Method of manufacturing magnetic recording medium
    71.
    发明授权
    Method of manufacturing magnetic recording medium 有权
    磁记录介质的制造方法

    公开(公告)号:US07972523B2

    公开(公告)日:2011-07-05

    申请号:US12509261

    申请日:2009-07-24

    IPC分类号: B44C1/22

    CPC分类号: G11B5/855 G11B5/72

    摘要: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.

    摘要翻译: 根据一个实施例,制造磁记录介质的方法包括形成磁记录层,氧化抑制层,硬掩模层包括在基板上的碳,用抗蚀剂涂覆硬掩模层,转移凸起和凹槽的图案 通过压印形成抗蚀剂以形成抗蚀剂图案,使用抗蚀剂图案作为掩模,蚀刻氧化抑制层顺序地进行硬掩模层的蚀刻,以及磁记录层的蚀刻和/或磁性失活以形成磁性图案 记录层,顺序地进行剥离抗蚀剂图案,汽提硬掩模层和剥离氧化抑制层,其中使用离子束蚀刻来剥离氧化抑制层。

    Method of manufacturing magnetic recording medium
    72.
    发明授权
    Method of manufacturing magnetic recording medium 有权
    磁记录介质的制造方法

    公开(公告)号:US07967993B2

    公开(公告)日:2011-06-28

    申请号:US12508269

    申请日:2009-07-23

    IPC分类号: B44C1/22

    摘要: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.

    摘要翻译: 根据一个实施例,一种制造磁记录介质的方法包括在磁记录层上形成硬掩模和抗蚀剂,在抗蚀剂上印刷压模以转移突起和凹槽的图案,去除留在凹槽中的抗蚀剂残留物 使用图案化的抗蚀剂作为掩模蚀刻硬掩模,以转移突起和凹陷的图案,剥离抗蚀剂,并执行离子束蚀刻以去除剩余的硬掩模并修改未覆盖的磁记录层的表面 剩下的硬面罩。

    Method of manufacturing patterned magnetic recording medium
    76.
    发明申请
    Method of manufacturing patterned magnetic recording medium 审中-公开
    图案化磁记录介质的制造方法

    公开(公告)号:US20070172584A1

    公开(公告)日:2007-07-26

    申请号:US11657720

    申请日:2007-01-25

    IPC分类号: B05D5/12

    CPC分类号: G11B5/855

    摘要: A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.

    摘要翻译: 图案化磁记录介质的制造方法包括:通过用电磁辐射或电子束分解的抗蚀剂涂覆磁性膜以具有低分子量,通过压印方法在抗蚀剂上形成图案,转印图案 通过使用其上形成有图案的抗蚀剂作为掩模,并且通过将抗蚀剂暴露于电磁辐射或电子束来除去抗蚀剂到磁性膜。

    Method of manufacturing magnetic recording medium
    77.
    发明授权
    Method of manufacturing magnetic recording medium 有权
    磁记录介质的制造方法

    公开(公告)号:US08333899B2

    公开(公告)日:2012-12-18

    申请号:US13007395

    申请日:2011-01-14

    IPC分类号: B44C1/22

    摘要: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming on a magnetic recording layer a first hard mask, a second hard mask, a third hard mask and a resist, imprinting the resist with a stamper, removing a residue left in the recesses of the patterned resist, etching the third hard mask by use of the patterned resist as a mask, etching the second hard mask by use of the third hard mask as a mask, etching the first hard mask by use of the second hard mask as a mask, forming a pattern of the magnetic recording layer with ion beam irradiation, and removing the first hard mask by use of a remover liquid with higher reactivity to the metal material of the first hard mask than to a constituent element of the magnetic recording layer.

    摘要翻译: 根据一个实施例,制造磁记录介质的方法包括在磁记录层上形成第一硬掩模,第二硬掩模,第三硬掩模和抗蚀剂,用压模压印抗蚀剂,除去留在 图案化抗蚀剂的凹部,通过使用图案化的抗蚀剂作为掩模蚀刻第三硬掩模,通过使用第三硬掩模作为掩模蚀刻第二硬掩模,通过使用第二硬掩模蚀刻第一硬掩模 作为掩模,通过离子束照射形成磁记录层的图案,并且通过使用对第一硬掩模的金属材料具有较高反应性的去除剂液体除去第一硬掩模,而不是磁记录的构成元件 层。

    Method of manufacturing magnetic recording medium
    78.
    发明授权
    Method of manufacturing magnetic recording medium 有权
    磁记录介质的制造方法

    公开(公告)号:US08206602B2

    公开(公告)日:2012-06-26

    申请号:US12838349

    申请日:2010-07-16

    IPC分类号: B44C1/22

    CPC分类号: G11B5/855 C23F4/00 G03F7/427

    摘要: According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.

    摘要翻译: 根据一个实施例,提供了一种制造磁记录介质的方法,包括形成包括碳作为主要成分的第一硬掩模,包括除碳以外的主要成分的第二硬掩模和在磁记录层上的抗蚀剂, 将压模接触抗蚀剂以将突起和凹陷的图案转移到抗蚀剂,去除图案化抗蚀剂的凹部中的残留物,蚀刻第二硬掩模,蚀刻第一硬掩模,图案化磁记录层,以及去除第一硬 掩模,所述方法还包括在蚀刻所述第一硬掩模和去除所述第一硬掩模之间,去除残留在所述第一硬掩模的突起上的所述第二硬掩模,以及通过所述第一硬掩模的表面去除所述第一硬掩模的表面上的污染层 氧基气体和氟化合物的混合气体。