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公开(公告)号：US20090103799A1
公开(公告)日：2009-04-23
申请号：US12253618
申请日：2008-10-17
申请人： Chan-Kyeong Hyon , Young-Seog Kang , Sang-Ho Lee , Hyun-Jong Lee
发明人： Chan-Kyeong Hyon , Young-Seog Kang , Sang-Ho Lee , Hyun-Jong Lee
CPC分类号： G03F1/84
摘要： A pattern matching method for use in manufacturing a semiconductor memory device increases a pattern matching rate between a GDS image and an SEM image. The pattern matching method includes extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform a pattern matching; performing a two-dimensional furrier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; deciding whether or not a pattern is a repeated pattern or non-repeated pattern by using the analyzed low spatial frequency; and limiting an X/Y range for a pattern matching when the decision result is for the repeated pattern, and then performing the pattern matching between the SEM image and the GDS image.
摘要翻译： 用于制造半导体存储器件的图案匹配方法增加了GDS图像和SEM图像之间的图案匹配率。 模式匹配方法包括提取扫描电子显微镜（SEM）图像和图形数据系统（GDS）图像以执行模式匹配; 对所提取的GDS图像执行二维傅立叶变换（FFT），并分析低空间频率; 通过使用所分析的低空间频率来确定图案是否是重复图案或非重复图案; 并且当判定结果用于重复图案时，限制用于模式匹配的X / Y范围，然后执行SEM图像和GDS图像之间的图案匹配。
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公开(公告)号：US08229205B2
公开(公告)日：2012-07-24
申请号：US12253618
申请日：2008-10-17
申请人： Chan-Kyeong Hyon , Young-Seog Kang , Sang-Ho Lee , Hyun-Jong Lee
发明人： Chan-Kyeong Hyon , Young-Seog Kang , Sang-Ho Lee , Hyun-Jong Lee
CPC分类号： G03F1/84
摘要： A pattern matching method for use in manufacturing a semiconductor memory device increases a pattern matching rate between a GDS image and an SEM image. The pattern matching method includes extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform a pattern matching; performing a two-dimensional Fourier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; deciding whether or not a pattern is a repeated pattern or non-repeated pattern by using the analyzed low spatial frequency; and limiting an X/Y range for a pattern matching when the decision result is for the repeated pattern, and then performing the pattern matching between the SEM image and the GDS image.
摘要翻译： 用于制造半导体存储器件的图案匹配方法增加了GDS图像和SEM图像之间的图案匹配率。 模式匹配方法包括提取扫描电子显微镜（SEM）图像和图形数据系统（GDS）图像以执行模式匹配; 对所提取的GDS图像执行二维傅里叶变换（FFT）并分析低空间频率; 通过使用所分析的低空间频率来确定图案是否是重复图案或非重复图案; 并且当判定结果用于重复图案时，限制用于模式匹配的X / Y范围，然后执行SEM图像和GDS图像之间的图案匹配。
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公开(公告)号：US20080187211A1
公开(公告)日：2008-08-07
申请号：US11880495
申请日：2007-07-23
申请人： Chan-Kyeong Hyon , Young-Seog Kang , Sang-Ho Lee
发明人： Chan-Kyeong Hyon , Young-Seog Kang , Sang-Ho Lee
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/64 , G06T7/13 , G06T2207/10056 , G06T2207/30148
摘要： A global matching method for semiconductor memory device fabrication may include extracting a graphic data system (GDS) image and a scanning electron microscope (SEM) image of patterns in a region on a wafer. First directional edges extending in a first direction and second directional edges extending in a second direction may be separately extracted from each of the GDS image and the SEM image with the first and second directions being different. The GDS image and the SEM image may be matched with respect to either the first directional edges or the second directional edges which are relatively shorter. After the relatively shorter edges of the GDS image and the SEM image are matched, the GDS image and the SEM image may be matched with respect to relatively longer edges, based on a result of the matching with respect to the relatively shorter edges, thereby completing pattern matching of the GDS image and the SEM image.
摘要翻译： 用于半导体存储器件制造的全局匹配方法可以包括提取晶片上的区域中的图案的图形数据系统（GDS）图像和扫描电子显微镜（SEM）图像。 可以从第一和第二方向不同的每个GDS图像和SEM图像分别提取沿第一方向延伸的第一方向边缘和沿第二方向延伸的第二方向边缘。 GDS图像和SEM图像可以相对于相对较短的第一方向边缘或第二方向边缘匹配。 在GDS图像和SEM图像的相对较短边缘匹配之后，基于相对于较短边缘的匹配结果，GDS图像和SEM图像可以相对于相对较长的边缘匹配，由此完成 GDS图像和SEM图像的图案匹配。
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