公开(公告)号：US20160249416A1

公开(公告)日：2016-08-25

申请号：US15027343

申请日：2014-10-06

申请人： Itzhak CHAIMOV ,  Ronen COHEN ,  Ben ZICKEL ,  Maksim BEREZIN ,  Coby MARON ,  Amir BURNSTEIN

发明人： Ram ELBOIM ,  Itzhak CHAIMOV ,  Ronen COHEN ,  Ben ZICKEL ,  Maksim BEREZIN ,  Coby MARON ,  Amir BURNSTEIN

IPC分类号： H05B6/64 ,  H05B6/72 ,  H05B6/68

CPC分类号： H05B6/6447 ,  H05B6/6438 ,  H05B6/645 ,  H05B6/68 ,  H05B6/686 ,  H05B6/705 ,  H05B6/72 ,  H05B6/76 ,  H05B2206/044 ,  Y02B40/143 ,  Y02B40/146

摘要： A disclosed apparatus for sensing and processing an object in a cavity (104) comprises a sensing RF source (110) and a sensing antenna (112), and a processing RF source (120) and a processing antenna (122). The sensing RF source is configured to generate low power RF radiation at a first frequency range and the sensing antenna is configured to feed the cavity with RF radiation generated by the low power RF source. The processing RF source is configured to generate high power RF radiation at a second frequency range, and the processing antenna is configured to feed the cavity with RF radiation generated by the processing RF source. A protecting system (130) configured to protect the sensing RF source from RF radiation generated by the processing RF source may be provided.

摘要翻译： 用于感测和处理空腔（104）中的物体的公开的装置包括感测RF源（110）和感测天线（112），以及处理RF源（120）和处理天线（122）。 感测RF源被配置为在第一频率范围内产生低功率RF辐射，并且感测天线被配置为用低功率RF源产生的RF辐射馈送空腔。 处理RF源被配置为在第二频率范围产生高功率RF辐射，并且处理天线被配置为用由RF处理RF产生的RF辐射馈送空腔。 可以提供被配置为保护感测RF源免受由处理RF源产生的RF辐射的保护系统（130）。

公开(公告)号：US10244585B2

公开(公告)日：2019-03-26

申请号：US15027343

申请日：2014-10-06

申请人： GOJI LIMITED ,  Ram Elboim ,  Itzhak Chaimov ,  Ronen Cohen ,  Ben Zickel ,  Maksim Berezin ,  Coby Maron ,  Amir Burnstein

发明人： Ram Elboim ,  Itzhak Chaimov ,  Ronen Cohen ,  Ben Zickel ,  Maksim Berezin ,  Coby Maron ,  Amir Burnstein

IPC分类号： H05B6/64 ,  H05B6/68 ,  H05B6/70 ,  H05B6/72 ,  H05B6/76

摘要： A disclosed apparatus for sensing and processing an object in a cavity (104) comprises a sensing RF source (110) and a sensing antenna (112), and a processing RF source (120) and a processing antenna (122). The sensing RF source is configured to generate low power RF radiation at a first frequency range and the sensing antenna is configured to feed the cavity with RF radiation generated by the low power RF source. The processing RF source is configured to generate high power RF radiation at a second frequency range, and the processing antenna is configured to feed the cavity with RF radiation generated by the processing RF source. A protecting system (130) configured to protect the sensing RF source from RF radiation generated by the processing RF source may be provided.