Beam scanning method and apparatus for ion implantation
    2.
    发明授权
    Beam scanning method and apparatus for ion implantation 失效
    光束扫描方法和离子注入装置

    公开(公告)号:US4421988A

    公开(公告)日:1983-12-20

    申请号:US349742

    申请日:1982-02-18

    CPC分类号: H01J37/3171 H01J37/302

    摘要: Method of and apparatus for scanning a charged particle beam over a semiconductor wafer in a prescribed pattern. A triangular waveform, including alternating positive and negative ramp portions of constant slope and controllable time durations, is applied to a horizontal deflection system and produces horizontal scanning of the beam. The time durations of the ramp portions determine the length of the horizontal scan lines and are controlled according to a predetermined sequence so as to provide the prescribed pattern. The triangular waveform is provided by an integrator which receives a square wave from a frequency source of controllable frequency. The predetermined sequence is stored in a read only memory which controls the frequency of the frequency source. At the completion of each ramp portion, a voltage applied to a vertical deflection system is incremented so as to step the beam vertically up or down.

    摘要翻译: 用于以规定图案在半导体晶片上扫描带电粒子束的方法和装置。 包括具有恒定斜率和可控持续时间的交替的正和负斜坡部分的三角波形被施加到水平偏转系统,并产生横梁的水平扫描。 斜坡部分的持续时间确定水平扫描线的长度,并根据预定的顺序进行控制,以便提供规定的图案。 三角波形由积分器提供,该积分器从可控频率的频率源接收方波。 预定序列存储在控制频率源的频率的只读存储器中。 在每个斜坡部分完成时,施加到垂直偏转系统的电压递增,以使波束垂直上升或下降。

    Apparatus for enhanced neutralization of positively charged ion beam
    3.
    发明授权
    Apparatus for enhanced neutralization of positively charged ion beam 失效
    用于增强带正电离子束中和的装置

    公开(公告)号:US4463255A

    公开(公告)日:1984-07-31

    申请号:US450819

    申请日:1982-12-20

    IPC分类号: H01J37/317

    CPC分类号: H01J37/3171 H01J2237/0041

    摘要: An apparatus for the enhanced neutralization of a positively charged particle beam has a source of primary electrons which are directed at a dummy target positioned adjacent the ion beam. The secondary electrons have a low energy and are susceptible to being entrapped within the volume of the positively charged beam. The ion beam attracts these low energy electrons until effective beam neutralization is achieved. The ions in the beam are individually neutralized when the beam strikes the target.

    摘要翻译: 用于增强中和带正电荷的粒子束的装置具有指向邻近离子束定位的虚拟靶的一次电子源。 二次电子具有低能量并且容易被截留在带正电束的体积内。 离子束吸引这些低能电子,直到达到有效的光束中和。 当光束撞击目标时,光束中的离子被单独中和。