公开(公告)号：US20210265125A1

公开(公告)日：2021-08-26

申请号：US17253738

申请日：2019-07-09

申请人： Indranuj Dey ,  Evgeny Papeer ,  Alexander Bespaly ,  Shai Tsipshtein ,  Ynon Hefets ,  Assaf Shaham

发明人： Indranuj Dey ,  Evgeny Papeer ,  Alexander Bespaly ,  Shai Tsipshtein ,  Ynon Hefets ,  Assaf Shaham

IPC分类号： H01J27/24 ,  H01J3/16 ,  G21K5/10

摘要： Disclosed are systems and methods for generating a beam of charged particles, such as an ion beam. Such a system may comprise an interaction chamber configured to support a target, one or more electromagnetic radiation sources, a sensor, and at least one processor. The one or more electromagnetic radiation sources may be configured to provide a probe beam at a first energy for determining orientation data of the target and a particle-generating beam at a second energy, which is greater than the first energy, for producing a beam of charged particles. The processor may be configured to receive feedback information from the sensor and to cause a change in a relative orientation between the particle-generating beam and the target.