Method and apparatus for wavevector selective pyrometry in rapid thermal
processing systems
    1.
    发明授权
    Method and apparatus for wavevector selective pyrometry in rapid thermal processing systems 失效
    快速热处理系统中波矢选择性测温法的方法和装置

    公开(公告)号:US5628564A

    公开(公告)日:1997-05-13

    申请号:US412278

    申请日:1995-03-28

    IPC分类号: G01J5/04 G01J5/08

    摘要: A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on the object with a particular angular distribution, and the thermal radiation from the object is measured at an angles different from the angle where the incident radiation specularly reflected from the surface of the object is a maximum.

    摘要翻译: 在快速热处理(RTP)系统中用于光学高温测量的方法和装置,其中用于加热RTP系统中待处理物体的辐射部分地从镜面反射表面反射并且以具体的方式入射到物体上 角度分布,并且来自物体的热辐射以与从物体表面镜面反射的入射辐射最大的角度不同的角度被测量。