-
公开(公告)号：US07045045B2
公开(公告)日：2006-05-16
申请号：US10237975
申请日：2002-09-10
IPC分类号： C25B9/02
CPC分类号： H01L21/6831
摘要： An inexpensive workpiece holder having high reliability and a processing apparatus equipped with the workpiece holder are provided, in which damage caused by oxygen in the air is prevented. The holder comprises: a ceramic body which has an electrode and a heater circuit and which can holds a workpiece; a tubular member having an end portion connected to the ceramic body; a sealing member which is disposed inside the tubular member and which isolates a space inside the tubular member into two regions: a region on the first end portion (“sealed portion”) and a region on the opposite side (“opposite region”); and power supply conductive members which extend from the opposite region side, penetrating the sealing member to the sealed region side, and which are electrically connected to the electrode and the heater circuit.
-
公开(公告)号：US20050000956A1
公开(公告)日：2005-01-06
申请号：US10711064
申请日：2004-08-20
CPC分类号： H01L21/67103 , H05B3/143 , H05B3/265
摘要： Ceramic susceptor whose wafer-retaining face has superior isothermal properties, and that is suited to utilization in apparatuses for manufacturing semiconductors and in liquid-crystal manufacturing apparatuses. In plate-shaped sintered ceramic body 1, resistive heating element 2 is formed. Fluctuation in pullback length L between sintered ceramic body outer-peripheral edge 1a and resistive heating element substantive-domain outer-peripheral edge 2a is within ±0.8%, while isothermal rating of the entire surface of the wafer-retaining face is ±1.0% or less. Preferable is a superior isothermal rating of ±0.5% or less that can be achieved by bringing the fluctuation in pullback length L to within ±0.5%.
摘要翻译： 其晶片保持面具有优异的等温性能，适用于半导体制造装置和液晶制造装置的陶瓷基座。 在板状烧结陶瓷体1中，形成电阻加热元件2。 烧结陶瓷体外周边缘1a和电阻加热元件本体外周边缘2a之间的回拉长度L的波动在±0.8％以内，而晶片保持面的整个表面的等温额定值为±1.0％ 减。 优选的等温额定值为±0.5％以下，通过使拉回长度L的波动在±0.5％以内可以实现。
-
公开(公告)号：US06671489B2
公开(公告)日：2003-12-30
申请号：US10169129
申请日：2002-06-27
IPC分类号： G03G1520
CPC分类号： G03G15/2064 , G03G2215/2016 , G03G2215/2035
摘要： In a heating-type toner-fixing unit using a ceramic heater and a cylindrical fixing film, the shape of the fixing face-side surface of a ceramic heater 10 which comes into contact with a fixing film 3 and the shape of the portions of a heater support 12 at least adjacent to the fixing face-side surface are formed into a shape that is almost identical to a naturally deformed shape of the fixing film 3 in a static state or a traveling state where the fixing film is pressed by a pressure roller 4 at a designated nip width. It is also possible that the nip portion and portions adjacent thereto at the entrance side and exit side are formed into a flat shape and portions other than the flat portions are formed into a curved surface shape along the cylindrical shape of the fixing film 3.
-
84.发明授权Wafer holder for semiconductor manufacturing apparatus, method of manufacturing wafer holder, and semiconductor manufacturing apparatus 有权用于半导体制造装置的晶片保持器，晶片保持器的制造方法以及半导体制造装置公开(公告)号：US06508884B2
公开(公告)日：2003-01-21
申请号：US09741477
申请日：2000-12-19
申请人： Akira Kuibira , Hirohiko Nakata , Kenjiro Higaki , Masuhiro Natsuhara , Takashi Ishii , Yasuyuki Matsui
发明人： Akira Kuibira , Hirohiko Nakata , Kenjiro Higaki , Masuhiro Natsuhara , Takashi Ishii , Yasuyuki Matsui
IPC分类号： C23C1600
CPC分类号： H01L21/6835 , C04B37/005 , C04B41/009 , C04B41/52 , C04B41/89 , C04B2237/06 , C04B2237/062 , C04B2237/064 , C04B2237/066 , C04B2237/08 , C04B2237/10 , C04B2237/122 , C04B2237/123 , C04B2237/125 , C04B2237/343 , C04B2237/366 , C04B2237/368 , C04B2237/52 , C04B2237/567 , C04B2237/62 , C04B2237/66 , C04B2237/704 , C04B2237/708 , C04B2237/72 , C04B2237/80 , H01L21/4857 , H01L21/67103 , C04B41/0072 , C04B41/4539 , C04B41/4572 , C04B41/5133 , C04B41/5022 , C04B35/581
摘要： A wafer holder for a semiconductor manufacturing apparatus that has a high heat conductivity and includes a conductive layer such as heater circuit pattern which can be formed with a high precision pattern, a method of manufacturing the wafer holder, and a semiconductor manufacturing apparatus having therein the wafer holder are provided. On a surface of a sintered aluminum nitride piece, paste containing metal particles is applied and fired to form a heater circuit pattern as a conductive layer. Between the surface of the sintered aluminum nitride piece having the heater circuit pattern formed thereon and another sintered aluminum nitride piece, a glass layer is provided as a joint layer to be heated for joining the sintered aluminum nitride pieces together.
摘要翻译： 一种用于半导体制造装置的晶片保持器，其具有高导热性并且包括可以以高精度图案形成的加热器电路图案的导电层，制造晶片保持器的方法，以及其中具有 提供晶片保持器。 在烧结的氮化铝片的表面上，涂覆含有金属颗粒的糊状物并烧制以形成作为导电层的加热器电路图案。 在其上形成有加热器电路图案的烧结氮化铝片的表面和另一个烧结的氮化铝片之间，设置玻璃层作为待烧结的接合层，以将烧结的氮化铝片接合在一起。
-
85.发明授权Ceramic heater for toner-fixing units and method for manufacturing the heater 失效用于调色剂定影单元的陶瓷加热器和用于制造加热器的方法公开(公告)号：US06384378B2
公开(公告)日：2002-05-07
申请号：US09834642
申请日：2001-04-16
IPC分类号： H05B300
CPC分类号： G03G15/2053 , G03G15/2064 , H05B3/0095
摘要： A ceramic heater that is used in a toner-fixing system comprising a ceramic heater and a heat-resistant film, that reduces the degree of deformation of the heat-resistant film, that lightens the load applied to the film at the time of revolution, that prevents the fracture of the film, and that enables fixing at a high rate exceeding 24 ppm. A ceramic base material 11 of the ceramic heater attached to a heating cylinder comprises aluminum nitride or silicon nitride. A heating element 12 and current-feeding electrodes are made of heat-resistant metal such as tungsten and molybdenum or heat resistant alloy and are formed on the ceramic base material. In the ceramic heater, at least one part of the face (the fixing face) that contacts the heat-resistant film is curved when viewed from a direction perpendicular to the feeding direction of a copying sheet.
摘要翻译： 一种用于包括陶瓷加热器和耐热膜的调色剂定影系统中的陶瓷加热器，其减小了耐热膜的变形程度，从而减轻了在旋转时施加到膜上的载荷， 可以防止膜的断裂，能够以超过24ppm的高速率进行固定。 附着在加热缸上的陶瓷加热器的陶瓷基材11包括氮化铝或氮化硅。 加热元件12和馈电电极由诸如钨和钼的耐热金属或耐热合金制成并形成在陶瓷基材上。 在陶瓷加热器中，从与复印纸的进给方向垂直的方向观察时，与耐热膜接触的面（固定面）的至少一部分是弯曲的。
-
公开(公告)号：US06271163B1
公开(公告)日：2001-08-07
申请号：US09357600
申请日：1999-07-20
申请人： Yasuhisa Yushio , Hirohiko Nakata , Kazutaka Sasaki , Masuhiro Natsuhara , Motoyuki Tanaka , Yasuhiro Murase
发明人： Yasuhisa Yushio , Hirohiko Nakata , Kazutaka Sasaki , Masuhiro Natsuhara , Motoyuki Tanaka , Yasuhiro Murase
IPC分类号： C04B35581
CPC分类号： C04B35/581 , H01L23/15 , H01L2924/0002 , H01L2924/00
摘要： An aluminum nitride sintered body has excellent thermal shock resistance and strength, and is applicable to a radiating substrate for a power module or a jig for semiconductor equipment employed under a strict heat cycle. The aluminum nitride sintered body contains 0.01 to 5 percent by weight of an alkaline earth metal element compound in terms of an oxide and 0.01 to 10 percent by weight of a rare earth element compound in terms of an oxide, respectively as sintering aids, and a residual amount of carbon in a range from 0.005 to 0.1 percent by weight, thereby suppressing grain growth and improving thermal shock resistance and strength of the sintered body.
摘要翻译： 氮化铝烧结体具有优异的耐热冲击性和强度，并且适用于在严格的热循环下使用的用于功率模块的辐射基板或用于半导体设备的夹具。 氮化铝烧结体分别含有0.01〜5重量％的碱土类金属元素化合物，以氧化物计，0.01〜10重量％的稀土元素化合物，以氧化物计，作为烧结助剂， 残留量在0.005〜0.1重量％的范围内，从而抑制晶粒生长，提高耐热冲击性和烧结体的强度。
-
公开(公告)号：US07806984B2
公开(公告)日：2010-10-05
申请号：US10478278
申请日：2003-02-26
IPC分类号： H01L21/205 , C23C16/44
CPC分类号： C23C16/45521 , C23C16/4412 , C23C16/4581 , C23C16/4586 , H01L21/68792
摘要： An apparatus for manufacturing a semiconductor or liquid crystal has, within a reaction chamber 1 to which a reactive gas is supplied, a ceramic holder 2 having a resistive heating element 7 embedded therein; and further comprises a ceramic cylindrical support member 3 one end of which supports the ceramic holder 2 and the other end of which is fixed to a portion of the reaction chamber 1, and an inert gas supply tube 4 and inert gas evacuation tube 5 each having an opening inside the cylindrical support member 3. It is preferable that the inert gas within the cylindrical support member 3 be maintained at less than 0.1 MPa (one atmosphere). By means of such an arrangement, oxidation and corrosion of electrodes provided on the rear surface of the ceramic holder can be prevented, without an oxidation-resistant seal or corrosion-resistant seal being applied. The semiconductor or liquid crystal manufacturing apparatus also ensures the thermal uniformity in the ceramic holder and eliminates useless power consumption. Moreover, the apparatus size can be reduced, and manufacturing costs can be decreased.
摘要翻译： 在半导体或液晶的制造装置中，在供给反应性气体的反应室1内嵌有电阻加热元件7的陶瓷保持架2， 并且还包括陶瓷圆柱形支撑构件3，其一端支撑陶瓷保持器2，另一端固定到反应室1的一部分，惰性气体供应管4和惰性气体排出管5各自具有 圆筒状的支承部件3内的开口部。优选将圆筒状支撑部件3内的惰性气体维持在小于0.1MPa（1个大气压）。 通过这种布置，可以防止设置在陶瓷保持器的后表面上的电极的氧化和腐蚀，而不施加抗氧化密封或耐腐蚀密封。 半导体或液晶制造装置还确保陶瓷保持器的热均匀性并消除无用的功耗。 此外，可以减小设备尺寸，并且可以降低制造成本。
-
公开(公告)号：US07576303B2
公开(公告)日：2009-08-18
申请号：US11701417
申请日：2007-02-02
CPC分类号： G01R31/2865 , H01L21/68757
摘要： A wafer holder is provided having high rigidity and an enhanced heat-insulating effect that allow positional accuracy and heating uniformity to be improved, a chip to be rapidly heated and cooled, and the manufacturing cost to be reduced, and a wafer prober apparatus on which the wafer holder is mounted. The wafer holder of the present invention includes a chuck top for mounting a wafer, a support member for supporting the chuck top, and a stand for supporting the support member. The chuck top has a thermal conductivity K1 and a Young's modulus Y1; the support member has a thermal conductivity K2 and a Young's modulus Y2; and the stand has a thermal conductivity K3 and a Young's modulus Y3. K1>K2 and K1>K3; and Y3>Y1 and Y3>Y2.
摘要翻译： 提供了具有高刚性和增强的隔热效果的晶片保持器，其允许提高位置精度和加热均匀性，快速加热和冷却的芯片，以及降低的制造成本，以及晶片探测器装置，其上 安装晶片保持架。 本发明的晶片保持器包括用于安装晶片的卡盘顶部，用于支撑卡盘顶部的支撑构件和用于支撑支撑构件的支架。 卡盘顶部具有导热系数K1和杨氏模量Y1; 支撑构件具有热传导率K2和杨氏模量Y2; 并且支架具有热导率K3和杨氏模量Y3。 K1> K2和K1> K3; Y3> Y1和Y3> Y2。
-
89.发明申请公开(公告)号：US20090045829A1
公开(公告)日：2009-02-19
申请号：US11496019
申请日：2006-07-31
CPC分类号： G01R31/2865 , G01R31/2875
摘要： It is an object of the present invention to provide a wafer prober wafer holder that is highly rigid and increases the heat insulating effect, thereby improving positional accuracy, thermal uniformity, and chip temperature ramp-up and cooling rates, as well as a wafer prober device equipped therewith.A wafer holder of the present invention includes a chuck top that mounts a wafer, and a support member that supports the chuck top, wherein, a restricting member is provided that covers an interface between the chuck top and the support member. By covering the gap between the chuck top and the support member with the restricting member, the heat insulating effect can be increased by preventing the flow of outside air through the gap into the support member, and the cooling rate can be particularly improved if cooling to a temperature below room temperature.
摘要翻译： 本发明的目的是提供一种高度刚性的晶片探针晶片保持器，并且增加隔热效果，从而提高位置精度，热均匀性以及芯片温度升高和冷却速度，以及晶片探测器 装备的装置。 本发明的晶片保持器包括安装晶片的卡盘顶部和支撑卡盘顶部的支撑构件，其中设置有限制构件，该限制构件覆盖卡盘顶部和支撑构件之间的界面。 通过用限制构件覆盖卡盘顶部和支撑构件之间的间隙，可以通过防止外部空气通过间隙流入支撑构件而提高隔热效果，并且如果冷却至 温度低于室温。
-
90.发明授权Holder for use in semiconductor or liquid-crystal manufacturing device and semiconductor or liquid-crystal manufacturing device in which the holder is installed 有权用于半导体或液晶制造装置的保持器和其中安装有保持器的半导体或液晶制造装置公开(公告)号：US07414823B2
公开(公告)日：2008-08-19
申请号：US10709889
申请日：2004-06-03
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： H01L21/68757 , C23C16/4581 , C23C16/4586 , H01L21/68785 , H05B3/12 , H05B3/143
摘要： Affords a holder for use in semiconductor or liquid-crystal manufacturing devices—as well as semiconductor or liquid-crystal manufacturing devices in which the holder is installed—in which temperature uniformity in the processed-object retaining face is heightened. Configuring the holder with, furnished atop a ceramic susceptor, a composite of a ceramic and a metal improves the temperature uniformity in the holder's processed-object retaining face and makes for curtailing the generation of particulates and other contaminants. In addition, putting a coating on at least the retaining face improves the durability of the holder. Installing a holder of this sort in a semiconductor manufacturing device or a liquid-crystal manufacturing device contributes to making available semiconductor or liquid-crystal manufacturing devices whose productivity and throughput are excellent.
摘要翻译： 提供用于半导体或液晶制造装置的保持器以及其中安装保持器的半导体或液晶制造装置，其中加工对象保持面的温度均匀性提高。 配置陶瓷基座上的支架，陶瓷和金属的复合材料，可提高保持器的加工对象保持面的温度均匀性，并减少微粒和其他污染物的产生。 另外，至少在保持面上涂上涂层，提高了保持体的耐久性。 在半导体制造装置或液晶制造装置中安装这样的支架有助于制造生产率和生产率优异的半导体或液晶制造装置。
-
-
-
-
-
-
-
-
-
搜索结果
137 条记录 (耗时 0.026 秒)
