公开(公告)号：US20070098889A1

公开(公告)日：2007-05-03

申请号：US10570449

申请日：2004-08-30

申请人： Kouichi Nose ,  Shinichi Yamabe ,  Isao Tokomoto ,  Takanobu Hori ,  Atsushi Shozude ,  Takahiko Kondo

发明人： Kouichi Nose ,  Shinichi Yamabe ,  Isao Tokomoto ,  Takanobu Hori ,  Atsushi Shozude ,  Takahiko Kondo

IPC分类号： C23C16/00 ,  B05D3/00

CPC分类号： C23C14/505 ,  C23C14/24 ,  C23C14/541

摘要： A vacuum film deposition method comprises the steps of mounting a substrate on a substrate holder (6a) that is disposed in a vacuum chamber (1) and is provided with a passage (7f), (7g), and (7j) in which predetermined heat medium flows; maintaining an inside of the vacuum chamber substantially in vacuum state; evaporating evaporation materials from two or more evaporation sources in the inside of the vacuum chamber; and diffusing the evaporated evaporation materials in the inside of the vacuum chamber in a predetermined order; and depositing the diffused evaporation materials on a deposition surface of the substrate, thereby forming a multi-layered film made of the evaporation materials on the deposition surface of the substrate; wherein an antifreezing fluid is used as the predetermined heat medium flowing in the passage of the substrate holder.

摘要翻译： 真空膜沉积方法包括以下步骤：将基板安装在设置在真空室（1）中的基板保持器（6a）上，并设置有通道（7f），（7g）和（7j） ），其中预定的热介质流动; 在真空状态下保持真空室的内部; 从真空室内部的两个或更多个蒸发源蒸发蒸发材料; 并以预定的顺序将蒸发的蒸发材料扩散到真空室的内部; 并将扩散的蒸发材料沉积在基板的沉积表面上，由此在基板的沉积表面上形成由蒸发材料制成的多层膜; 其中使用防冻流体作为在所述基板保持器的通道中流动的预定热介质。