Method and lens arrangement to improve imaging performance of
microlithography exposure tool
    1.
    发明授权
    Method and lens arrangement to improve imaging performance of microlithography exposure tool 失效
    方法和透镜布置,以提高微光刻曝光工具的成像性能

    公开(公告)号:US6069739A

    公开(公告)日:2000-05-30

    申请号:US109299

    申请日:1998-06-30

    摘要: A technique for introducing variable phase delay across portions of a spatially coherent light beam, such as a laser, without changing the focal length of the portions of the beam. A fly's-eye lens array is utilized to distribute the light for a more uniform illumination, but different length air gaps are introduced in the lens elements to provide a variable delay of portions of the beam. In a second scheme, a set of prisms is positioned in the path of the laser beam, in which the shape of the prism introduces variable phase delay across the cross-section of the beam.

    摘要翻译: 用于在空间相干光束(例如激光器)的部分上引入可变相位延迟而不改变光束部分的焦距的技术。 利用蝇眼透镜阵列来分配光以获得更均匀的照明,但是在透镜元件中引入不同长度的气隙以提供光束的部分的可变延迟。 在第二方案中,一组棱镜位于激光束的路径中,其中棱镜的形状在横梁的横截面上引入可变相位延迟。

    Reducing extreme ultraviolet flare in lithographic projection optics
    2.
    发明申请
    Reducing extreme ultraviolet flare in lithographic projection optics 审中-公开
    减少光刻投影光学中的极紫外光斑

    公开(公告)号:US20070229944A1

    公开(公告)日:2007-10-04

    申请号:US11395669

    申请日:2006-03-31

    IPC分类号: F21V9/04

    CPC分类号: G03F7/70941 G03F7/70308

    摘要: An extreme ultraviolet lithography system may have a spatial filtering system in projection optics that reduce flare. A flare filter may be provided at the pupil plane to pass the required diffraction orders (at minimum 0th and +1 or 0th and −1 orders) of the light from the mask, while blocking the effects of scattering from various mirrors used in the projection optics. By reducing flare, process window and critical dimension variation can be improved.

    摘要翻译: 极紫外光刻系统可以在投影光学中具有减少耀斑的空间滤波系统。 可以在光瞳面上设置火炬滤波器,以通过所需的衍射级(最小0和0/1和1或0级)和/ 掩模,同时阻挡投影光学器件中使用的各种反射镜的散射效应。 通过减少闪光,可以改善工艺窗口和临界尺寸变化。

    Transition radiation apparatus
    3.
    发明申请
    Transition radiation apparatus 失效
    过渡辐射装置

    公开(公告)号:US20060033053A1

    公开(公告)日:2006-02-16

    申请号:US10917819

    申请日:2004-08-13

    IPC分类号: A61N5/00 G01J3/10

    CPC分类号: G03F7/70008

    摘要: In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the membrane support structures. In a second embodiment, deformation of membranes is compensated for by fabricating the membranes to cooperatively bend in a similar manner and direction. In a third embodiment, deformation of the membrane is reduced by fabricating the membranes with an intrinsic tensile or compressive stress.

    摘要翻译: 在本发明的一个实施例中,通过在膜或膜支撑结构中设置弯曲区域,可以减少过渡辐射发射结构中的膜的热变形或弯曲。 在第二实施例中,通过制造膜以相似的方式和方向协同地弯曲来补偿膜的变形。 在第三实施例中,通过制造具有固有的拉伸或压缩应力的膜来减小膜的变形。