公开(公告)号：US20050237501A1

公开(公告)日：2005-10-27

申请号：US10829623

申请日：2004-04-22

申请人： Toshiharu Furukawa ,  Mark Hakey ,  David Horal ,  Charles Koburger ,  Peter Mitchell

发明人： Toshiharu Furukawa ,  Mark Hakey ,  David Horal ,  Charles Koburger ,  Peter Mitchell

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An apparatus, system and method for use with a photolithographic system. In accordance with one embodiment, the photolithographic system of the present invention includes a workpiece support member for supporting a semiconductor wafer. A substantially transparent cover member is disposed over the workpiece support member to form a substantially enclosed workpiece cell therebetween. The enclosed workpiece cell is filled with a first immersion fluid having suitable refractive properties. The cover member, having suitable refractive properties, includes an upper surface contoured to form an open reservoir containing a second immersion fluid, having suitable refractive properties, and in which a final lens element may be immersed during a lithography process.

摘要翻译： 一种用于光刻系统的设备，系统和方法。 根据一个实施例，本发明的光刻系统包括用于支撑半导体晶片的工件支撑构件。 基本上透明的盖构件设置在工件支撑构件上方，以在它们之间形成基本封闭的工件单元。 封闭的工件单元填充有具有合适折射特性的第一浸没流体。 具有合适的折射性质的盖构件包括上表面，其形状为形成具有合适的折射性质的第二浸没流体的开口储存器，并且其中最终的透镜元件可以在光刻工艺期间被浸没。