Silicon-Based Schottky Barrier Detector With Improved Responsivity
    1.
    发明申请
    Silicon-Based Schottky Barrier Detector With Improved Responsivity 有权
    具有改善响应性的硅基肖特基势垒检测器

    公开(公告)号:US20110221019A1

    公开(公告)日:2011-09-15

    申请号:US13038470

    申请日:2011-03-02

    CPC classification number: H01L31/101 H01L31/1085

    Abstract: A planar, waveguide-based silicon Schottky barrier photodetector includes a third terminal in the form of a field plate to improve the responsivity of the detector. Preferably, a silicide used for the detection region is formed during a processing step where other silicide contact regions are being formed. The field plate is preferably formed as part of the first or second layer of CMOS metallization and is controlled by an applied voltage to modify the electric field in the vicinity of the detector's silicide layer. By modifying the electric field, the responsivity of the device is “tuned” so as to adjust the momentum of “hot” carriers (electrons or holes, depending on the conductivity of the silicon) with respect to the Schottky barrier of the device. The applied potential functions to align with the direction of momentum of the “hot” carriers in the preferred direction “normal” to the silicon-silicide interface, allowing for an increased number to move over the Schottky barrier and add to the generated photocurrent.

    Abstract translation: 平面的基于波导的硅肖特基势垒光电检测器包括场板形式的第三端子,以提高检测器的响应度。 优选地,在其中形成其它硅化物接触区域的处理步骤期间形成用于检测区域的硅化物。 场板优选地形成为第一或第二CMOS金属化层的一部分,并且通过施加的电压来控制,以修改检测器硅化物层附近的电场。 通过修改电场,器件的响应度被“调谐”,以相对于器件的肖特基势垒调节“热”载流子(电子或空穴,取决于硅的导电性)的动量。 所施加的电位功能与“硅”载体的优势方向“正常”硅硅化物界面的动量方向相一致,允许增加的数量移动到肖特基势垒上并增加产生的光电流。

    Silicon-based schottky barrier detector with improved responsivity
    3.
    发明授权
    Silicon-based schottky barrier detector with improved responsivity 有权
    基于硅的肖特基势垒检测器,具有更高的响应度

    公开(公告)号:US08618625B2

    公开(公告)日:2013-12-31

    申请号:US13038470

    申请日:2011-03-02

    CPC classification number: H01L31/101 H01L31/1085

    Abstract: A planar, waveguide-based silicon Schottky barrier photodetector includes a third terminal in the form of a field plate to improve the responsivity of the detector. Preferably, a silicide used for the detection region is formed during a processing step where other silicide contact regions are being formed. The field plate is preferably formed as part of the first or second layer of CMOS metallization and is controlled by an applied voltage to modify the electric field in the vicinity of the detector's silicide layer. By modifying the electric field, the responsivity of the device is “tuned” so as to adjust the momentum of “hot” carriers (electrons or holes, depending on the conductivity of the silicon) with respect to the Schottky barrier of the device. The applied potential functions to align with the direction of momentum of the “hot” carriers in the preferred direction “normal” to the silicon-silicide interface, allowing for an increased number to move over the Schottky barrier and add to the generated photocurrent.

    Abstract translation: 平面的基于波导的硅肖特基势垒光电检测器包括场板形式的第三端子,以提高检测器的响应度。 优选地,在其中形成其它硅化物接触区域的处理步骤期间形成用于检测区域的硅化物。 场板优选地形成为第一或第二CMOS金属化层的一部分,并且通过施加的电压来控制,以修改检测器硅化物层附近的电场。 通过修改电场,器件的响应度被“调谐”,以相对于器件的肖特基势垒调节“热”载流子(电子或空穴,取决于硅的导电性)的动量。 所施加的电位功能与“硅”载体的优势方向“正常”硅硅化物界面的动量方向相一致,允许增加的数量移动到肖特基势垒上并增加产生的光电流。

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