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公开(公告)号：US20240043986A1
公开(公告)日：2024-02-08
申请号：US17625399
申请日：2020-06-26
发明人： Tomohiro Maruko , Yu Suzuki , Shohei Otomo , Hironobu Nakamura
IPC分类号： C23C14/34 , C22C32/00 , C22C21/00 , C22C1/04 , C22C1/05 , B22F3/105 , B22F3/24 , C22C29/16 , C22C29/00 , C22C1/047 , B22F9/08
CPC分类号： C23C14/3414 , C22C32/0068 , C22C21/00 , C22C1/0416 , C22C1/05 , B22F3/105 , B22F3/24 , C22C29/16 , C22C29/005 , C22C1/047 , B22F9/082 , B22F2998/10 , B22F2301/052 , B22F2999/00 , B22F2302/20 , B22F2201/20 , B22F2202/13 , B22F2003/1051 , B22F2003/247 , B22F2009/0824
摘要： The sputtering target of the present disclosure includes: an aluminum matrix; and (1) a material or phase containing aluminum and further containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element or (2) a material or phase containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, at a content of 10 to 70 mol % in the aluminum matrix.
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2.发明公开公开(公告)号：US20230360897A1
公开(公告)日：2023-11-09
申请号：US18246360
申请日：2021-09-14
发明人： Tomohiro Maruko , Yu Suzuki , Shohei Otomo , Hironobu Nakamura
CPC分类号： H01J37/3435 , H01J37/3426 , C23C14/3414
摘要： A sputtering target-backing plate assembly comprising, a target has a thickness of 2.0 to 15.0 mm is joined to a backing plate, the backing plate has a recessed section having a depth of 0.5 to 5.0 mm on a plate surface, the target is fitted into the recessed section, and the assembly has a swaging structure in which an outer-peripheral-side surface of the target is clamped by a recessed section inner-peripheral-side surface of the backing plate.
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公开(公告)号：US20220356558A1
公开(公告)日：2022-11-10
申请号：US17623943
申请日：2020-06-26
发明人： Tomohiro Maruko , Yu Suzuki , Shohei Otomo , Hironobu Nakamura
摘要： A sputtering target including aluminum and either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, and the sputtering target has a fluorine content of 100 ppm or less.
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公开(公告)号：US20220319824A1
公开(公告)日：2022-10-06
申请号：US17609356
申请日：2020-06-10
发明人： Tomohiro MARUKO , Hitoshi ARAKAWA , Shohei OTOMO , Yu SUZUKI
摘要： A ruthenium-based sputtering target having a cast structure, in which a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction.
An object of the present disclosure is to provide a Ru-based sputtering target having no void, having high purity and a low degree of structural anisotropy, and capable of forming a Ru-based film having low particle properties, high film thickness uniformity, and high surface uniformity, and a method for manufacturing the same. According to the present disclosure, there is provided a ruthenium-based sputtering target having a cast structure, in which a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction.-
公开(公告)号：US20220176447A1
公开(公告)日：2022-06-09
申请号：US17442512
申请日：2020-03-25
发明人： Genki ANO , Tomohiro MARUKO , Tomoaki MIYAZAWA , Yuichi IWAMOTO , Satoshi KITA
摘要： The method of producing a solid spherical powder according to the present disclosure includes: a step A of preparing a first powder raw material containing agglomerated particles and/or solidified particles having a particle diameter of 1 μm to 1,000 μm and introducing the first powder raw material into a plasma flame to produce a hollow spherical powder having a surface layer shell having a thickness of 1 μm to 50 μm; a step B of subjecting the hollow spherical powder to pulverization treatment to pulverize a hollow shape of the hollow spherical powder, thus obtaining a second powder raw material which is solid; and a step C of introducing the second powder raw material into a plasma flame, melting and solidifying the second powder raw material to obtain the solid spherical powder.
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公开(公告)号：US10858276B2
公开(公告)日：2020-12-08
申请号：US15129683
申请日：2015-04-08
发明人： Akinori Hoshino
摘要： A stirrer for glass melting which can be used over a prolonged life expectancy, while maintaining a high strength, even in an environment exposed to a high temperature and an oxygen-containing gas atmosphere for a long period of time, and can prevent the air bubbles from being mixed into the glass melt. A stirrer for glass melting is made of iridium or an iridium-based alloy, and has a rotary shaft and a stirring part, a surface region S1 of the surface of the rotary shaft above the stirring part is covered with a cylindrical cover, the cover has a two-layer structure in which an outer layer made of platinum or a platinum rhodium alloy and an inner layer made of platinum or a platinum rhodium alloy containing metal species are joined together, and oxide particles of metal species are precipitated in a dispersed state on a surface of the inner layer on an opposite side to a surface adjacent to the outer layer, wherein the stirrer for glass melting has a pipe made of iridium or an iridium-based alloy which surrounds at least the surface region S2 of the cover from the lower end of the cover to a predetermined height at an interval.
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公开(公告)号：US20170137312A1
公开(公告)日：2017-05-18
申请号：US15129683
申请日：2015-04-08
发明人： Akinori HOSHINO
CPC分类号： C03B5/1675 , C03B5/167 , C03B5/187 , C03B5/1875
摘要： A stirrer for glass melting which can be used over a prolonged life expectancy, while maintaining a high strength, even in an environment exposed to a high temperature and an oxygen-containing gas atmosphere for a long period of time, and can prevent the air bubbles from being mixed into the glass melt. A stirrer for glass melting is made of iridium or an iridium-based alloy, and has a rotary shaft and a stirring part, a surface region S1 of the surface of the rotary shaft above the stirring part is covered with a cylindrical cover, the cover has a two-layer structure in which an outer layer made of platinum or a platinum rhodium alloy and an inner layer made of platinum or a platinum rhodium alloy containing metal species are joined together, and oxide particles of metal species are precipitated in a dispersed state on a surface of the inner layer on an opposite side to a surface adjacent to the outer layer, wherein the stirrer for glass melting has a pipe made of iridium or an iridium-based alloy which surrounds at least the surface region S2 of the cover from the lower end of the cover to a predetermined height at an interval.
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公开(公告)号：US20150182928A1
公开(公告)日：2015-07-02
申请号：US14657455
申请日：2015-03-13
IPC分类号： B01J3/04
CPC分类号： C30B7/10 , B01J3/04 , C23C30/00 , C30B35/002 , Y10T29/49826 , Y10T117/10 , Y10T117/1096
摘要： An object of the present invention is to manufacture single crystals of high quality on an industrial production scale by preventing impurities from being mixed in single crystals when the single crystals are produced by the solvothermal method.A pressure vessel body 1, in which a supercritical state is maintained, is made of heat resistant alloy, a portion of the pressure vessel body is open, a corrosion-resistant mechanical lining 5 is provided on an inner face of the pressure vessel and on an entire outer circumferential edge of the opening, and the opening is sealed by an airtight mating face formed out of a corrosion-resistant mechanical lining, which is formed on the outer circumferential edge of the opening, and by an airtight mating face of the corrosion-resistant mechanical lining cover 6 on an inner face of the cover 3 through a corrosion-resistant gasket member. Since the pressure vessel body and the inner face of the cover are covered with the corrosion-resistant mechanical lining, corrosion can be prevented. The corrosion-resistant mechanical lining ensures the sealing property on the airtight mating face between the pressure vessel body and the cover and further effectively prevents corrosion in the airtight sealing portion and it becomes possible to repeatedly open and close the airtight sealing portion.
摘要翻译： 本发明的目的是通过在通过溶剂热法制造单晶时，通过防止杂质混合在单晶中，在工业生产规模上制造高质量的单晶。 保持超临界状态的压力容器主体1由耐热合金制成，压力容器主体的一部分打开，在压力容器的内表面上设置耐腐蚀的机械衬里5， 开口的整个外圆周边缘，并且开口由形成在开口的外周边缘上的耐腐蚀机械衬里形成的气密配合面和由腐蚀的气密配合面密封 通过耐腐蚀的垫圈构件在盖3的内表面上具有耐力的机械衬里盖6。 由于压力容器主体和盖的内表面被耐腐蚀的机械衬里覆盖，所以可以防止腐蚀。 耐腐蚀机械衬里确保了压力容器主体和盖之间的气密配合面上的密封性能，并且进一步有效地防止了气密密封部分中的腐蚀，并且可以重复地打开和关闭气密密封部分。
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公开(公告)号：US20100252614A1
公开(公告)日：2010-10-07
申请号：US12438655
申请日：2007-08-23
申请人： Hidetoshi Fujii , Tomohiro Maruko
发明人： Hidetoshi Fujii , Tomohiro Maruko
IPC分类号： B23K20/12
CPC分类号： B23K20/1255 , B23K20/1225 , B23K20/126 , B23K20/233 , B23K2103/08 , B23K2103/18
摘要： Metallic materials having a melting point of at least 2000° C. are caused to abut against each other in a welding part. The rear face side of the welding part is covered by a backing member having a thermal conductivity of 30 W/mK or lower, and then a columnar probe of a rotary tool comprising an Ir alloy is inserted into the front face side of the welding part to weld the metallic materials together. On the front face side of the welding part, inactive gas is supplied into a shield cover. The rotary tool is moved along a longitudinal direction of the welding part while rotating the rotary tool, whereby the metallic materials are welded together. By using the rotary tool comprising an Ir alloy, the refractory metals can be welded to each other by means of friction stir welding.
摘要翻译： 使熔点至少为2000℃的金属材料在焊接部分彼此抵接。 焊接部的背面被具有30W / mK以下的导热率的背衬构件覆盖，然后将包括Ir合金的旋转工具的柱状探针插入到焊接部的正面侧 将金属材料焊接在一起。 在焊接部的正面侧，将无源气体供给到屏蔽罩内。 旋转工具在旋转刀具的同时沿着焊接部的长度方向移动，由此将金属材料焊接在一起。 通过使用包括Ir合金的旋转工具，难熔金属可以通过摩擦搅拌焊接彼此焊接。
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10.发明公开公开(公告)号：US20240025764A1
公开(公告)日：2024-01-25
申请号：US18255657
申请日：2021-12-14
发明人： Yasuyuki Ikeda , Kenji Terada , Hiroaki Suzuki , Junichi Watanabe , Takashi Ito
IPC分类号： C01G55/00 , B01J23/46 , C25B11/077
CPC分类号： C01G55/004 , B01J23/468 , C25B11/0775 , C01P2002/30 , C01P2006/12 , C25B1/04
摘要： An iridium-containing oxide having a total pore volume of 0.20 cm3/g or more, calculated by a BJH method from nitrogen adsorption/desorption isotherm measurement, and a pore distribution having an average pore diameter of 7.0 nm or more.
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