公开(公告)号：US20120171375A1

公开(公告)日：2012-07-05

申请号：US13420014

申请日：2012-03-14

Applicant: Franck Lamouroux ,  Sébastien Bertrand ,  Stéphane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stéphane Mazereau

Inventor： Franck Lamouroux ,  Sébastien Bertrand ,  Stéphane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stéphane Mazereau

IPC: C23C16/455

CPC classification number: C23C16/045 ,  C23C16/45578 ,  C23C16/4587

Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).

Abstract translation: 为了通过化学气相渗透致密化多孔基底（1），本发明提出使用装载工具（10），其包括设置在第一和第二板（12,13）之间的管状管道（10），并且用于致密化的薄基底 径向地 然后以这种方式装载的工具然后放置在具有连接到管状管道（11）的反应气体进入入口（21）的浸入式烘箱中的反应室（20）内，以使反应气体能够进入管道 沿着基本上径向的流动方向沿着基板（1）上的主面分布气体。 反应气体也可以在相反的方向上流动，即可以从其外壳（16）进入工具（10），并且可以经由管道（11）移除。

公开(公告)号：US08491963B2

公开(公告)日：2013-07-23

申请号：US13420014

申请日：2012-03-14

Applicant: Franck Lamouroux ,  Sébastien Bertrand ,  Stéphane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stéphane Mazereau

Inventor： Franck Lamouroux ,  Sébastien Bertrand ,  Stéphane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stéphane Mazereau

IPC: C23C16/00

CPC classification number: C23C16/045 ,  C23C16/45578 ,  C23C16/4587

Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).

Abstract translation: 为了通过化学气相渗透致密化多孔基底（1），本发明提出使用装载工具（10），其包括设置在第一和第二板（12,13）之间的管状管道（10），并且用于致密化的薄基底 径向地 然后以这种方式装载的工具然后放置在具有连接到管状管道（11）的反应气体进入入口（21）的浸入式烘箱中的反应室（20）内，以使反应气体能够进入管道 沿着基本上径向的流动方向沿着基板（1）上的主面分布气体。 反应气体也可以在相反的方向上流动，即可以从其外壳（16）进入工具（10），并且可以经由管道（11）移除。

公开(公告)号：US08163088B2

公开(公告)日：2012-04-24

申请号：US11884597

申请日：2006-02-16

Applicant: Franck Lamouroux ,  Sébastien Bertrand ,  Stéphane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stéphane Mazereau

Inventor： Franck Lamouroux ,  Sébastien Bertrand ,  Stéphane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stéphane Mazereau

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/06 ,  C23C16/22

CPC classification number: C23C16/045 ,  C23C16/45578 ,  C23C16/4587

Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).

Abstract translation: 为了通过化学气相渗透致密化多孔基底（1），本发明提出使用装载工具（10），其包括设置在第一和第二板（12,13）之间的管状管道（10），并且用于致密化的薄基底 径向地 然后以这种方式装载的工具然后放置在具有连接到管状管道（11）的反应气体进入入口（21）的浸入式烘箱中的反应室（20）内，以使反应气体能够进入管道 沿着基本上径向的流动方向沿着基板（1）上的主面分布气体。 反应气体也可以在相反的方向上流动，即可以从其外壳（16）进入工具（10），并且可以经由管道（11）移除。

公开(公告)号：US20080152803A1

公开(公告)日：2008-06-26

申请号：US11884597

申请日：2006-02-16

Applicant: Franck Lamouroux ,  Sebastien Bertrand ,  Stephane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stephane Mazereau

Inventor： Franck Lamouroux ,  Sebastien Bertrand ,  Stephane Goujard ,  Alain Caillaud ,  Francis Bagilet ,  Stephane Mazereau

IPC: C23C16/458 ,  C23C16/00

CPC classification number: C23C16/045 ,  C23C16/45578 ,  C23C16/4587

Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).

Abstract translation: 为了通过化学气相渗透致密化多孔基底（1），本发明提出使用装载工具（10），其包括设置在第一和第二板（12,13）之间的管状管道（10），并且用于致密化的薄基底 径向地 然后以这种方式装载的工具然后放置在具有连接到管状管道（11）的反应气体进入入口（21）的浸入式烘箱中的反应室（20）内，以使反应气体能够进入管道 沿着基本上径向的流动方向沿着基板（1）上的主面分布气体。 反应气体也可以在相反的方向上流动，即可以从其外壳（16）进入工具（10），并且可以经由管道（11）移除。