公开(公告)号：US09224612B2

公开(公告)日：2015-12-29

申请号：US13795943

申请日：2013-03-12

申请人： In-Kyo Kim ,  Myung-Soo Huh ,  Suk-Won Jung ,  Cheol-Min Jang ,  Jae-Hyun Kim ,  Jin-Kwang Kim ,  Chang-Woo Shim ,  Sung-Hun Key

发明人： In-Kyo Kim ,  Myung-Soo Huh ,  Suk-Won Jung ,  Cheol-Min Jang ,  Jae-Hyun Kim ,  Jin-Kwang Kim ,  Chang-Woo Shim ,  Sung-Hun Key

IPC分类号： C23C16/54 ,  H01L21/30 ,  H01L51/52 ,  C23C16/455 ,  H01L51/56

CPC分类号： H01L21/30 ,  C23C16/45538 ,  C23C16/45551 ,  C23C16/45578 ,  C23C16/545 ,  H01L51/52 ,  H01L51/56

摘要： A vapor deposition apparatus for depositing a thin film on a substrate includes a cover having an accommodation portion and a communicated portion, which communicated portion is connected to the accommodation portion and faces a direction of the substrate, and includes a body in the accommodation portion, which body includes a first portion and a second portion. The first portion is disposed at a first location of the body and connected to a first injection portion for injecting a first material onto the substrate, the second portion is disposed at a second location of the body and connected to a second injection portion for injecting a second material onto the substrate, and the body rotates in at least one direction so that the first portion and the second portion are alternately connected to each other with respect to the communicated portion.

摘要翻译： 一种用于在基片上沉积薄膜的气相沉积装置包括具有容纳部分和连通部分的盖子，该连通部分连接到容纳部分并面向基板的方向，并且包括在容纳部分中的主体， 该主体包括第一部分和第二部分。 第一部分设置在主体的第一位置并连接到用于将第一材料注入到基板上的第一注射部分，第二部分设置在主体的第二位置处并连接到第二注射部分，用于注射 第二材料到基板上，并且主体沿至少一个方向旋转，使得第一部分和第二部分相对于连通部交替地彼此连接。

公开(公告)号：US20140113395A1

公开(公告)日：2014-04-24

申请号：US13795943

申请日：2013-03-12

申请人： In-Kyo KIM ,  Myung-Soo HUH ,  Suk-Won JUNG ,  Cheol-Min JANG ,  Jae-Hyun KIM ,  Jin-Kwang KIM ,  Chang-Woo SHIM ,  Sung-Hun KEY

发明人： In-Kyo KIM ,  Myung-Soo HUH ,  Suk-Won JUNG ,  Cheol-Min JANG ,  Jae-Hyun KIM ,  Jin-Kwang KIM ,  Chang-Woo SHIM ,  Sung-Hun KEY

IPC分类号： H01L21/30 ,  H01L51/52

CPC分类号： H01L21/30 ,  C23C16/45538 ,  C23C16/45551 ,  C23C16/45578 ,  C23C16/545 ,  H01L51/52 ,  H01L51/56

摘要： A vapor deposition apparatus for depositing a thin film on a substrate includes a cover having an accommodation portion and a communicated portion, which communicated portion is connected to the accommodation portion and faces a direction of the substrate, and includes a body in the accommodation portion, which body includes a first portion and a second portion. The first portion is disposed at a first location of the body and connected to a first injection portion for injecting a first material onto the substrate, the second portion is disposed at a second location of the body and connected to a second injection portion for injecting a second material onto the substrate, and the body rotates in at least one direction so that the first portion and the second portion are alternately connected to each other with respect to the communicated portion.

摘要翻译： 一种用于在基片上沉积薄膜的气相沉积装置包括具有容纳部分和连通部分的盖子，该连通部分连接到容纳部分并面向基板的方向，并且包括在容纳部分中的主体， 该主体包括第一部分和第二部分。 第一部分设置在主体的第一位置并连接到用于将第一材料注入到基板上的第一注射部分，第二部分设置在主体的第二位置处并连接到第二注射部分，用于注射 第二材料到基板上，并且主体沿至少一个方向旋转，使得第一部分和第二部分相对于连通部交替地彼此连接。