摘要:
A tension mask frame assembly for a color cathode ray tube, includes: a tension mask having a plurality of strips on which slots are formed, the slots being separated by a predetermined distance from each other on a thin plate; real bridges for partitioning slots at a predetermined pitch interval by connecting adjacent ones of a plurality of strips to each other; and a frame which supports the corresponding edges of the tension mask; whereby the vertical pitch of the real bridges becomes smaller, such as in a stepwise relation, in a direction from the center portion of the tension mask to the peripheral portion of the tension mask.
摘要:
An electron emission display includes a first substrate, an electron emission unit formed at the first substrate to emit electrons, a second substrate facing the first substrate, and a light emission unit formed at the second substrate to emit visible light using electrons emitted from the electron emission unit. The light emission unit includes a phosphor layer formed on the second substrate and an anode electrode formed on the phosphor layer. The anode electrode includes a first metal layer and a second metal layer formed on the first metal layer and having a single- or multi-layered structure.
摘要:
An electron emission device includes first and second substrates facing each other, an electron emission structure formed on the first substrate, and a light emission structure formed on the second substrate. The light emission structure has phosphor layers and an anode electrode formed on a surface of the phosphor layers. An adhesive film is formed at the peripheries of the first and the second substrates to attach the first and the second substrates to each other. At least one lead portion crosses the adhesive film on the second substrate, and is connected to the anode electrode. The lead portion is partitioned into a plurality of lead lines at the crossed region thereof with the adhesive film, and the plurality of lead lines are spaced from each other.
摘要:
An electron emission device is provided including a first substrate and a second substrate facing each other and separated from each other by a predetermined distance. An electron emission unit is disposed on the first substrate, and a light emission unit is disposed on a surface of the second substrate facing the first substrate. A grid electrode is disposed between the first substrate and the second substrate, and has a hole region with a plurality of electron beam-guide holes and a no-hole region surrounding the hole region. The first substrate has a first active area and a first outer portion. The second substrate has a second active area and a second outer portion. The grid electrode has a larger area than the first active area and the second active area, and the no-hole region is disposed corresponding to the first outer portion.
摘要:
There is provided an electron emission device where the adhesion between lead portions of an anode electrode and an adhesive film is enhanced to give the vacuum structure an excellent hermetic seal property. The electron emission device includes first and second substrates facing each other, an electron emission structure formed on the first substrate, and a light emission structure formed on the second substrate. The light emission structure has phosphor layers and an anode electrode formed on a surface of the phosphor layers. An adhesive film is formed at the peripheries of the first and the second substrates to attach the first and the second substrates to each other. At least one lead portion crosses the adhesive film on the second substrate, and is connected to the anode electrode. The lead portion is partitioned into a plurality of lead lines at the crossed region thereof with the adhesive film, and the plurality of lead lines are spaced from each other.
摘要:
A shadow mask for a cathode ray tube includes an aperture area having a plurality of apertures passing electron beams, a non-aperture area extending a predetermined distance from a circumference of the aperture area and a skirt extending a predetermined distance from an outside circumference of the non-aperture area and bent at a predetermined angle to the non-aperture area, wherein the aperture area has predetermined curvature radii, and wherein if a curvature radius in a horizontal direction of the aperture area is Rhs, and a curvature radius in a vertical direction is Rvs, the following condition is satisfied, 0.6
摘要:
An electron emission device includes a first substrate and a second substrate facing one another and having a predetermined gap therebetween. An electron emission region for emitting electrons is formed on the first substrate, and an illumination portion for displaying images responsive to the electrons emitted from the electron emission region is formed on the second substrate. A grid electrode is mounted between the first and second substrates and configured to focus the electrons emitted from the electron emission assembly. The grid electrode is provided with a plurality of electron passage openings, of which at least one portion of the interior wall of at least one of the electron passage openings is formed with an inclined plane relative to the first substrate. With the above-structured electron emission device, the grid electrode prevents and/or reduces one or more travel courses of electrons from being varied so that illumination of wrong pixels is prevented and/or reduced and overall color purity is improved.
摘要:
A tension mask for a color cathode-ray tube includes a plurality of strips separated by a predetermined distance and connected by real bridges. The strips define slots, through which an electron beam passes, together with the real bridges. The slots are formed such that the width of middle portions of the slots is narrower than the width of upper and lower portions of the slots in order to compensate for contraction of the strips arising when tension is applied to the strips.
摘要:
A color selection apparatus for a cathode ray tube. A mask is formed having a long axis and a short axis. A frame supports the mask in one of a long axis direction and a short axis direction. The mask has a plurality of strips separated by a predetermined distance. A plurality of first beam apertures are formed as single long slits between the strips in a center portion of the mask. A plurality of second beam apertures are formed on outer portions of the mask to both sides of the center portion of the mask. The second beam apertures are divided into a plurality of individual units within a single column by real bridges and at least one dummy bridge for each individual second beam aperture unit. The at least on dummy bridge extends inwardly from the strips but does not cross completely through the individual second beam aperture unit.
摘要:
A tension mask for a color cathode-ray tube, a method for manufacturing the tension mask, and an exposure mask for use in the manufacture of the tension mask are provided. The tension mask is manufactured by depositing photosensitive layers over the top and bottom surfaces of a steel foil. An upper exposure mask with a pattern including a series of parallel upper light transmission portions arranged in lines is aligned over the top surface of the steel foil, and a lower exposure mask with a pattern is aligned over the bottom surface of the steel foil. Here, the pattern of the lower exposure mask includes a series of parallel lower light transmission portions arranged in lines, a plurality of first light shielding portions intersecting adjacent lower light transmission portions among the series of the parallel lower light transmission portions, and a plurality of second light shielding portions partially extending between the edges of the adjacent lower light transmission portions. Following this, the photosensitive layers uncovered with the lower and upper exposure masks are exposed using an exposure light source, and then the upper and lower exposure masks are removed from the steel foil and developing the photosensitive layers remaining on the steel foil. Lastly, the steel foil which has undergone the developing process is etched, so that the tension mask is completed.