公开(公告)号：US11960202B1

公开(公告)日：2024-04-16

申请号：US17503071

申请日：2021-10-15

申请人： EUV TECH, INC.

发明人： Chami N Perera ,  David C. Houser ,  Charles G. Murray ,  Alexander N. Khodarev ,  Travis W. Grodt

IPC分类号： G03F1/84 ,  G01N21/956 ,  G03F7/00

CPC分类号： G03F1/84 ,  G01N21/956 ,  G03F7/7065 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/068

摘要： An EUV microscope device utilizing a source of a beam of EUV light. The light is sent to a collector which produces a first focused EUV beam. A monochromator receives the first focused EUV beam and produces a second EUV beam that is passed to an illumination module. The output of the illumination module is passed to a mask. The reflected beam from the mask is sent to a zone plate and a detector to produce an image.