公开(公告)号：US4373782A

公开(公告)日：1983-02-15

申请号：US156260

申请日：1980-06-03

申请人： Alfred J. Thelen

发明人： Alfred J. Thelen

IPC分类号： H04B10/00 ,  G02B5/28 ,  G02B6/293 ,  H04B10/02 ,  H04B10/24 ,  G02B27/10

CPC分类号： G02B5/288 ,  H04B10/2504

摘要： A thin film optical filter having a bandpass reflectance characteristic with one of the transition wavelength edges thereof being non-polarizing for radiation incident at a preselected non-normal angle. The filter comprises a transparent substrate and a multilayer thin film optical coating provided on one surface thereof. The optical coating includes a preselected number of alternate layers of a first higher refractive index dielectric material and a second lower refractive index dielectric material arranged as a sequence of dielectric multilayer stacks with intervening spacer layers formed of one of the dielectric materials. The optical thickness of the spacer layers is detuned from half-wave optical thickness to shift either the low wavelength transition edges or the high wavelength transition edges for the separate bandpass response characteristics for the two principal polarization planes substantially into alignment with each other. Various other dielectric stack designs utilizing detuned layers to accomplish the same alignment of wavelength transition edges are described. Simplex and duplex fiber optic communications systems utilizing non-polarizing edge filters of the thin film type are also disclosed.

摘要翻译： 具有带通反射特性的薄膜滤光器，其中的一个过渡波长边缘对于以预选非法线角度入射的辐射是非偏振的。 滤光器包括透明基板和设置在其一个表面上的多层薄膜光学涂层。 光学涂层包括预选数量的第一较高折射率电介质材料的交替层和布置为具有由介电材料之一形成的介入间隔层的电介质多层堆叠序列的第二较低折射率介电材料。 间隔层的光学厚度与半波光学厚度失谐，以使两个主偏振平面的分离带通响应特性基本上彼此对准，以将低波长过渡边缘或高波长过渡边缘移位。 描述利用失谐层实现波长过渡边缘相同对准的各种其它介质叠层设计。 还公开了利用薄膜型非偏振边缘滤光片的单工和双工光纤通信系统。

公开(公告)号：US3991707A

公开(公告)日：1976-11-16

申请号：US127783

申请日：1971-03-24

申请人： Alfred J. Thelen ,  John A. Aguilera ,  James N. Grant ,  George Eugene Michel

发明人： Alfred J. Thelen ,  John A. Aguilera ,  James N. Grant ,  George Eugene Michel

IPC分类号： C23C14/04 ,  C23C14/22 ,  C23C13/08

CPC分类号： C23C14/044 ,  C23C14/22

摘要： In vapor deposition apparatus, a plurality of spaced substrates on a rotatable horizontally disposed support, a vapor source disposed below said support and offset with respect to the axis of rotation of the support, and a mask extending approximately 180.degree. which is uniformly disposed and diametrically opposed with respect to said source whereby the effective vapor stream is generally normal to exposed substrates. A continuously exposed monitor chip is provided.