公开(公告)号：US5226955A

公开(公告)日：1993-07-13

申请号：US946908

申请日：1992-09-18

申请人： Toshiki Owaki

发明人： Toshiki Owaki

IPC分类号： B24B37/00 ,  C09G1/02 ,  C09K3/14

CPC分类号： C09G1/02

摘要： A polishing composition for memory hard discs used to obtain polished surfaces of a high precision and a high quality with a high stock removal rate. The composition consists of water, alumina polishing agent, and polishing accelerator, and polishes surfaces of alumite, aluminum, and non-electrolytically nickel plated memory hard discs. The polishing accelerator is one kind selected from the group of molybdate of ammonium molybdate, lithium molybdate, sodium molybdate and potassium molybdate, or a kind selected from the group of molybdate and aluminum salt such as aluminum nitrate or aluminum oxalate, or another one kind selected from the group of molybdate and nickel sulfate, nickel nitrate, nickel sulfamate, and nickel acetate. The addition quantity of the substance above is 0.1 to 20%, the weight ratio of the polishing agent is 2 to 30%, and the mean particle diameter is 0.3 to 10 .mu.m.

摘要翻译： 一种用于存储硬盘的抛光组合物，用于以高精度和高质量获得抛光表面，具有高的原料去除率。 该组合物由水，氧化铝抛光剂和抛光促进剂组成，并对耐酸铝，铝和非电解镀镍记忆硬盘的表面进行抛光。 抛光促进剂是选自钼酸铵，钼酸锂，钼酸钠和钼酸钾的钼酸盐或选自钼酸盐和铝盐如硝酸铝或草酸铝的一种或选自另一种的那些 来自钼酸盐和硫酸镍，硝酸镍，氨基磺酸镍和乙酸镍。 上述物质的添加量为0.1〜20％，研磨剂的重量比为2〜30％，平均粒径为0.3〜10μm。