Continuously fed single bubbler for epitaxial deposition of silicon
    1.
    发明授权
    Continuously fed single bubbler for epitaxial deposition of silicon 失效
    连续供给单个起泡器,用于硅的外延沉积

    公开(公告)号:US6123765A

    公开(公告)日:2000-09-26

    申请号:US49537

    申请日:1998-03-27

    CPC分类号: C30B25/14 Y10T117/1008

    摘要: A delivery system and method for providing a gaseous chemical is provided. The system comprises a single bubbler 12 having a chamber 13 for containing a liquid chemical, at least one inlet tube 14 for providing a carrier gas to said chamber, and one outlet tube 16 for providing the gaseous chemical. A liquid chemical supply line 25 conveys the liquid chemical to said chamber. A bubbler is in contact with weight measuring device 24 for weighing the bubbler and generating an output signal responsive to the measured weight. A liquid chemical controller 20 is operatively coupled to said bubbler and said supply line for filling and continuously maintaining a preselected level of the liquid chemical in said chamber responsive to said output signal.

    摘要翻译: 提供了一种用于提供气态化学品的输送系统和方法。 该系统包括具有用于容纳液体化学品的室13的单个起泡器12,用于向所述室提供载气的至少一个入口管14和用于提供气态化学品的一个出口管16。 液体化学品供应管线25将液体化学品输送到所述室。 起泡器与重量测量装置24接触,用于称重起泡器并响应于测量的重量产生输出信号。 液体化学品控制器20可操作地耦合到所述起泡器和所述供应管线,用于根据所述输出信号填充和连续地保持所述腔室中液体化学品的预选液面。