请号：US16650359
申请日：2018-09-28
Applicant: Onto Innovation, Inc.
Inventor： Elvino Da Silveira , Keith Frank Best , Wayne Fitzgerald , Jian Lu , Xin Song , J. Casey Donaher , Christopher J. McLaughlin
Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
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公开(公告)号：US10935501B2
公开(公告)日：2021-03-02
申请号：US16197737
申请日：2018-11-21
Applicant: ONTO INNOVATION INC.
Inventor： Nigel P. Smith
IPC: G01N21/88 , G01B9/02 , G01N21/956 , G02B27/28 , G02B21/14 , G01N21/94 , G01N21/21 , G01N21/95 , H01L21/66 , G02B27/58
Abstract: An optical metrology device, such as an interferometer, detects sub-resolution defects on a sample, i.e., defects that are smaller than a pixel in the detector array of the interferometer. The optical metrology device obtains optical metrology data at each pixel in at least one detector array and determines parameter values of a signal model for a pixel of interest using the optical metrology data received by a plurality of pixels neighboring a pixel of interest. A residual for the pixel of interest is determined using the optical metrology data received by the pixel of interest and determined parameter values for the signal model for the pixel of interest. A defect, which may be smaller than the pixel of interest can then be detected based on the residual for the pixel of interest.
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公开(公告)号：US10914916B2
公开(公告)日：2021-02-09
申请号：US15910948
申请日：2018-03-02
Applicant: ONTO INNOVATION INC.
Inventor： Andrew Saul Klassen , Paul Doyle
Abstract: An elongated rectangular Rochon polarizer, e.g., having a height to width or depth ratio of at least 2.5, is securely held in a non-adhesive mounting assembly. The mounting assembly includes a plurality of compression elements that press the Rochon polarizer against corresponding reference points to properly align the Rochon polarizer within the mounting assembly. Moreover, air gaps between the Rochon polarizer and the sidewalls of the mounting assembly are provided to minimize thermal conduction between the mounting assembly and the Rochon polarizer and to provide thermal convection to cool the Rochon polarizer, thereby reducing risk of catastrophic delamination of the Rochon polarizer due to thermal effects.
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公开(公告)号：US10830709B2
公开(公告)日：2020-11-10
申请号：US16197929
申请日：2018-11-21
Applicant: ONTO INNOVATION INC.
Inventor： Nigel P. Smith
Abstract: An interferometer uses a phase shift mask that includes an array of pixels that are aligned with a corresponding array of pixels of a detector. Each pixel in the phase shift mask is adapted to produce one of a number of predetermined phase shifts between a test beam and a reference beam. For example, the pixels may be linear polarizers or phase delay elements having one of the number of polarizer orientations or phase delays to produce the predetermined phase shifts between the test beam and the reference beam. The pixels in the phase shift mask are arranged in the array to include each of the predetermined phase shifts in repeating pixel groups in rows that are one column wide, columns that are one row high, or blocks of multiple rows and columns.
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Patent Agency Ranking
公开(公告)号：US10775149B1
公开(公告)日：2020-09-15
申请号：US16352724
申请日：2019-03-13
Applicant: ONTO INNOVATION INC.
Inventor： George Andrew Antonelli , Troy Daniel Ribaudo
Abstract: An optical metrology device produces light in a spectral range for measurement of a sample using a tunable Quantum Cascade Laser (QCL). The optical metrology device includes a second channel that is used to diagnose when the tunable QCL is in failure mode, e.g., when it is not producing all wavelengths in the plurality of different wavelength ranges. The second channel includes at least one optical flat that is transmissive to the light produced by the QCL and is separate from the tunable QCL. The optical flat is switchably placed in a beam path of the light produced by the tunable QCL and light transmitted through the optical flat is received by a detector. Using output signals from the detector, a failure mode of the tunable QCL may be determined.
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公开(公告)号：US12235091B2
公开(公告)日：2025-02-25
申请号：US17871384
申请日：2022-07-22
Applicant: Onto Innovation Inc.
Inventor： Jian Ding , Nathan Unruh , Ju Jin , Nazar Orishchin
Abstract: Various examples include an apparatus to characterize substrate and film thicknesses of the substrate and films formed thereon. The apparatus uses one or more wavelengths of light from a light source (e.g., a swept laser) to interrogate the substrate. The light is directed substantially orthogonally to an upper surface of the substrate. A polarizer and an analyzer element are coupled between the light source and the substrate. Therefore, the polarizer and the analyzer are both located in the beam propagation path from the light source to the substrate. An optical detector is arranged substantially orthogonally to the upper surface of the substrate. The optical detector receives light returned back from the substrate. The apparatus is capable of determining the thickness of the substrate and one or more films contained thereon, regardless of substrates having optical anisotropies, such as chiral characteristics or stress-induced films. Other apparatuses and methods are also disclosed.
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公开(公告)号：US12216051B2
公开(公告)日：2025-02-04
申请号：US17581534
申请日：2022-01-21
Applicant: Onto Innovation Inc.
Inventor： James Millerd
Abstract: An optical metrology device characterizes a test object using a phase shift interferometer with synchronous time varying optical frequency shifts. A light source generates a beam having a time varying frequency, which is divided into two collinear, orthogonally polarized beams that differ by a first frequency shift. One or more optical cavities receive the beams and produce a pair of reference beams that differ from each other in frequency by the first frequency shift and a pair of test beams with a second frequency shift induced by the one or more optical cavities. The test beams differ from each other by the first frequency shift and differ from the reference beams by the second frequency shift. The first frequency shift has a pre-defined relationship with respect to the second frequency shift to generate interference between a reference beam and test beam that have frequency shift magnitudes with the pre-defined relationship.
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公开(公告)号：US20250021897A1
公开(公告)日：2025-01-16
申请号：US18767010
申请日：2024-07-09
Applicant: Onto Innovation Inc.
Inventor： Mustansir BANATWALA , Michael G. McINTYRE , William J. MARTIN
Abstract: A method for predicting an aspect of semiconductor fabrication processes using machine learning. The method involves building a machine learning model that incorporates two parameters of manufactured semiconductor articles that are associated with different physical attributes of the semiconductor articles at different levels of granularity. A mathematical relationship between the two parameters is provided to the computing device, and the machine learning model is used to generate a semiconductor fabrication process prediction. By training the model with data associated with partially fabricated semiconductor articles, missing parameter values can be assigned using the mathematical relationship. This approach improves prediction accuracy and speed. The method has potential applications in the semiconductor industry, particularly for predicting aspects of semiconductor fabrication processes such as metrology, process optimization, and yield prediction.
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公开(公告)号：US20250003888A1
公开(公告)日：2025-01-02
申请号：US18217359
申请日：2023-06-30
Applicant: Onto Innovation Inc.
Inventor： John M. Thornell
Abstract: Image sensors assist in inspecting semiconductor substrates, including semiconductor wafers, during the semiconductor manufacturing process. However, due to the non-uniformity of cells between image sensors, which is referred to as photo response non-uniformity (PRNU), each image sensor can generate a different voltage level when illuminated with a uniform light source, which leads to a luminance inaccuracy at the pixel level that is referred to as photo response non-uniformity (or illumination flat fielding). Photo response non-uniformity (PRNU) can be corrected using a system calibration that calibrates to a substrate, including wafers, for a given illumination condition, objective, and camera. The PRNU correction is then applied to all images acquired with the given setup to produce a uniform image. Techniques are described to correct the PRNU at runtime even when there is a contour, e.g., tilt or warp, in the substrate as it relates to the normal axis of the optics.
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