公开(公告)号：US20240240319A1

公开(公告)日：2024-07-18

申请号：US18562478

申请日：2023-02-06

申请人： CV Research Corporation

发明人： Hiroshi KAWAURA

IPC分类号： C23C16/458 ,  C23C16/44 ,  C23C16/455 ,  C30B25/12 ,  C30B25/14

CPC分类号： C23C16/4584 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/45563 ,  C30B25/12 ,  C30B25/14

摘要： A film deposition apparatus having a plurality of susceptors, each of which has spot facings as a substrate mounting surface on a slope. The susceptors are arranged side by side horizontally and radially on a susceptor holder in a doughnut-shaped concave space inside a reactor. Gas supply tubes are provided on a lid in the circumferential direction in the following order: a purge gas supply tube, a precursor-containing gas supply tube, a purge gas supply tube and an oxidant-containing gas supply tube. Gases supplied to the reactor from gas outlet holes pass through a V-shaped groove space between the two susceptors and are exhausted from the bottom of the reactor. ALD deposition is performed by rotating the susceptor holder in the circumferential direction.