Abstract:
A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM (preventive maintenance) computer program, can automatically and quickly clean the interior of the etching tool. By setting the appropriate parameters of PM program, single or all of process chambers can be well cleaned. Also, the DI water dropping positions on the wafer can be altered to create more splashing angles. To clean the sidewalls of the etching chambers, the wafer supporting means is moved between the process chamber and the rotating speed thereof is preferably alter while it is moving. The PM program of the present invention can be executed whenever the cleaning job needs to be done. It not only is timesaving and easy to apply, but also keeps the wafer in a almost-no-particle environment while being etched.
Abstract:
The present invention provides a kind of contactless electromagnetic identification code IC circuit, which contains a control circuit to detect an input pad, and to provide a coding signal to decide one identification code for the contactless electromagnetic induced identification code IC. The control circuit contains: a carry clock signal source, which provides a carry clock signal to the input pad for generating a responding signal from the input pad; and a flip-flop set, which connects to the input pad, decides the identification code and forms the coding signal according to the pad's responding signal and the carry clock signal.