Method and apparatus for measuring the concentration of ions implanted
in semiconductor materials
    2.
    发明授权
    Method and apparatus for measuring the concentration of ions implanted in semiconductor materials 失效
    测量注入半导体材料的离子浓度的方法和装置

    公开(公告)号:US6052185A

    公开(公告)日:2000-04-18

    申请号:US885786

    申请日:1997-06-30

    CPC分类号: G01N21/1717 G01N21/17

    摘要: A method and apparatus that determines a concentration of ions implanted in a material is described. The method includes the steps of: (1) passing an excitation pulse through a diffracting mask (e.g., a phase or amplitude mask) to generate at least two excitation laser sub-pulses; (2) irradiating a region of the material with a grating pattern, formed by overlapping two excitation laser sub-pulses in time and space to initiate a time-dependent response (e.g., a change in refractive index) in the region; (3) diffracting a probe laser pulse having a duration that is at least long as the time-dependent response off the region to generate a time-dependent signal beam; (4) detecting the time-dependent signal beam to generate a signal waveform; and (5) processing the signal waveform to determine the concentration of ions implanted in the material.

    摘要翻译: 描述了确定植入材料中的离子的浓度的方法和装置。 该方法包括以下步骤:(1)使激发脉冲通过衍射掩模(例如,相位或幅度掩模)以产生至少两个激发激光子脉冲; (2)通过在时间和空间上重叠两个激发激光子脉冲而形成的光栅图案照射材料的区域以引发该区域中的时间依赖性响应(例如,折射率的变化); (3)将具有至少长度的持续时间的探针激光脉冲衍射出所述区域的时间依赖性响应以产生时间相关信号光束; (4)检测时间依赖信号光束以产生信号波形; 和(5)处理信号波形以确定植入材料中的离子的浓度。

    Method and apparatus for measuring the concentration of ions implanted
in semiconductor materials
    3.
    发明授权
    Method and apparatus for measuring the concentration of ions implanted in semiconductor materials 失效
    测量注入半导体材料的离子浓度的方法和装置

    公开(公告)号:US6118533A

    公开(公告)日:2000-09-12

    申请号:US926850

    申请日:1997-09-10

    CPC分类号: G01N21/1717 G01N21/17

    摘要: A method and apparatus that determines a concentration of ions implanted in a material is described. The method includes the steps of: 1) generating at least two excitation laser sub-pulses and a probe pulse from a single pulse emitted from a laser; 2) irradiating a region of the material with a grating pattern formed by overlapping at least two excitation laser sub-pulses to initiate a time-dependent response in the region; 3) diffracting a probe laser pulse off the region to generate at least one time-dependent signal beam; 4) detecting at least one time-dependent signal beam to generate a signal waveform; and 5) processing the signal waveform to determine the concentration of ions implanted in the material.

    摘要翻译: 描述了确定植入材料中的离子的浓度的方法和装置。 该方法包括以下步骤:1)从激光器发射的单个脉冲产生至少两个激发激光子脉冲和探针脉冲; 2)用通过重叠至少两个激发激光子脉冲形成的光栅图案来照射材料的区域以在该区域中引发时间依赖性响应; 3)将探测激光脉冲衍射出该区域以产生至少一个时间依赖信号光束; 4)检测至少一个时间相关的信号波束以产生信号波形; 和5)处理信号波形以确定植入材料中的离子的浓度。

    Method and apparatus for measuring material properties using
transient-grating spectroscopy
    5.
    发明授权
    Method and apparatus for measuring material properties using transient-grating spectroscopy 失效
    使用瞬态光栅光谱测量材料性质的方法和装置

    公开(公告)号:US6075602A

    公开(公告)日:2000-06-13

    申请号:US318322

    申请日:1999-05-25

    摘要: The invention provides an apparatus for measuring a property of a sample (using, e.g., ISTS) that includes: 1) an excitation laser that generates an excitation laser beam; 2) an optical system aligned along an optical axis that separates the excitation laser beam into at least three sub-beams; 3) an imaging system aligned along the optical axis that collects the sub-beams and focuses them onto the sample to form an optical interference pattern that generates a time-dependent response in the sample; 4) a probe laser that generates a probe laser beam that diffracts off the time-dependent response to form a signal beam; 5) a detector that detects the signal beam and in response generates a radiation-induced electronic response; and 6) a processor that processes the radiation-induced electronic response to determine the property of the sample.

    摘要翻译: 本发明提供一种用于测量样品(使用例如ISTS)的性质的装置,其包括:1)产生激发激光束的激发激光; 2)沿着光轴对准的光学系统,其将激发激光束分离成至少三个子光束; 3)沿着光轴对准的成像系统,其收集子光束并将它们聚焦到样品上以形成在样品中产生时间依赖性响应的光学干涉图案; 4)探测激光器,其产生衍射时间依赖响应以形成信号光束的探测激光束; 5)检测信号光束并作为响应的检测器产生辐射诱发的电子响应; 以及6)处理器,其处理辐射诱导的电子响应以确定样品的性质。

    Method and device for simultaneously measuring the thickness of multiple
thin metal films in a multilayer structure
    6.
    发明授权
    Method and device for simultaneously measuring the thickness of multiple thin metal films in a multilayer structure 失效
    用于同时测量多层结构中多个薄金属膜的厚度的方法和装置

    公开(公告)号:US6069703A

    公开(公告)日:2000-05-30

    申请号:US86975

    申请日:1998-05-28

    摘要: An apparatus for measuring a property of a structure comprising at least one layer, the appratus including a light source that produces an optical pulse having a duration of less than 10 ps; a diffractive element that receives the optical pulse and diffracts it to generate at least two excitation pulses; an optical system that spatially and temporally overlaps at least two excitation pulses on or in the structure to form an excitation pattern, containing at least two light regions, that launches an acoustic wave having an out-of-plane component that propagates through the layer, reflects off a lower boundary of the layer, and returns to a surface of the structure to modulate a property of the structure; a light source that produces a probe pulse that diffracts off the modulated property to generate at least one signal pulse; a detector that receives at least one signal pulse and in response generates a light-induced electrical signal; and an analyzer that analyzes the light-induced electrical signal to measure the property of the structure.

    摘要翻译: 一种用于测量包括至少一层的结构的性质的装置,所述装置包括产生具有小于10ps的持续时间的光脉冲的光源; 衍射元件,其接收光脉冲并衍射以产生至少两个激励脉冲; 在该结构上或其结构中空间和时间上重叠至少两个激励脉冲以形成激发图案的光学系统,其包含至少两个光区域,该至少两个光区域发射具有传播通过该层的平面外部分的声波, 反射层的下边界,并返回到结构的表面以调节结构的性质; 产生探测脉冲的光源,其衍射出调制特性以产生至少一个信号脉冲; 接收至少一个信号脉冲并作为响应的检测器产生光诱导的电信号; 以及分析器,其分析光感应电信号以测量结构的性质。