Multilayer imageable element with improved chemical resistance
    3.
    发明授权
    Multilayer imageable element with improved chemical resistance 有权
    具有改善耐化学性的多层可成像元件

    公开(公告)号:US07144661B1

    公开(公告)日:2006-12-05

    申请号:US11263879

    申请日:2005-11-01

    IPC分类号: G03F7/038 G03F7/11 G03F7/14

    摘要: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymer that is removable using an alkaline developer and in which from about 1 to about 50 mol % of its recurring units are derived from one or more of the ethylenically unsaturated polymerizable monomers represented by the following Structure (I): CH2═C(R1)C(═O)NR2(CR3R4)nOH   (I) wherein R1, R2, R3, and R4 are independently hydrogen, lower alkyl, or phenyl, and n is 1 to 20. The imageable elements having improved resistance to development and printing chemicals and solvents.

    摘要翻译: 正性可成像元件包括辐射吸收化合物和在具有亲水表面的基底上的内层和外层。 内层包括可使用碱性显影剂除去的聚合物,其中约1至约50mol%的重复单元衍生自一种或多种由以下结构(I)表示的烯键式不饱和可聚合单体: C( - O)NR(C) - (C 1 -C 6) (2)(2)(2)(3)式(1) 其中R 1,R 2,R 3,和R 4,R 3,R 3,R 3, SUP>独立地为氢,低级烷基或苯基,n为1至20.可成像元件具有改善的耐显影性和印刷化学品和溶剂的性能。