公开(公告)号：US06489085B2

公开(公告)日：2002-12-03

申请号：US09742960

申请日：2000-12-20

申请人： I-Hsiung Huang ,  Anderson Chang ,  Chien-Wen Lai ,  Anseime Chen

发明人： I-Hsiung Huang ,  Anderson Chang ,  Chien-Wen Lai ,  Anseime Chen

IPC分类号： G03F740

CPC分类号： G03F7/40 ,  G03F7/038

摘要： A thermal flow photolithographic process. A thermal flow photoresist is provided. A cross-linking agent is added to the thermal flow photoresist to form a high-temperature cross-linking photoresist material. A substrate having an insulation layer thereon is provided. The high-temperature cross-linking photoresist is deposited over the insulation layer. The cross-linked photoresist layer on the insulation layer is exposed to light, chemically developed and then heated to cause thermal flow.

摘要翻译： 热流光刻工艺。 提供热流光致抗蚀剂。 将交联剂添加到热流光致抗蚀剂中以形成高温交联光致抗蚀剂材料。 提供其上具有绝缘层的基板。 高温交联光刻胶沉积在绝缘层上。 绝缘层上的交联光致抗蚀剂层暴露于光，化学显影，然后加热以引起热流。

公开(公告)号：US07393616B2

公开(公告)日：2008-07-01

申请号：US11397464

申请日：2006-04-04

申请人： Jiann Yuan Huang ,  Anderson Chang ,  Chih-Ming Ke ,  Heng-Jen Lee ,  Chin-Hsiang Lin ,  Tsai-Sheng Gau

发明人： Jiann Yuan Huang ,  Anderson Chang ,  Chih-Ming Ke ,  Heng-Jen Lee ,  Chin-Hsiang Lin ,  Tsai-Sheng Gau

IPC分类号： G03F1/00 ,  G03F9/00

CPC分类号： G03F7/70616

摘要： A method including: providing collinear first and second lines in a mask layer over a substrate, the first line having at one end a first line end and having a first line body adjacent the first line end, and the second line having at one end a second line end and having a second line body adjacent the second line end; measuring line widths of the first line body and the second line body; locating effective line end positions for the first line end based on the line width of the first line body and for the second line end based on the line width of the second line body; and measuring a distance between the effective line end positions, as an effective line end spacing.

摘要翻译： 一种方法，包括：在衬底上的掩模层中提供共线的第一和第二线，所述第一线在一端具有第一线端并且具有与所述第一线端相邻的第一线体，并且所述第二线在一端具有 第二线端并且具有与第二线端相邻的第二线体; 测量第一线体和第二线体的线宽; 基于第一线体的线宽度和第二线端基于第二线体的线宽来定位第一线端的有效线端位置; 并测量有效线端位置之间的距离，作为有效线端间距。

公开(公告)号：US20070228003A1

公开(公告)日：2007-10-04

申请号：US11397464

申请日：2006-04-04

申请人： Jiann Huang ,  Anderson Chang ,  Chih-Ming Ke ,  H. J. Lee ,  Chin-Hsiang Lin ,  Tsai-Sheng Gau

发明人： Jiann Huang ,  Anderson Chang ,  Chih-Ming Ke ,  H. J. Lee ,  Chin-Hsiang Lin ,  Tsai-Sheng Gau

IPC分类号： C23F1/00 ,  G01L21/30

CPC分类号： G03F7/70616

摘要： A method including: providing collinear first and second lines in a mask layer over a substrate, the first line having at one end a first line end and having a first line body adjacent the first line end, and the second line having at one end a second line end and having a second line body adjacent the second line end; measuring line widths of the first line body and the second line body; locating effective line end positions for the first line end based on the line width of the first line body and for the second line end based on the line width of the second line body; and measuring a distance between the effective line end positions, as an effective line end spacing.

摘要翻译： 一种方法，包括：在衬底上的掩模层中提供共线的第一和第二线，所述第一线在一端具有第一线端并且具有与所述第一线端相邻的第一线体，并且所述第二线在一端具有 第二线端并且具有与第二线端相邻的第二线体; 测量第一线体和第二线体的线宽; 基于第一线体的线宽度和第二线端基于第二线体的线宽来定位用于第一线端的有效线端位置; 并测量有效线端位置之间的距离，作为有效线端间距。