公开(公告)号：US20090183987A1

公开(公告)日：2009-07-23

申请号：US12302302

申请日：2007-06-06

Applicant: Martin Weigert ,  Christoph Simons ,  Eckehard Männle

Inventor： Martin Weigert ,  Christoph Simons ,  Eckehard Männle

IPC: C23C14/34 ,  C23C4/10

CPC classification number: C23C14/3414 ,  C04B35/46 ,  C04B35/462 ,  C04B35/495 ,  C04B35/62695 ,  C04B2235/3232 ,  C04B2235/3251 ,  C04B2235/3286 ,  C04B2235/786

Abstract: A sputter target is provided having a sputter material based on TiO2 and made such that the sputter material contains 15-60 mol. % Nb2O5. A method for the production of the sputter target includes the following steps: mixing of TiO2 and Nb2O5 powder in a liquid slurry; spray granulating this slurry to form TiO2:Nb2O5 mixed oxide granulate; and plasma spraying this granulate onto a sputter target base body.

Abstract translation: 提供溅射靶，其具有基于TiO 2的溅射材料，并使溅射材料含有15-60mol。 ％Nb2O5。 制备溅射靶的方法包括以下步骤：将TiO 2和Nb 2 O 5粉末混合在液体浆料中; 将该浆料喷雾造粒形成TiO 2 :Nb 2 O 5混合氧化物颗粒; 并将该颗粒等离子体喷涂到溅射靶基体上。