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公开(公告)号:US20240240319A1
公开(公告)日:2024-07-18
申请号:US18562478
申请日:2023-02-06
发明人: Hiroshi KAWAURA
IPC分类号: C23C16/458 , C23C16/44 , C23C16/455 , C30B25/12 , C30B25/14
CPC分类号: C23C16/4584 , C23C16/4412 , C23C16/45544 , C23C16/45563 , C30B25/12 , C30B25/14
摘要: A film deposition apparatus having a plurality of susceptors, each of which has spot facings as a substrate mounting surface on a slope. The susceptors are arranged side by side horizontally and radially on a susceptor holder in a doughnut-shaped concave space inside a reactor. Gas supply tubes are provided on a lid in the circumferential direction in the following order: a purge gas supply tube, a precursor-containing gas supply tube, a purge gas supply tube and an oxidant-containing gas supply tube. Gases supplied to the reactor from gas outlet holes pass through a V-shaped groove space between the two susceptors and are exhausted from the bottom of the reactor. ALD deposition is performed by rotating the susceptor holder in the circumferential direction.