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公开(公告)号:US20060084367A1
公开(公告)日:2006-04-20
申请号:US10968571
申请日:2004-10-19
申请人: Clifford Spiro , George Steuer , Frank Kaufman
发明人: Clifford Spiro , George Steuer , Frank Kaufman
IPC分类号: B24B1/00
CPC分类号: A61B17/3211 , A61B2017/00526 , B24B3/36 , B24B37/00 , C09K3/1463
摘要: The invention is directed to a method for polishing a cutting edge on a cutting instrument, comprising contacting a cutting edge of a cutting instrument with a polishing pad and a chemical-mechanical polishing composition comprising particles of an abrasive, and a liquid carrier, wherein the abrasive is suspended in the liquid carrier, and abrading at least a portion of the cutting edge to polish the cutting edge. The invention further provides a cutting instrument having a highly uniform edge.
摘要翻译: 本发明涉及一种用于在切割仪器上抛光切割边缘的方法,包括将切割仪器的切割边缘与抛光垫接触,以及包含磨料颗粒和液体载体的化学机械抛光组合物,其中 研磨剂悬浮在液体载体中,并且研磨至少一部分切割边缘以抛光切割边缘。 本发明还提供了一种具有高度均匀边缘的切割仪器。
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公开(公告)号:US08460507B2
公开(公告)日:2013-06-11
申请号:US12676418
申请日:2008-09-03
申请人: Clifford Spiro , Edward Remsen , Thomas Werts
发明人: Clifford Spiro , Edward Remsen , Thomas Werts
CPC分类号: B24B37/04 , B24B37/0056 , B24B57/02 , H01L21/3212
摘要: Chemical-mechanical polishing (CMP) systems comprising apparatus and methods which allow the physical and chemical characteristics of a CMP slurry to be monitored during the polishing process, both on the pad and in the fresh slurry, are provided. The methods and apparatus of the invention also furnish the CMP operator with real-time information about the polishing process, which can provide insight into various chemical and physical mechanisms involved in chemical-mechanical polishing. The data provided by the sensors also make available valuable information about the stability and reproducibility of the particular CMP process being observed.
摘要翻译: 提供了包括在抛光过程中在衬垫和新鲜浆料中监测CMP浆料的物理和化学特性的装置和方法的化学机械抛光(CMP)系统。 本发明的方法和设备还向CMP操作者提供关于抛光过程的实时信息,其可以提供对化学机械抛光中涉及的各种化学和物理机制的洞察。 传感器提供的数据还提供了有关所观察到的特定CMP过程的稳定性和可重复性的有价值的信息。
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公开(公告)号:US08162723B2
公开(公告)日:2012-04-24
申请号:US12224902
申请日:2007-03-09
申请人: Clifford Spiro , George Steuer , Frank B. Kaufman
发明人: Clifford Spiro , George Steuer , Frank B. Kaufman
IPC分类号: B24B1/00
CPC分类号: C09K3/1463 , B24B3/343 , B24B37/00 , C09G1/02 , Y10T407/27 , Y10T428/24983
摘要: The invention is directed to a method for polishing a surface comprising tungsten carbide, comprising contacting a surface comprising tungsten carbide with an oxidizing agent, a polishing component, and a liquid carrier, and abrading at least a portion of the surface to polish the surface. The invention further provides a method for reconditioning a workpiece comprising tungsten carbide. The invention also provides a cutting tool insert having a highly polished surface.
摘要翻译: 本发明涉及一种用于抛光包含碳化钨的表面的方法,包括使包含碳化钨的表面与氧化剂,抛光组分和液体载体接触,并研磨表面的至少一部分以抛光该表面。 本发明还提供了一种用于修复包括碳化钨的工件的方法。 本发明还提供了具有高抛光表面的切削刀具刀片。
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公开(公告)号:US07037175B1
公开(公告)日:2006-05-02
申请号:US10968571
申请日:2004-10-19
申请人: Clifford Spiro , George Steuer , Frank Kaufman
发明人: Clifford Spiro , George Steuer , Frank Kaufman
IPC分类号: B24B3/00
CPC分类号: A61B17/3211 , A61B2017/00526 , B24B3/36 , B24B37/00 , C09K3/1463
摘要: The invention is directed to a method for polishing a cutting edge on a cutting instrument, comprising contacting a cutting edge of a cutting instrument with a polishing pad and a chemical-mechanical polishing composition comprising particles of an abrasive, and a liquid carrier, wherein the abrasive is suspended in the liquid carrier, and abrading at least a portion of the cutting edge to polish the cutting edge. The invention further provides a cutting instrument having a highly uniform edge.
摘要翻译: 本发明涉及一种用于在切割仪器上抛光切割边缘的方法,包括将切割仪器的切割边缘与抛光垫接触,以及包含磨料颗粒和液体载体的化学机械抛光组合物,其中 研磨剂悬浮在液体载体中,并且研磨至少一部分切割边缘以抛光切割边缘。 本发明还提供了一种具有高度均匀边缘的切割仪器。
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公开(公告)号:US20100187200A1
公开(公告)日:2010-07-29
申请号:US12676418
申请日:2008-09-03
申请人: Clifford Spiro , Edward Remsen , Thomas Werts
发明人: Clifford Spiro , Edward Remsen , Thomas Werts
CPC分类号: B24B37/04 , B24B37/0056 , B24B57/02 , H01L21/3212
摘要: Chemical-mechanical polishing (CMP) systems comprising apparatus and methods which allow the physical and chemical characteristics of a CMP slurry to be monitored during the polishing process, both on the pad and in the fresh slurry, are provided. The methods and apparatus of the invention also furnish the CMP operator with real-time information about the polishing process, which can provide insight into various chemical and physical mechanisms involved in chemical-mechanical polishing. The data provided by the sensors also make available valuable information about the stability and reproducibility of the particular CMP process being observed.
摘要翻译: 提供了包括在抛光过程中在衬垫和新鲜浆料中监测CMP浆料的物理和化学特性的装置和方法的化学机械抛光(CMP)系统。 本发明的方法和设备还向CMP操作者提供关于抛光过程的实时信息,其可以提供对化学机械抛光中涉及的各种化学和物理机制的洞察。 传感器提供的数据还提供了有关所观察到的特定CMP过程的稳定性和可重复性的有价值的信息。
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6.
公开(公告)号:US20100087845A1
公开(公告)日:2010-04-08
申请号:US12449085
申请日:2008-01-22
申请人: Clifford Spiro , James Hicks
发明人: Clifford Spiro , James Hicks
IPC分类号: A61B17/3211
CPC分类号: A61B17/3211
摘要: Methods for ameliorating tissue trauma from a surgical incision comprise making the surgical incision with a cutting instrument comprising a cutting instrument body defining two opposed sides and a direction of elongation, and having at least one cutting edge extending along the direction of elongation. The cutting edge defines an ultimate edge and two beveled faces adjacent the ultimate edge. The cutting edge of the cutting instrument has at least one characteristic selected from the group consisting of (a) a uniform ultimate edge having a maximum height deviation of 4 m or less along any 680 m segment of thereof; (b) each beveled face having a maximum height deviation of 4 m or less along any 680 m segment of thereof; and (c) each beveled face adjacent the ultimate edge having a root mean square surface roughness (Rq) of not more than about 200 nm. Improved cutting instruments are also provided.
摘要翻译: 用于从外科切口改善组织创伤的方法包括使用包括限定两个相对侧和延伸方向的切割仪器主体的切割仪器进行外科切口,并且具有沿着伸长方向延伸的至少一个切割边缘。 切割边缘限定了最终边缘和与最终边缘相邻的两个斜面。 切割工具的切割边缘具有选自以下的至少一种特征:(a)沿其任何680m的段具有最大高度偏差为4m或更小的均匀极限边缘; (b)每个斜面的任何680米段的最大高度偏差为4米或更小; 和(c)与最终边缘相邻的每个倾斜面具有不大于约200nm的均方根粗糙度(Rq)。 还提供了改进的切割工具。
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公开(公告)号:US20090103993A1
公开(公告)日:2009-04-23
申请号:US12224902
申请日:2007-03-09
申请人: Clifford Spiro , George Steuer , Frank B. Kaufman
发明人: Clifford Spiro , George Steuer , Frank B. Kaufman
CPC分类号: C09K3/1463 , B24B3/343 , B24B37/00 , C09G1/02 , Y10T407/27 , Y10T428/24983
摘要: The invention is directed to a method for polishing a surface comprising tungsten carbide, comprising contacting a surface comprising tungsten carbide with an oxidizing agent, a polishing component, and a liquid carrier, and abrading at least a portion of the surface to polish the surface. The invention further provides a method for reconditioning a workpiece comprising tungsten carbide. The invention also provides a cutting tool insert having a highly polished surface.
摘要翻译: 本发明涉及一种用于抛光包含碳化钨的表面的方法,包括使包含碳化钨的表面与氧化剂,抛光组分和液体载体接触,并研磨表面的至少一部分以抛光该表面。 本发明还提供了一种用于修复包括碳化钨的工件的方法。 本发明还提供了具有高抛光表面的切削刀具刀片。
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