公开(公告)号：US07554105B2

公开(公告)日：2009-06-30

申请号：US11263012

申请日：2005-11-01

申请人： Dominicus Jacobus Petrus A. Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus A. Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。