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1.发明申请CVD REACTOR WITH MULTIPLE PROCESSING LEVELS AND DUAL-AXIS MOTORIZED LIFT MECHANISM 审中-公开具有多种加工水平和双轴电动机构的CVD反应器公开(公告)号：US20100075488A1
公开(公告)日：2010-03-25
申请号：US12560073
申请日：2009-09-15
申请人： Richard O. Collins , Nyi O. Myo , Kevin J. Bautista , John S. Webb , Errol C. Sanchez , Yi-Chiau Huang , Kailash Kiran Patalay , Zhi Yuan Zhou , Wilson Yu
发明人： Richard O. Collins , Nyi O. Myo , Kevin J. Bautista , John S. Webb , Errol C. Sanchez , Yi-Chiau Huang , Kailash Kiran Patalay , Zhi Yuan Zhou , Wilson Yu
IPC分类号： H01L21/20 , C23C16/458
CPC分类号： H01L21/67115 , C23C16/45551 , H01L21/68742 , H01L21/68792
摘要： An apparatus for processing a substrate, comprising a processing chamber and a substrate support and lift pin assembly disposed within the chamber. The substrate support and lift pin assembly are coupled to a lift mechanism that controls positioning of the substrate support and the lift pins and provides rotation for the substrate support. The lift mechanism includes at least one sensor capable of generating a signal when clearance between the substrate support and the lift pins allows rotation of the substrate support to begin. The substrate support capable of concurrent axial motion and rotation may be used in a processing chamber comprising multiple processing zones separated by edge rings. Substrates may be subjected to successive or cyclical processes by moving between the multiple processing zones.
摘要翻译： 一种用于处理衬底的装置，包括处理室和设置在腔室内的衬底支撑件和提升销组件。 基板支撑和提升销组件联接到升降机构，该提升机构控制基板支撑件和升降销的定位并提供用于基板支撑件的旋转。 提升机构包括至少一个传感器，当传感器支架和提升销之间的间隙允许基板支撑件的旋转开始时能产生信号。 能够同时进行轴向运动和旋转的基板支撑件可用于包括由边缘环分开的多个处理区域的处理室。 可以通过在多个处理区之间移动来对衬底进行连续或循环过程。
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2.发明授权公开(公告)号：US09245786B2
公开(公告)日：2016-01-26
申请号：US13152154
申请日：2011-06-02
IPC分类号： C23C16/458 , C23C16/52 , H01L21/68 , H01L21/67
CPC分类号： H01L21/68 , H01L21/67115 , H01L21/67259
摘要： Embodiments of the present invention provide apparatus and methods for positioning a substrate in a processing chamber using capacitive sensors. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus includes first and second capacitive sensors disposed in an inner volume. The first capacitive sensor is positioned to detect a location of an edge of the substrate at a first angular location. The second capacitive sensor is positioned to detect a vertical position of the substrate.
摘要翻译： 本发明的实施例提供了使用电容式传感器将衬底定位在处理室中的装置和方法。 本发明的一个实施例提供一种用于处理衬底的装置。 该装置包括设置在内部容积中的第一和第二电容传感器。 第一电容传感器被定位成在第一角度位置处检测衬底的边缘的位置。 第二电容传感器被定位成检测基板的垂直位置。
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3.发明申请公开(公告)号：US20120304928A1
公开(公告)日：2012-12-06
申请号：US13152154
申请日：2011-06-02
IPC分类号： C23C16/458 , C23C16/52
CPC分类号： H01L21/68 , H01L21/67115 , H01L21/67259
摘要： Embodiments of the present invention provide apparatus and methods for positioning a substrate in a processing chamber using capacitive sensors. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus includes first and second capacitive sensors disposed in an inner volume. The first capacitive sensor is positioned to detect a location of an edge of the substrate at a first angular location. The second capacitive sensor is positioned to detect a vertical position of the substrate.
摘要翻译： 本发明的实施例提供了使用电容式传感器将衬底定位在处理室中的装置和方法。 本发明的一个实施例提供一种用于处理衬底的装置。 该装置包括设置在内部容积中的第一和第二电容传感器。 第一电容传感器被定位成在第一角度位置处检测衬底的边缘的位置。 第二电容传感器被定位成检测基板的垂直位置。
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