公开(公告)号：US07721246B2

公开(公告)日：2010-05-18

申请号：US11584737

申请日：2006-10-19

申请人： Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin, III ,  Levi D. Barnes ,  Abani M. Biswas ,  Alakananda A. Biswas, legal representative

发明人： Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin, III ,  Levi D. Barnes ,  Abani M. Biswas

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G03F1/36 ,  G03F7/705

摘要： One embodiment of the present invention determines the effect of placing an assist feature at a location in a layout. During operation, the system receives a first value which was pre-computed by convolving a model with a layout at an evaluation point, wherein the model models semiconductor manufacturing processes. Next, the system determines a second value by convolving the model with an assist feature, which is assumed to be located at a first location which is in proximity to the evaluation point. The system then determines the effect of placing an assist feature using the first value and the second value. An embodiment of the present invention can be used to determine a substantially optimal location for placing an assist feature in a layout.

摘要翻译： 本发明的一个实施例确定了在布局中的位置放置辅助特征的效果。 在操作期间，系统接收通过在评估点卷积具有布局的模型而预先计算的第一值，其中模型对半导体制造过程进行建模。 接下来，系统通过将模型与辅助特征进行卷积来确定第二值，所述辅助特征被假设为位于靠近评估点的第一位置。 然后，系统使用第一值和第二值确定放置辅助特征的效果。 可以使用本发明的实施例来确定用于将辅助特征放置在布局中的基本最佳位置。