公开(公告)号：US06586146B2

公开(公告)日：2003-07-01

申请号：US09945068

申请日：2001-08-31

申请人： Kun-Yuan Chang ,  Wang-Hsiang Ho ,  Yu-Ping Huang ,  Li-Dar Tsai ,  Chung-Yung Wu

发明人： Kun-Yuan Chang ,  Wang-Hsiang Ho ,  Yu-Ping Huang ,  Li-Dar Tsai ,  Chung-Yung Wu

IPC分类号： G03F900

CPC分类号： G03F7/70558 ,  G03F7/70625

摘要： A method of figuring an exposure energy. A required exposure energy is calculated according to a critical dimension (CD) of an exposing layer. A first CD deviation is obtained from a layer before the exposing layer. From the first CD deviation, a first energy compensation is calculated. Whether the deviation of photoresist sensitivity of two sequential batches is less than 1% is checked. If the deviation of photoresist sensitivity of two sequential batches is less than 1%, a sum of the required exposure energy and the first energy compensation is the exposure energy applied to the exposing layer. Otherwise, a second CD deviation is commutated according to the deviation of photoresist sensitivity of two sequential batches. A second energy compensation is then obtained from the second CD deviation, and a sum of the required exposure energy and the first/second energy compensation is the exposure energy applied to the exposing layer.

摘要翻译： 计算曝光能量的方法。 根据暴露层的临界尺寸（CD）计算所需的曝光能量。 从暴露层之前的层获得第一CD偏差。 从第一个CD偏差，计算第一个能量补偿。 检查两个连续批次的光敏感性的偏差是否小于1％。 如果两个连续批次的光致抗敏剂的偏差小于1％，则所需的曝光能量和第一能量补偿之和是施加到曝光层的曝光能量。 否则，根据两个连续批次的光致抗敏剂的偏差，第二CD偏差被换算。 然后从第二CD偏差获得第二能量补偿，并且所需曝光能量和第一/第二能量补偿之和是施加到曝光层的曝光能量。