公开(公告)号：US08471202B2

公开(公告)日：2013-06-25

申请号：US12930046

申请日：2010-12-22

Applicant: Josef Biberger ,  Ralph Pulwey ,  Ernst Draszba ,  Klaus Hegele ,  Harald Niebel ,  Andreas Adolf ,  Rainer Arnold

Inventor： Josef Biberger ,  Ralph Pulwey ,  Ernst Draszba ,  Klaus Hegele ,  Harald Niebel ,  Andreas Adolf ,  Rainer Arnold

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J2237/1536 ,  H01J2237/223

Abstract: A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Abstract translation: 公开了使用粒子束产生物体表示的方法以及用于执行该方法的粒子束装置。 本文描述的系统基于指定方法和粒子束装置的目的，该装置用于产生对象的表示，使得产生的图像，特别是包括FFT图像，尽可能地不产生不是由 要检查的对象。 特别是在像素寿命，线回扫时间和像素停顿时间在光栅图案中变化的情况下实现。

公开(公告)号：US20110198497A1

公开(公告)日：2011-08-18

申请号：US12930046

申请日：2010-12-22

Applicant: Josef Biberger ,  Ralph Pulwey ,  Ernst Draszba ,  Klaus Hegele ,  Harald Niebel ,  Andreas Adolf ,  Rainer Arnold

Inventor： Josef Biberger ,  Ralph Pulwey ,  Ernst Draszba ,  Klaus Hegele ,  Harald Niebel ,  Andreas Adolf ,  Rainer Arnold

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J2237/1536 ,  H01J2237/223

Abstract: A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Abstract translation: 公开了使用粒子束产生物体表示的方法以及用于执行该方法的粒子束装置。 本文描述的系统基于指定方法和粒子束装置的目的，该装置用于产生对象的表示，使得产生的图像，特别是包括FFT图像，尽可能地不产生不是由 要检查的对象。 特别是在像素寿命，线回扫时间和像素停顿时间在光栅图案中变化的情况下实现。

公开(公告)号：US08710451B2

公开(公告)日：2014-04-29

申请号：US13251174

申请日：2011-09-30

Applicant: Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J37/317

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和具有多个第一偏移电极51a，51b，51c和多个第二偏转电极52a，52b，52c的至少一个光束偏转器39，其中电压供应系统被配置为供应 对多个第二偏转电极的不同的可调偏转电压使得多个第二偏转电极和多个相对的第一偏转电极之间的电偏转场具有共同的取向。 离子束系统具有高动能模式，其中电偏转场的分布具有较大的宽度，以及低动能模式，其中电偏转场的分布具有较小的宽度。

公开(公告)号：US20120256098A1

公开(公告)日：2012-10-11

申请号：US13251174

申请日：2011-09-30

Applicant: Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J3/14

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的 可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。