公开(公告)号：US20050122594A1

公开(公告)日：2005-06-09

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/24 ,  G02B1/02 ,  G02B5/30 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20070171539A1

公开(公告)日：2007-07-26

申请号：US11627158

申请日：2007-01-25

申请人： Bernhard Kneer ,  Gerald Richter

发明人： Bernhard Kneer ,  Gerald Richter

IPC分类号： G02B3/00

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G03F7/70258 ,  G03F7/70575

摘要： A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics arranged between the mask and the image. Starting from the mask, the following are arranged in the beam path of the projection optics: a first group of optical components with an overall positive refractive power; a second group of optical components with an overall negative refractive power; a third group of optical components with an overall positive refractive power; a fourth group of optical components with an overall negative refractive power, and, a fifth group of optical components with an overall positive refractive power. At least three optical subgroups having at least one optical component can be displaced along the optical axis of the projection optics. The first optical subgroup comprises the mask or at least one optical component from the first group of optical components. The second optical subgroup comprises at least one optical component from the second or the third group of optical components. The third optical subgroup comprises at least one optical component from the third or the fourth group of optical components. With such subgroups, efficient imaging error correction of the projection optics is possible.

摘要翻译： 用于特别用于微光刻的投影曝光系统用于在图像平面中生成布置在物平面中的掩模的图像。 投影曝光系统具有发射投影光的光源和布置在掩模和图像之间的投影光学元件。 从掩模开始，在投影光学器件的光束路径中布置以下部件：具有整体正屈光力的第一组光学部件; 具有总负折射光焦度的第二组光学部件; 具有整体正屈光力的第三组光学部件; 具有总体负折射光焦度的第四组光学部件，以及具有总正折射光焦度的第五组光学部件。 具有至少一个光学部件的至少三个光学子组可以沿着投影光学器件的光轴移位。 第一光学子组包括来自第一组光学部件的掩模或至少一个光学部件。 第二光学子组包括来自第二或第三组光学部件的至少一个光学部件。 第三光学子组包括来自第三或第四组光学部件的至少一个光学部件。 利用这样的子组，投影光学器件的有效成像误差校正是可能的。