Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array
    72.
    发明授权
    Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array 有权
    微结构阵列,用于形成微结构阵列的装置和方法,以及用于制造微结构阵列的模具

    公开(公告)号:US06436265B1

    公开(公告)日:2002-08-20

    申请号:US09534341

    申请日:2000-03-24

    IPC分类号: C25D502

    摘要: A fabrication method of fabricating an array of microstructures is provided. The method includes the step of preparing a substrate with a surface including a usable region and a dummy region continuously set around the usable region, at least the usable region and the dummy region of the substrate are electrically conductive and have a conductive portion. The method also includes the steps of forming a first insulating layer on the conductive portion, and forming a plurality of openings in the first insulating layer, the openings being arranged in a predetermined array pattern. Additionally, the method includes the step of performing one of electroplating and electrodeposition using the conductive portion as an electrode to form a first plated or electrodeposited layer in the openings and on the first insulating layer in both the usable region and the dummy region.

    摘要翻译: 提供了一种制造微结构阵列的制造方法。 该方法包括制备具有包括可用区域和连续设置在可用区域周围的虚拟区域的表面的衬底的步骤,至少衬底的可用区域和虚拟区域是导电的并且具有导电部分。 该方法还包括以下步骤:在导电部分上形成第一绝缘层,并在第一绝缘层中形成多个开口,开口以预定阵列图案布置。 此外,该方法包括使用导电部分作为电极进行电镀和电沉积之一的步骤,以在可用区域和虚拟区域中的开口中和第一绝缘层上形成第一电镀或电沉积层。