公开(公告)号：US20050002836A1

公开(公告)日：2005-01-06

申请号：US10909077

申请日：2004-07-30

申请人： Jeffrey Hardesty ,  Gordon Rutland ,  Stephen Thomas ,  Amy Bowers ,  Dagan Brush ,  Eric Lesher ,  Robert Wyland

发明人： Jeffrey Hardesty ,  Gordon Rutland ,  Stephen Thomas ,  Amy Bowers ,  Dagan Brush ,  Eric Lesher ,  Robert Wyland

IPC分类号： B01D53/88 ,  F01N3/28 ,  B01D53/34

CPC分类号： F01N3/2875 ,  B01D53/885 ,  F01N3/2853 ,  F01N3/2867 ,  Y10T29/49345

摘要： A gas treatment device comprises a housing; a substrate disposed within the housing; a retention device disposed between the housing and the substrate, wherein the retention device comprises a plurality of individual spring elements, and a break, wherein the plurality of individual spring elements exert a compressive force against the housing and the substrate such that the substrate is retained within the housing; and a support material disposed between the housing and the substrate.

摘要翻译： 气体处理装置包括壳体; 设置在所述壳体内的基板; 保持装置，其设置在所述壳体和所述基板之间，其中所述保持装置包括多个单独的弹簧元件和断裂，其中所述多个单独的弹簧元件对所述壳体和所述基板施加压缩力，使得所述基板被保持 在房屋内 以及设置在壳体和基板之间的支撑材料。