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公开(公告)号：US20060171020A1
公开(公告)日：2006-08-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。
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公开(公告)号：US20050122594A1
公开(公告)日：2005-06-09
申请号：US11029788
申请日：2005-01-05
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。
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公开(公告)号：US07145720B2
公开(公告)日：2006-12-05
申请号：US10367989
申请日：2003-02-12
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
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公开(公告)号：US07126765B2
公开(公告)日：2006-10-24
申请号：US11029788
申请日：2005-01-05
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
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公开(公告)号：US07382536B2
公开(公告)日：2008-06-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。
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公开(公告)号：US07180667B2
公开(公告)日：2007-02-20
申请号：US10817527
申请日：2004-04-01
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。
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公开(公告)号：US20130182234A1
公开(公告)日：2013-07-18
申请号：US13786134
申请日：2013-03-05
申请人： Paul Graupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
发明人： Paul Graupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。
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公开(公告)号：US20050170748A1
公开(公告)日：2005-08-04
申请号：US10983569
申请日：2004-11-08
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B17/08 , B24B49/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。
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公开(公告)号：US20080019013A1
公开(公告)日：2008-01-24
申请号：US11864193
申请日：2007-09-28
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B3/00
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。
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公开(公告)号：US07292388B2
公开(公告)日：2007-11-06
申请号：US10983569
申请日：2004-11-08
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B13/14
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。
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