公开(公告)号：US11908700B2

公开(公告)日：2024-02-20

申请号：US17816374

申请日：2022-07-29

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Nai-Han Cheng ,  Chi-Ming Yang

IPC: H01L21/3065 ,  H01J37/305 ,  H01J37/317 ,  H01J37/32

CPC classification number: H01L21/3065 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/317 ,  H01J37/3172 ,  H01J37/32412

Abstract: In some embodiments of the present disclosure, a method of manufacturing a semiconductor structure includes the following operations. A substrate including a first atom and a second atom is provided. An etchant is dispatched from an ionizer. A compound is formed over the substrate by bonding the first atom with the etchant. A particle is released from an implanter. The compound is removed by bombarding the compound with the particle having an energy smaller than a bonding energy between the first atom and the second atom, wherein the particle is different from the etchant.

公开(公告)号：US20180038048A1

公开(公告)日：2018-02-08

申请号：US15730160

申请日：2017-10-11

Applicant: XYLECO, INC.

Inventor： Marshall MEDOFF ,  Thomas Craig MASTERMAN ,  Robert PARADIS

IPC: D21C9/00 ,  C10L9/08 ,  B01D15/02 ,  B01D53/32 ,  B01D61/44 ,  B01J19/08 ,  C13K13/00 ,  E04B1/92 ,  H01J37/317 ,  B65G27/00 ,  B65G53/04 ,  B65G53/40 ,  C07C29/149 ,  C07C31/12 ,  C10G1/00 ,  C12P19/14 ,  C12P19/02 ,  C12P7/52 ,  C12P7/10 ,  C12P7/06 ,  C12M1/00 ,  C13K1/02 ,  G21F7/00

CPC classification number: D21C9/007 ,  B01D15/02 ,  B01D53/32 ,  B01D61/44 ,  B01D61/445 ,  B01J19/085 ,  B01J2219/0869 ,  B01J2219/0879 ,  B01J2219/0886 ,  B65G27/00 ,  B65G53/04 ,  B65G53/40 ,  C07C29/149 ,  C07C31/12 ,  C10G1/00 ,  C10L1/023 ,  C10L1/026 ,  C10L9/08 ,  C10L2200/0469 ,  C10L2200/0476 ,  C10L2290/36 ,  C12M47/00 ,  C12M47/10 ,  C12P7/04 ,  C12P7/06 ,  C12P7/10 ,  C12P7/52 ,  C12P7/56 ,  C12P19/02 ,  C12P19/14 ,  C12P2201/00 ,  C12P2203/00 ,  C13K1/02 ,  C13K13/002 ,  E04B1/92 ,  E04B2001/925 ,  G21F7/00 ,  H01J37/317 ,  H01J2237/202 ,  H01J2237/31 ,  H01J2237/3165 ,  Y02E50/16 ,  Y02E50/17 ,  Y02E50/32 ,  Y02E50/343 ,  Y02E60/17 ,  Y02P20/136 ,  Y02W10/33 ,  Y02W10/37

Abstract: Biomass feedstocks (e.g., plant biomass, animal biomass, and municipal waste biomass) are processed to produce useful products, such as fuels. For example, novel systems, methods and equipment for conveying and/or cooling treated biomass are described.

公开(公告)号：US20170338075A1

公开(公告)日：2017-11-23

申请号：US15522490

申请日：2015-10-27

Applicant: ENTEGRIS, INC.

Inventor： Oleg BYL ,  Joseph D SWENEY

IPC: H01J27/20 ,  H01J37/08 ,  H01J27/16 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J27/20 ,  H01J27/16 ,  H01J37/08 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/082 ,  H01L21/265

Abstract: An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus (10), comprising: an ion source chamber (12); and a consumable structure in or associated with the ion source chamber (12), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. For example, the consumable structure is a dopant gas feed line (14) comprising a pipe or conduit having an interior layer formed of a solid dopant source material.

公开(公告)号：US09799488B2

公开(公告)日：2017-10-24

申请号：US14571533

申请日：2014-12-16

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/08 ,  H01J37/147

CPC classification number: H01J37/3171 ,  C03C23/005 ,  C03C2204/08 ,  H01J37/05 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01J2237/31701 ,  H01L21/02115 ,  H01L21/02238 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31116 ,  H01L21/32115 ,  H01L29/36 ,  H01M4/04 ,  H01M10/04 ,  H01M10/0585 ,  H01M2004/021 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A method of improving the surface of an object treats the surface with a neutral beam formed from a gas cluster ion mean to create a surface texture and/or increase surface area.

公开(公告)号：US09767987B2

公开(公告)日：2017-09-19

申请号：US14288853

申请日：2014-05-28

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Ludovic Godet ,  Patrick M. Martin ,  Timothy J. Miller ,  Vikram Singh

IPC: H01J37/317 ,  H01L21/265 ,  H01L21/263 ,  H01J37/32 ,  H01L21/027 ,  H01L21/223 ,  G03F7/40 ,  H01L29/66

CPC classification number: H01J37/317 ,  G03F7/40 ,  H01J37/3171 ,  H01J37/3174 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32623 ,  H01L21/0273 ,  H01L21/2236 ,  H01L21/263 ,  H01L21/265 ,  H01L29/66787

Abstract: A method of treating resist features comprises positioning, in a process chamber, a substrate having a set of patterned resist features on a first side of the substrate and generating a plasma in the process chamber having a plasma sheath adjacent to the first side of the substrate. The method may further comprise modifying a shape of a boundary between the plasma and the plasma sheath with a plasma sheath modifier so that a portion of the shape of the boundary is not parallel to a plane defined by a front surface of the substrate facing the plasma, wherein ions from the plasma impinge on the patterned resist features over a wide angular range during a first exposure.

公开(公告)号：US09759550B2

公开(公告)日：2017-09-12

申请号：US14598913

申请日：2015-01-16

Applicant: Carl Zeiss SMT GmbH

Inventor： Alexander Wolf ,  Markus Schwab ,  Toralf Gruner ,  Joachim Hartjes

IPC: G01B11/14 ,  G03F7/20 ,  H01J37/317 ,  H05G2/00

CPC classification number: G01B11/14 ,  G03F7/70775 ,  G03F7/7085 ,  H01J37/317 ,  H01J2237/0203 ,  H01J2237/31777 ,  H05G2/008

Abstract: A projection exposure apparatus (10) for microlithography has a plurality of optical components (M1-M6) forming an exposure beam path, as well as a distance measurement system (30, 130, 230) configured to measure a distance between at least one of the optical components and a reference element (40, 140, 240). The distance measurement system comprises a frequency comb generator (32, 132, 232), which is configured to generate electromagnetic radiation (36, 236) having a comb-shaped frequency spectrum.

公开(公告)号：US09744617B2

公开(公告)日：2017-08-29

申请号：US14819273

申请日：2015-08-05

Applicant: LOCKHEED MARTIN CORPORATION

Inventor： Peter V. Bedworth ,  Jacob L. Swett

IPC: G21K5/00 ,  B23K15/08 ,  B23K15/06 ,  C01B31/04 ,  H01J37/31 ,  H01J37/317

CPC classification number: B23K15/085 ,  B23K15/0006 ,  B23K15/06 ,  B23K2103/172 ,  B23K2103/30 ,  C01B32/194 ,  H01J37/31 ,  H01J37/317 ,  Y10T428/24322

Abstract: Multi-layer sheets of graphene-based material having a plurality of pores extending therethrough are described herein. Methods for making the sheets include exposing a graphene-based material comprising multilayer graphene having from 5 to 20 layers of graphene to a particle beam having an ion energy of at least about 1500 eV to create damage tracks in the graphene sheets. The damage tracks in the graphene sheets are then exposed to a chemical etchant, such as an oxidant to define pores through the stacked graphene sheets. Production of the damage tracks and etching of the damage tracks can take place while the graphene is disposed on a substrate.

公开(公告)号：US20170216775A1

公开(公告)日：2017-08-03

申请号：US15487565

申请日：2017-04-14

Applicant: Xyleco, Inc.

Inventor： Marshall MEDOFF ,  Thomas Craig MASTERMAN ,  Maia Stapleton MUKHERJEE ,  Christopher COOPER

IPC: B01D61/44 ,  C12P7/10 ,  C12P7/56 ,  C13K13/00

CPC classification number: D21C9/007 ,  B01D15/02 ,  B01D53/32 ,  B01D61/44 ,  B01D61/445 ,  B01J19/085 ,  B01J2219/0869 ,  B01J2219/0879 ,  B01J2219/0886 ,  B65G27/00 ,  B65G53/04 ,  B65G53/40 ,  C07C29/149 ,  C07C31/12 ,  C10G1/00 ,  C10L1/023 ,  C10L1/026 ,  C10L9/08 ,  C10L2200/0469 ,  C10L2200/0476 ,  C10L2290/36 ,  C12M47/00 ,  C12M47/10 ,  C12P7/04 ,  C12P7/06 ,  C12P7/10 ,  C12P7/52 ,  C12P7/56 ,  C12P19/02 ,  C12P19/14 ,  C12P2201/00 ,  C12P2203/00 ,  C13K1/02 ,  C13K13/002 ,  E04B1/92 ,  E04B2001/925 ,  G21F7/00 ,  H01J37/317 ,  H01J2237/202 ,  H01J2237/31 ,  H01J2237/3165 ,  Y02E50/16 ,  Y02E50/17 ,  Y02E50/32 ,  Y02E50/343 ,  Y02E60/17 ,  Y02P20/136 ,  Y02W10/33 ,  Y02W10/37

Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful intermediates and products, such as energy, fuels, foods or materials. Systems, methods and equipment are described for upgrading process streams using electrodialysis or electrodialysis reversal.

公开(公告)号：US20170197194A1

公开(公告)日：2017-07-13

申请号：US15472985

申请日：2017-03-29

Applicant: XYLECO, INC.

Inventor： Marshall Medoff ,  Thomas Craig Masterman ,  Robert Paradis

IPC: B01J19/08 ,  B65G27/04 ,  H01J37/20 ,  D21B1/02

CPC classification number: G21F3/00 ,  A61L2/087 ,  B01J19/082 ,  B01J19/085 ,  B01J19/12 ,  B01J19/123 ,  B01J19/125 ,  B01J19/22 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0879 ,  B01J2219/12 ,  B01J2219/1203 ,  B65G27/04 ,  C08H8/00 ,  C10B19/00 ,  C10B53/02 ,  C10G1/02 ,  C10G32/04 ,  C10L5/403 ,  C10L5/442 ,  C10L5/445 ,  C10L5/46 ,  C10L2200/0469 ,  C10L2290/24 ,  C10L2290/28 ,  C10L2290/36 ,  C10L2290/52 ,  C13K1/02 ,  C13K13/002 ,  D21B1/02 ,  G21K5/04 ,  G21K5/10 ,  H01J5/18 ,  H01J33/04 ,  H01J37/20 ,  H01J37/317 ,  H01J2237/2002 ,  H01J2237/202 ,  Y02E50/10 ,  Y02E50/14 ,  Y02E50/16 ,  Y02E50/30 ,  Y02E50/32 ,  Y02P20/145

Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful intermediates and products, such as energy, fuels, foods or materials. For example, systems and methods are described that can be used to treat feedstock materials, such as cellulosic and/or lignocellulosic materials, while cooling equipment and the biomass to prevent overheating and possible distortion and/or degradation. The biomass is conveyed by a conveyor, which conveys the biomass under an electron beam from an electron beam accelerator. The conveyor can be cooled with cooling fluid. The conveyor can also vibrate to facilitate exposure to the electron beam. The conveyor can be configured as a trough that can be optionally cooled.

公开(公告)号：US09673019B2

公开(公告)日：2017-06-06

申请号：US14859391

申请日：2015-09-21

Applicant: EL-MUL TECHNOLOGIES LTD.

Inventor： Eli Cheifetz ,  Amir Weingarten ,  Semyon Shofman

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/285 ,  H01J37/08 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/08 ,  H01J37/244 ,  H01J37/285 ,  H01J37/317 ,  H01J2237/15 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/31749

Abstract: An electron detection system for detecting secondary electrons emitted from a sample irradiated by a Focused Ion Beam (FIB). The FIB emanates from a FIB column and travels along a beam axis within a beam region, which extends from the FIB column to the sample. The system comprises an electron detector configured for detecting the secondary electrons, and a deflecting field configured to deflect a trajectory of the secondary electrons, which were propagating towards the FIB column, to propel away from the beam axis and towards the electron detector. The deflecting field may be configured to divert the trajectory of secondary electrons while the secondary electrons are generally within the beam region.