公开(公告)号：US06338778B1

公开(公告)日：2002-01-15

申请号：US09214764

申请日：1999-01-12

申请人： Daniela Giersch ,  Robert Schalausky ,  Goetz Mielsch ,  Hans-Joachim Scheibe

发明人： Daniela Giersch ,  Robert Schalausky ,  Goetz Mielsch ,  Hans-Joachim Scheibe

IPC分类号： C23C1432

CPC分类号： C23C14/28 ,  C23C14/325 ,  C23C14/564

摘要： The invention relates to a device, in particular for a laser-induced vacuum are discharge evaporator for depositing of multiple layers with a high level of purity and high deposition rates on large-area components. According to the invention, the material source for the coating material is in a source chamber which can be evacuated and can be separated in a vacuum-tight manner from the actual coating chamber in which the substrate to be coated is located. The evaporator can, in particular, be used for deposition of amorphous carbon layers which are hydrogen-free and superhard and/or which contain hydrogen, in conjunction with high-purity metal layers or for the reactive plasma-enhanced deposition of, for example, oxidic, carbide, nitride hard material layers of ceramic layers or a combination thereof. The corresponding plasma sources can be flange-mounted on any suitable coating chambers and, consequently, also combined with conventional coating processes, for example magnetron sputtering.

摘要翻译： 本发明涉及一种装置，特别是用于激光诱发真空的装置，是用于在大面积部件上以高纯度和高沉积速率沉积多层的放电蒸发器。 根据本发明，用于涂料的材料源在源腔室中，其可被抽真空并且可以以真空密封的方式从待涂覆的基底所在的实际涂覆室分离。 特别地，蒸发器可用于沉积无氢和超硬和/或含有氢的无定形碳层，结合高纯度金属层或用于例如反应性等离子体增强沉积， 氧化物，碳化物，氮化物硬质材料层或其组合。 相应的等离子体源可以法兰安装在任何合适的涂层室上，并因此也与传统的涂覆工艺（例如磁控溅射）组合。